Patents by Inventor Kiyokazu Akahori
Kiyokazu Akahori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9441082Abstract: A process includes the steps of: casting or coating a polyamic acid organic solvent solution on a support and drying the polyamic acid organic solvent solution thereon, so as to form a partially cured and/or partially dried polyamic acid film; dipping the polyamic acid film in tertiary amine or a solution of tertiary amine, or coating tertiary amine or a solution of tertiary amine on the polyamic acid film; and drying the film while imidizing the polyamic acid. In another process, a chemical converting agent and a catalyst are mixed in an organic solvent solution of polyamic acid. After casting and heating the mixture on a support, a partially cured and/or partially dried polyamic acid film is detached from the support. The film contains, with respect to the remaining volatile component, not less than 50 parts of catalyst, not more than 30 parts of solvent, and not more than 20 parts of chemical converting agent and/or a chemical converting agent derived component.Type: GrantFiled: December 24, 2014Date of Patent: September 13, 2016Assignee: KANEKA CORPORATIONInventors: Hisayasu Kaneshiro, Toshihisa Itoh, Kiyokazu Akahori
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Publication number: 20150118472Abstract: A process includes the steps of: casting or coating a polyamic acid organic solvent solution on a support and drying the polyamic acid organic solvent solution thereon, so as to form a partially cured and/or partially dried polyamic acid film; dipping the polyamic acid film in tertiary amine or a solution of tertiary amine, or coating tertiary amine or a solution of tertiary amine on the polyamic acid film; and drying the film while imidizing the polyamic acid. In another process, a chemical converting agent and a catalyst are mixed in an organic solvent solution of polyamic acid. After casting and heating the mixture on a support, a partially cured and/or partially dried polyamic acid film is detached from the support. The film contains, with respect to the remaining volatile component, not less than 50 parts of catalyst, not more than 30 parts of solvent, and not more than 20 parts of chemical converting agent and/or a chemical converting agent derived component.Type: ApplicationFiled: December 24, 2014Publication date: April 30, 2015Applicant: KANEKA CORPORATIONInventors: Hisayasu Kaneshiro, Toshihisa Itoh, Katsunori Yabuta, Kiyokazu Akahori
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Publication number: 20150119534Abstract: A process includes the steps of: casting or coating a polyamic acid organic solvent solution on a support and drying the polyamic acid organic solvent solution thereon, so as to form a partially cured and/or partially dried polyamic acid film; dipping the polyamic acid film in tertiary amine or a solution of tertiary amine, or coating tertiary amine or a solution of tertiary amine on the polyamic acid film; and drying the film while imidizing the polyamic acid. In another process, a chemical converting agent and a catalyst are mixed in an organic solvent solution of polyamic acid. After casting and heating the mixture on a support, a partially cured and/or partially dried polyamic acid film is detached from the support. The film contains, with respect to the remaining volatile component, not less than 50 parts of catalyst, not more than 30 parts of solvent, and not more than 20 parts of chemical converting agent and/or a chemical converting agent derived component.Type: ApplicationFiled: December 24, 2014Publication date: April 30, 2015Applicant: KANEKA CORPORATIONInventors: Hisayasu KANESHIRO, Toshihisa Itoh, Kiyokazu Akahori
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Patent number: 8962790Abstract: A process includes the steps of: casting or coating a polyamic acid organic solvent solution on a support and drying the polyamic acid organic solvent solution thereon, so as to form a partially cured and/or partially dried polyamic acid film; dipping the polyamic acid film in tertiary amine or a solution of tertiary amine, or coating tertiary amine or a solution of tertiary amine on the polyamic acid film; and drying the film while imidizing the polyamic acid. In another process, a chemical converting agent and a catalyst are mixed in an organic solvent solution of polyamic acid. After casting and heating the mixture on a support, a partially cured and/or partially dried polyamic acid film is detached from the support. The film contains, with respect to the remaining volatile component, not less than 50 parts of catalyst, not more than 30 parts of solvent, and not more than 20 parts of chemical converting agent and/or a chemical converting agent derived component.Type: GrantFiled: February 13, 2007Date of Patent: February 24, 2015Assignee: Kaneka CorporationInventors: Hisayasu Kaneshiro, Toshihisa Itoh, Katsunori Yabuta, Kiyokazu Akahori
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Patent number: 8865111Abstract: A process for producing a filmy graphite includes the steps of forming a polyimide film having a birefringence of 0.12 or more and heat-treating the polyimide film at 2,400° C. or higher.Type: GrantFiled: October 29, 2013Date of Patent: October 21, 2014Assignee: Kaneka CorporationInventors: Yasushi Nishikawa, Mutsuaki Murakami, Kiyokazu Akahori
