Patents by Inventor Kiyoshi Murata

Kiyoshi Murata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240160052
    Abstract: A viewing angle-controlling liquid crystal panel sequentially includes a first polarizing plate; a first liquid crystal panel; a second polarizing plate; a second liquid crystal panel; and a third polarizing plate, wherein an azimuthal angle ?P1 of the absorption axis of the first polarizing plate, an azimuthal angle ?1 of a director of liquid crystal molecules near the first substrate and an azimuthal angle ?2 of a director of liquid crystal molecules near the second substrate in the first liquid crystal panel, an azimuthal angle ?P2 of the absorption axis of the second polarizing plate, an azimuthal angle ?3 of a director of liquid crystal molecules near the third substrate and an azimuthal angle ?4 of a director of liquid crystal molecules near the fourth substrate in the second liquid crystal panel, and an azimuthal angle ?P3 of the absorption axis of the third polarizing plate satisfy specific formulas.
    Type: Application
    Filed: October 12, 2023
    Publication date: May 16, 2024
    Applicant: Sharp Display Technology Corporation
    Inventors: Koji MURATA, Junichi MASUDA, Shugo YAGI, Akira HIRAI, Hiroshi TSUCHIYA, Takashi SATOH, Akira SAKAI, Kiyoshi MINOURA
  • Publication number: 20240067663
    Abstract: An yttrium compound, a method of manufacturing an integrated circuit device, and a raw material for forming an yttrium-containing film, the yttrium compound being represented by the following General formula (1):
    Type: Application
    Filed: August 8, 2023
    Publication date: February 29, 2024
    Applicant: ADEKA CORPORATION
    Inventors: Hyunwoo KIM, Kazuki HARANO, Kiyoshi MURATA, Haruyoshi SATO, Seungmin RYU, Gyuhee PARK, Younjoung CHO, Atsushi YAMASHITA
  • Publication number: 20230369039
    Abstract: A method of manufacturing a semiconductor device is provided. The method includes providing a first layer having a first surface and a second layer having a second surface orthogonal to the first surface in a vertical direction, forming an inhibitor layer conformally on the first surface and the second surface, exposing the second surface by selectively removing the inhibitor layer on the second surface among the first surface and the second surface, the exposing of the second surface may include selectively removing an edge portion of the inhibitor layer on the first surface, the edge portion contacting the second surface, and forming an interest layer on the exposed second surface.
    Type: Application
    Filed: May 10, 2023
    Publication date: November 16, 2023
    Applicants: Samsung Electronics Co., Ltd., ADEKA CORPORATION
    Inventors: Eunhyea KO, Daihyun Kim, Thanh Cuong Nguyen, Soyoung Lee, Jihyun Lee, Hoon Han, Byungkeun Hwang, Hiroyuki Uchiuzou, Kiyoshi Murata, Tomoharu Yoshino, Youjoung Cho
  • Publication number: 20230215723
    Abstract: To manufacture an integrated circuit (IC) device, a structure in which a first material film including silicon atoms and nitrogen atoms and a second material film devoid of nitrogen atoms is formed on a substrate. A carbonyl compound having a functional group without an ?-hydrogen is applied to the structure, and thus, an inhibitor is selectively formed only on an exposed surface of the first material film from among the first material film and the second material film.
    Type: Application
    Filed: December 29, 2022
    Publication date: July 6, 2023
    Applicant: ADEKA CORPORATION
    Inventors: EUNHYEA KO, Hoon Han, Soyoung Lee, Thanh Cuong Nguyen, Hiroyuki Uchiuzou, Kiyoshi Murata, Tomoharu Yoshino, Daekeon Kim, Younjoung Cho, Jiyu Choi, Byungkeun Hwang
  • Patent number: 11667730
    Abstract: An oxime ester compound represented by general formula (I): wherein R1, R2, and R3 each independently represent R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms, R4 and R5 each independently represent R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, a halogen atom, or a hydroxyl group; and a and b each independently represent 0 to 3.
