Patents by Inventor Kirk G. Berridge

Kirk G. Berridge has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080289764
    Abstract: An end point detection electrode system and an etch station including the electrode system are disclosed. In one embodiment, the electrode system includes: an insulative mount; a first Mu-metal electrode coupled to the insulative mount; and a second Mu-metal electrode coupled to the insulative mount, the second electrode surrounding the first electrode.
    Type: Application
    Filed: May 25, 2007
    Publication date: November 27, 2008
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Erik D. Berridge, Kirk G. Berridge, Camille P. Bowne, David A. Drotar
  • Patent number: 5536388
    Abstract: A nozzle is provided for use in electroetching a vertically oriented workpiece, comprising a housing having a top, sides, and bottom for creating a flow of etching solution on the workpiece, and means for shaping the flow of etching solution into a moving channel to improve etch uniformity of the workpiece.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: July 16, 1996
    Assignee: International Business Machines Corporation
    Inventors: Thomas E. Dinan, Kirk G. Berridge, Madhav Datta, Thomas S. Kanarsky, Michael B. Pike, Ravindra V. Shenoy
  • Patent number: 5522975
    Abstract: A fixture for supporting a workpiece in a processing cell includes a frame and cooperating workpiece holder. The frame includes a head having a hole therein which receives an integral plateau of the holder. The holder plateau includes an annular seal adjacent a perimeter thereof with a vacuum port disposed therein. The workpiece rests on the seal so that vacuum drawn in the vacuum port fixedly holds the workpiece against the plateau. Assembly of the holder plateau and workpiece thereon through the frame-head hole positions the workpiece coplanar with a front side of the frame. In exemplary embodiments, independent electrical current paths are provided to the workpiece and a surrounding auxiliary electrode.
    Type: Grant
    Filed: May 16, 1995
    Date of Patent: June 4, 1996
    Assignee: International Business Machines Corporation
    Inventors: Panayotis C. Andricacos, Kirk G. Berridge, John O. Dukovic, Helmut R. Poweleit, Jeffrey S. Richter, Lubomyr T. Romankiw, Otto P. Schick
  • Patent number: 5516412
    Abstract: An electroplating cell includes a floor, ceiling, front wall, and back wall forming a box having first and second opposite open ends. A rack for supporting an article to be electroplated is removably positioned vertically to close the first open end and includes a thief laterally surrounding the article to define a cathode. An anode is positioned vertically to close the second open end, with the assembly defining a substantially closed, six-sided inner chamber for receiving an electrolyte therein for electroplating the article. The article and surrounding thief are coextensively aligned with the anode, with the floor, ceiling, front and back walls being effective for guiding electrical current flux between the cathode and the anode. In a preferred embodiment, the cell is disposed as an inner cell inside an outer cell substantially filled with the electrolyte, and a paddle is disposed inside the inner cell for agitating the electrolyte therein.
    Type: Grant
    Filed: May 16, 1995
    Date of Patent: May 14, 1996
    Assignee: International Business Machines Corporation
    Inventors: Panayotis C. Andricacos, Kirk G. Berridge, John O. Dukovic, Matteo Flotta, Jose Ordonez, Helmut R. Poweleit, Jeffrey S. Richter, Lubomyr T. Romankiw, Otto P. Schick, Frank Spera, Kwong-Hon Wong