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Publication number: 20140056801Abstract: A process for producing a filmy graphite includes the steps of forming a polyimide film having a birefringence of 0.12 or more and heat-treating the polyimide film at 2,400° C. or higher.Type: ApplicationFiled: October 29, 2013Publication date: February 27, 2014Applicant: Kaneka CorporationInventors: Yasushi Nishikawa, Mutsuaki Murakami, Kiyokazu Akahori
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Patent number: 8597606Abstract: A process for producing a filmy graphite includes the steps of forming a polyimide film having a birefringence of 0.12 or more and heat-treating the polyimide film at 2,400° C. or higher.Type: GrantFiled: December 6, 2012Date of Patent: December 3, 2013Assignee: Kaneka CorporationInventors: Yasushi Nishikawa, Mutsuaki Murakami, Kiyokazu Akahori
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Patent number: 8337800Abstract: A process for producing a filmy graphite includes the steps of forming a polyimide film having a birefringence of 0.12 or more and heat-treating the polyimide film at 2,400° C. or higher.Type: GrantFiled: October 17, 2011Date of Patent: December 25, 2012Assignee: Kaneka CorporationInventors: Yasushi Nishikawa, Mutsuaki Murakami, Kiyokazu Akahori
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Publication number: 20120034151Abstract: A process for producing a filmy graphite includes the steps of forming a polyimide film having a birefringence of 0.12 or more and heat-treating the polyimide film at 2,400° C. or higher.Type: ApplicationFiled: October 17, 2011Publication date: February 9, 2012Applicant: Kaneka CorporationInventors: Yasushi NISHIKAWA, Mutsuaki MURAKAMI, Kiyokazu AKAHORI
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Patent number: 8066966Abstract: A process for producing a filmy graphite includes the steps of forming a polyimide film having a birefringence of 0.12 or more and heat-treating the polyimide film at 2,400° C. or higher.Type: GrantFiled: July 2, 2010Date of Patent: November 29, 2011Assignee: Kaneka CorporationInventors: Yasushi Nishikawa, Mutsuaki Murakami, Kiyokazu Akahori
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Publication number: 20100266830Abstract: A process for producing a filmy graphite includes the steps of forming a polyimide film having a birefringence of 0.12 or more and heat-treating the polyimide film at 2,400° C. or higher.Type: ApplicationFiled: July 2, 2010Publication date: October 21, 2010Applicant: Kaneka CorporationInventors: Yasushi Nishikawa, Mutsuaki Murakami, Kiyokazu Akahori
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Patent number: 7758842Abstract: A process for producing a filmy graphite includes the steps of forming a polyimide film having a birefringence of 0.12 or more and heat-treating the polyimide film at 2,400° C. or higher.Type: GrantFiled: September 2, 2003Date of Patent: July 20, 2010Assignee: Kaneka CorporationInventors: Yasushi Nishikawa, Mutsuaki Murakami, Kiyokazu Akahori
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Patent number: 7416695Abstract: A polyamide acid solution and/or gel film is subjected to at least any one of the following processes: addition of a semiconducting inorganic filler, addition of a conductivity imparting agent, and formation of a conductive film. Thereafter, the polyamide acid contained in the polyamide acid solution or gel film is imidized. Thus, the obtained semiconducting polyimide film has surface and volume resistances satisfactorily controllable and less dependent on voltage, excellent mechanical properties, and a high elongation rate.Type: GrantFiled: June 14, 2002Date of Patent: August 26, 2008Assignee: Kaneka CorporationInventors: Hisayasu Kaneshiro, Yasushi Nishikawa, Kiyokazu Akahori
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Patent number: 7267883Abstract: A polyimide film of the present invention is a polyimide film having a dynamic viscoelasticity whose tan ? peak is located in a range of not less than 310° C. but not more than 410° C., and whose tan ? value at 300° C. is not more than 0.05, or a polyimide film prepared by copolymerizing (a) an acid dianhydride component including a biphenyltetracarboxylic dianhydride and a pyromellitic dianhydride, and (b) a diamine component, and the polyimide film having such an etching speed that one side thereof is etched with a 1N potassium hydroxide solution at an etching speed of 0.1 ?m/minute (one side) or higher. The polyimide film of the present invention possesses film properties that are necessary for use in an electronic raw material for flexible printed circuit boards and the like, and is suitable as an electronic raw material.Type: GrantFiled: September 19, 2003Date of Patent: September 11, 2007Assignee: Kaneka CorporationInventors: Kan Fujihara, Kazuhiro Ono, Kiyokazu Akahori