    Type: Grant
    Filed: June 22, 2017
    Date of Patent: June 6, 2023
    Assignee: ADEKA CORPORATION
    Inventors: Daisuke Sawamoto, Koichi Kimijima, Kiyoshi Murata, Yasunori Kozaki, Takeo Oishi
  • Publication number: 20230040334
    Abstract: An yttrium compound and a method of manufacturing an integrated circuit device, the compound being represented by General Formula (I):
    Type: Application
    Filed: July 7, 2022
    Publication date: February 9, 2023
    Applicant: ADEKA CORPORATION
    Inventors: Hyunwoo KIM, Kazuki HARANO, Kiyoshi MURATA, Haruyoshi SATO, Younsoo KIM, Seungmin RYU, Atsushi YAMASHITA, Gyuhee PARK, Younjoung CHO
  • Publication number: 20170283520
    Abstract: An oxime ester compound represented by general formula (I): wherein R1, R2, and R3 each independently represent R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms, R4 and R5 each independently represent R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, a halogen atom, or a hydroxyl group; and a and b each independently represent 0 to 3.
    Type: Application
    Filed: June 22, 2017
    Publication date: October 5, 2017
    Inventors: Daisuke SAWAMOTO, Koichi KIMIJIMA, Kiyoshi MURATA, Yasunori KOZAKI, Takeo OISHI
  • Patent number: 9594302
    Abstract: A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator including at least one compound (1) and (B) a photosensitive resin are provided. Preferred are the compound (1) in which R1 is an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, the compound (1) in which at least one of R5, R6, R7, R8, R9, R10, and R11 is nitro, and the compound (1) in which n is 0. The symbols in general formula (1) are as defined in the description.
    Type: Grant
    Filed: March 5, 2013
    Date of Patent: March 14, 2017
    Assignee: ADEKA CORPORATION
    Inventors: Takeo Oishi, Koichi Kimijima, Nobuhide Tominaga, Hirokatsu Shinano, Daisuke Sawamoto, Kiyoshi Murata
  • Patent number: 9403925
    Abstract: Provided are: a curable composition from which a cured article having excellent molding processability and high heat resistance as well as such a high Tg that it can be used as a molding resin for a SiC power semiconductor can be obtained; and a cured article thereof. The curable composition comprises: 100 parts by mass of a compound having at least two partial structures represented by the following Formula (1) in the molecule as a component (A); 0.5 to 3 parts by mass of a thermal radical generator as a component (B); and 0 to 50 parts by mass of other radical-reactive compound as a component (C): (wherein, ring A represents a benzene ring or a cyclohexyl ring; R1 represents an alkylene group having 1 to 6 carbon atoms; R2 represents an alkyl group having 1 to 4 carbon atoms; a represents a number of 0 or 1; b represents an integer of 0 to 3; and c represents a number of 1 or 2).
    Type: Grant
    Filed: August 24, 2012
    Date of Patent: August 2, 2016
    Assignee: ADEKA CORPORATION
    Inventors: Kenichiro Hiwatari, Atsuo Tomita, Tomoaki Saiki, Kiyoshi Murata
  • Publication number: 20140187715
    Abstract: Provided are: a curable composition from which a cured article having excellent molding processability and high heat resistance as well as such a high Tg that it can be used as a molding resin for a SiC power semiconductor can be obtained; and a cured article thereof. The curable composition comprises: 100 parts by mass of a compound having at least two partial structures represented by the following Formula (1) in the molecule as a component (A); 0.5 to 3 parts by mass of a thermal radical generator as a component (B); and 0 to 50 parts by mass of other radical-reactive compound as a component (C): (wherein, ring A represents a benzene ring or a cyclohexyl ring; R1 represents an alkylene group having 1 to 6 carbon atoms; R2 represents an alkyl group having 1 to 4 carbon atoms; a represents a number of 0 or 1; b represents an integer of 0 to 3; and c represents a number of 1 or 2).
    Type: Application
    Filed: August 24, 2012
    Publication date: July 3, 2014
    Applicant: ADEKA CORPORATION
    Inventors: Kenichiro Hiwatari, Atsuo Tomita, Tomoaki Saiki, Kiyoshi Murata
  • Publication number: 20140144482
    Abstract: When a tab wire 20 is connected to a busbar electrode 12 on a surface side of a photovoltaic cell 6, the bonding strength at the connection part can be improved and electric resistance can be reduced without reducing the amount of received light. The busbar electrode 12 and the tab wire 20 are bonded via conductive resin 22 having light-transmission property. This conductive resin 22 covers at least a part of a side face of the busbar electrode 12, and preferably reaches the surface of the photovoltaic cell 6. The tab wire 20 may have a width smaller than a width of the busbar electrode 12.