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Publication number: 20070138690Abstract: It is an object of the present invention to provide a stable process for continuously producing a synthetic resin film oriented in the machine direction across the full width. The present invention provides a process for producing a synthetic resin film including step (A) of casting and applying a composition containing a polymer and an organic solvent onto a support to form a gel film; step (B) of stripping the gel film and heating the gel film with both ends being fixed; and step (C) of heating the film with both ends being released after step (B), wherein the thickness b of the film produced in step (B) and the thickness c of the film produced in step (C) satisfy the relationship: b>c.Type: ApplicationFiled: February 8, 2005Publication date: June 21, 2007Applicant: Kaneka CorporationInventors: Takaaki Matsuwaki, Kazuhiro Ono, Kan Fujihara, Toshihisa Itoh, Kiyokazu Akahori
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Publication number: 20070129533Abstract: A process includes the steps of: casting or coating a polyamic acid organic solvent solution on a support and drying the polyamic acid organic solvent solution thereon, so as to form a partially cured and/or partially dried polyamic acid film; dipping the polyamic acid film in tertiary amine or a solution of tertiary amine, or coating tertiary amine or a solution of tertiary amine on the polyamic acid film; and drying the film while imidizing the polyamic acid. In another process, a chemical converting agent and a catalyst are mixed in an organic solvent solution of polyamic acid. After casting and heating the mixture on a support, a partially cured and/or partially dried polyamic acid film is detached from the support. The film contains, with respect to the remaining volatile component, not less than 50 parts of catalyst, not more than 30 parts of solvent, and not more than 20 parts of chemical converting agent and/or a chemical converting agent derived component.Type: ApplicationFiled: February 13, 2007Publication date: June 7, 2007Applicant: KANEKA CORPORATIONInventors: Hisayasu KANESHIRO, Toshihisa ITOH, Katsunori YABUTA, Kiyokazu AKAHORI
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Publication number: 20070066090Abstract: In etching an organic insulating layer made of a polyimide film, a polyimide containing at least a recurrent unit expressed by general formula (1) is used for the polyimide film: ;and an alkaline etchant containing oxyalkylamine, a hydroxide of an alkaline metal compound, water, and preferably an aliphatic alcohol is used as an etchant. The composition enables efficient formation of desirably shaped via holes and through holes through the organic insulating layer on a wiring board.Type: ApplicationFiled: November 22, 2006Publication date: March 22, 2007Applicant: KANEKA CORPORATIONInventors: Kazuhiro Ono, Kan Fujihara, Kiyokazu Akahori
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Publication number: 20070045895Abstract: It is an object of the present invention to provide a stable process for continuously producing a synthetic resin film oriented in the machine direction across the full width. The present invention provides a process for producing a synthetic resin film including step (A) of casting and applying a composition containing a polymer and an organic solvent onto a support to form a gel film; step (B) of stripping the gel film and heating the gel film with both ends being fixed; and step (C) of heating the film with both ends being released after step (B), wherein the thickness b of the film produced in step (B) and the thickness c of the film produced in step (C) satisfy the relationship: b>c.Type: ApplicationFiled: August 24, 2006Publication date: March 1, 2007Applicant: KANEKA CORPORATIONInventors: Takaaki Matsuwaki, Kazuhiro Ono, Kan Fujihara, Toshihisa Itoh, Kiyokazu Akahori
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Patent number: 7179519Abstract: Polyimide/metal laminates having a polyimide film and a metal layer laminated thereon, wherein the polyimide film contains titanium element and flexible print wiring boards with the use of the same are disclosed. The polyimide/metal laminates are excellent in adhesion under the ordinary conditions and, moreover, can sustain the adhesive strength at a high ratio after exposure to high temperature or high temperature and high humidity. Owing to these characteristics, these polyimide/metal laminates are appropriately usable in flexible print wiring boards, multi-layered print wiring boards, rigid flex wiring boards, tapes for TAP, semiconductor packages such as CFOs and multi chip modules (MCMs), magnetic recording films, coating films for aerospace materials and filmy resistance elements.Type: GrantFiled: May 16, 2003Date of Patent: February 20, 2007Assignee: Kaneka CorporationInventors: Masaru Nishinaka, Kiyokazu Akahori
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Publication number: 20070032589Abstract: A process for producing a filmy graphite includes the steps of forming a polyimide film having a birefringence of 0.12 or more and heat-treating the polyimide film at 2,400° C. or higher.Type: ApplicationFiled: September 2, 2003Publication date: February 8, 2007Applicant: KANEKA CORPORATIONInventors: Yasushi Nishikawa, Mutsuaki Murakami, Kiyokazu Akahori