    Type: Application
    Filed: February 3, 2014
    Publication date: May 29, 2014
    Applicant: JX NIPPON OIL & ENERGY CORPORATION
    Inventors: Noriyo Ishimaru, Shigeki Kondo, Kiyoshi Murata, Yasushi Fukuda
  • Patent number: 8252512
    Abstract: An novel epoxy compound is represented by the general formula (I) and has a benzo- or naphtho-cycloalkane skeleton: X, Y, and Z each independently represent an alkyl group having 1-10 carbon atoms and optionally substituted with a halogen atom, an aryl group having 6-20 carbon atoms and optionally substituted with a halogen atom, an arylalkyl group having 7-20 carbon atoms and optionally substituted with a halogen atom, a heterocyclic group having 2-20 carbon atoms and optionally substituted with a halogen atom, or a halogen atom; k represents a number of 0-4; p represents a number of 0-8; r represents a number of 0-4; n represents 0-10; x represents a number of 0-4; y represents a number of 0-4; a sum of x and y is 2-4; and an optical isomer that exists when n is not 0 may be of any type.
    Type: Grant
    Filed: April 28, 2008
    Date of Patent: August 28, 2012
    Assignee: Adeka Corporation
    Inventors: Taiki Mihara, Kiyoshi Murata, Koichi Kimijima
  • Patent number: 8197710
    Abstract: A polymerizable compound represented by general formula (1): wherein Z1 and Z2 each represent a (meth)acryloyloxy group; X1 and X2 each independently represent a single bond, an optionally branched alkylene group having 1 to 8 carbon atoms, an ether linkage, —COO—, —OCO—, —OCOO—, a 6-membered ring optionally having a substituent, or a combination thereof; R1 represents —R?, —OR?, —CO—R?, or —OCO—R?; R? represents a halogen atom, an optionally branched alkyl group having 1 to 8 carbon atoms, or a 6-membered ring optionally having a substituent, L1 and L2 each independently represent a member selected from a single bond, —CH2CH2—, —CH?CH—, —C?C—, —CH2O—, —OCH2—, —COO—, and —OCO—; m represents an integer of 1 to 4; and the R1's may be the same or different.
    Type: Grant
    Filed: October 9, 2007
    Date of Patent: June 12, 2012
    Assignee: Adeka Corporation
    Inventors: Rieko Hamada, Masatomi Irisawa, Kiyoshi Murata
  • Patent number: 8148045
    Abstract: A novel compound is a highly-sensitive photopolymerization initiator with excellent stability, low sublimability, excellent developability, and high transmittance in the visible region. It efficiently absorbs, and is activated by, near-ultraviolet rays such as at 365 nm. Also provided are a photopolymerization initiator and a photosensitive composition using such compound. An oxime ester compound is represented by the following general formula (I), a photopolymerization initiator containing the same, and a photosensitive composition containing the photopolymerization initiator and a polymerizable compound having an ethylenically unsaturated bond: R1 and R2 each represent R11, COR11, CONR12R13, CN, etc.; R11, R12, and R13 each represent a C1-20 alkyl group, etc.; R3 and R4 each represent R11, OR11, COR11, CONR12R13, OCOR11, CN, a halogen atom, etc.; a and b each represent an integer 0-4; X represents an oxygen atom, a sulfur atom, etc.
    Type: Grant
    Filed: November 19, 2010
    Date of Patent: April 3, 2012
    Assignee: Adeka Corporation
    Inventors: Kiyoshi Murata, Takeo Oishi, Koichi Kimijima
  • Patent number: 8117004
    Abstract: To increase the overall efficiency of a test apparatus, provided is a test module that includes an instruction information storage section that stores instruction information indicating an order in which basic patterns are expanded; a basic pattern data storage section that stores basic pattern data; a plurality of pattern generating sections that each include a temporary instruction information storage section, which temporarily stores a portion of the instruction information, and that each generate a test pattern supplied to a device under test by expanding the basic pattern data in the order indicated by the instruction information stored in the corresponding temporary instruction information storage section; and a plurality of position information storage sections that independently store position information indicating reading positions of the instruction information stored in the instruction information storage section that is common to the plurality of pattern generating sections, in association with e
    Type: Grant
    Filed: March 30, 2008
    Date of Patent: February 14, 2012
    Assignee: Advantest Corporation
    Inventors: Sami Akhtar, Kiyoshi Murata, Tomoyuki Sugaya
  • Patent number: 8010851
    Abstract: A testing module including a designation information storing section that stores designation information designating an order of decoding fundamental patterns, a fundamental pattern storing section that stores the fundamental patterns, a plurality of pattern generating sections that each generate a test pattern to be supplied to a device under test, a plurality of position information storing sections that each store, in association with a corresponding pattern generating section, position information designating a read position from which the designation information is read from the designation information storing section, and an information transmission path shared by the pattern generating sections that transmits a part of the designation information from the designation information storing section to the designation information temporary storing section in each pattern generating section.
    Type: Grant
    Filed: March 31, 2008
    Date of Patent: August 30, 2011
    Assignee: Advantest Corporation
    Inventors: Sami Akhtar, Kiyoshi Murata, Tomoyuki Sugaya
  • Publication number: 20110129778
    Abstract: The invention provides a novel compound useful as a highly-sensitive photopolymerization initiator that has excellent stability, low sublimability, excellent developability, and high transmittance in the visible region and that efficiently absorbs, and is activated by, near-ultraviolet rays such as at 365 nm. Also provided are a photopolymerization initiator and a photosensitive composition using the above-described compound. Specifically, the invention provides an oxime ester compound represented by the following general formula (I), a photopolymerization initiator containing the same, and a photosensitive composition containing the photopolymerization initiator and a polymerizable compound having an ethylenically unsaturated bond: wherein, R1 and R2 each represent R11, COR11, CONR12R13, CN, etc.; R11, R12, and R13 each represent a C1-20 alkyl group, etc.; R3 and R4 each represent R11, OR11, COR11, CONR12R13, OCOR11, CN, a halogen atom, etc.
    Type: Application
    Filed: November 19, 2010
    Publication date: June 2, 2011
    Applicant: ADEKA CORPORATION
    Inventors: Kiyoshi MURATA, Takeo OISHI, Koichi KIMIJIMA
  • Publication number: 20100294990
    Abstract: A polymerizable compound represented by general formula (1): wherein Z1 and Z2 each represent a (meth)acryloyloxy group; X1 and X2 each independently represent a single bond, an optionally branched alkylene group having 1 to 8 carbon atoms, an ether linkage, —COO—, —OCO—, —OCOO—, a 6-membered ring optionally having a substituent, or a combination thereof; R1 represents —R?, —OR?, —CO—R?, or —OCO-R?; R? represents a halogen atom, an optionally branched alkyl group having 1 to 8 carbon atoms, or a 6-membered ring optionally having a substituent, L1 and L2 each independently represent a member selected from a single bond, —CH2CH2—, —CH?CH—, —C?C—, —CH2O—, —OCH2—, —COO—, and —OCO—; m represents an integer of 1 to 4; and the R1's may be the same or different.
    Type: Application
    Filed: October 9, 2007
    Publication date: November 25, 2010
    Applicant: ADEKA CORPORATION
    Inventors: Rieko Hamada, Masatomi Irisawa, Kiyoshi Murata
  • Patent number: 7779313
    Abstract: Provided is test apparatus with higher testing efficiency, including: plurality of pattern generating sections generating test pattern to supply to devices under test; group control section controlling group of pattern generating sections out of the pattern generating sections, and generating control signal upon receiving signal output from any pattern generating section controlled; range information storage section storing range information indicating range of pattern generating sections, out of the pattern generating sections, that serve to test one independent device under test; and comprehensive control section receiving the control signal from the group control section, identifying any pattern generating section that supplies the test pattern to the same device under test as that to which the pattern generating section having output the signal supplies the test pattern based on the range information, and in response to the control signal, controlling any other group control section that controls the iden
    Type: Grant
    Filed: March 30, 2008
    Date of Patent: August 17, 2010
    Assignee: Advantest Corporation
    Inventors: Kiyoshi Murata, Tomoyuki Sugaya, Sami Akhtar
  • Publication number: 20100015551
    Abstract: An novel epoxy compound is represented by the general formula (I) and has a benzo- or naphtho-cycloalkane skeleton: X, Y, and Z each independently represent an alkyl group having 1-10 carbon atoms and optionally substituted with a halogen atom, an aryl group having 6-20 carbon atoms and optionally substituted with a halogen atom, an arylalkyl group having 7-20 carbon atoms and optionally substituted with a halogen atom, a heterocyclic group having 2-20 carbon atoms and optionally substituted with a halogen atom, or a halogen atom; k represents a number of 0-4; p represents a number of 0-8; r represents a number of 0-4; n represents 0-10; x represents a number of 0-4; y represents a number of 0-4; a sum of x and y is 2-4; and an optical isomer that exists when n is not 0 may be of any type.
    Type: Application
    Filed: April 28, 2008
    Publication date: January 21, 2010
    Applicant: ADEKA CORPORATION
    Inventors: Taiki Mihara, Kiyoshi Murata, Koichi Kimijima