Abstract: According to an embodiment, a charged particle beam apparatus includes a stage; a chamber; an emission source of the charged particle beam; an electronic optical system configured to emit the charged particle beam; an optical column including the emission source and the electronic optical system; a charged particle detector configured to detect a position of the charged particle beam; a first actuator configured to provide a frequency vibration to the stage based on a first excitation signal; a second actuator configured to provide a frequency vibration to the optical column based on a second excitation signal; a third actuator configured to provide a frequency vibration to the chamber based on a third excitation signal; and a controller configured to generate the first to third excitation signals.

Abstract: A charged particle beam irradiation apparatus according to an embodiment includes: an optical column; a stage; a mount supporting the stage; a chamber provided on the mount and supporting the optical column; a detector configured to detect movement of the stage; actuator units each including a curved plate, a piezoelectric element, and a connector connected configured to transmit a first force generated by a change of the curvature of the curved plate to the mount; and an actuator control circuit configured to control the voltage applied to the piezoelectric element of each of the actuator units based on movement information, so that the first force is transmitted from the actuator units to the mount against a second force acting on the mount due to the movement of the stage.

Abstract: According to an embodiment, a charged particle beam apparatus includes a stage; a chamber; an emission source of the charged particle beam; an electronic optical system configured to emit the charged particle beam; an optical column including the emission source and the electronic optical system; a charged particle detector configured to detect a position of the charged particle beam; a first actuator configured to provide a frequency vibration to the stage based on a first excitation signal; a second actuator configured to provide a frequency vibration to the optical column based on a second excitation signal; a third actuator configured to provide a frequency vibration to the chamber based on a third excitation signal; and a controller configured to generate the first to third excitation signals.

Abstract: A charged particle beam irradiation apparatus according to an embodiment includes: an optical column; a stage; a mount supporting the stage; a chamber provided on the mount and supporting the optical column; a detector configured to detect movement of the stage; actuator units each including a curved plate, a piezoelectric element, and a connector connected configured to transmit a first force generated by a change of the curvature of the curved plate to the mount; and an actuator control circuit configured to control the voltage applied to the piezoelectric element of each of the actuator units based on movement information, so that the first force is transmitted from the actuator units to the mount against a second force acting on the mount due to the movement of the stage.

Abstract: The vibration control system configured to control vibration of a vibration-controlled object is disclosed. The vibration control system comprises: (i) actuator units each including a piezoelectric element configured to expand and contract; (ii) a drive power source configured to supply drive voltages to the piezoelectric elements of the actuator units for causing the piezoelectric elements to expand and contract; (iii) a vibration detector configured to detect a status of vibration of the vibration-controlled object; and (iv) a vibration controller configured to control the vibration of the vibration-controlled object by controlling the voltages supplied by the drive power source to the piezoelectric elements of the actuator units based on the status of vibration detected by the vibration detector, respectively.

Abstract: The vibration control system configured to control vibration of a vibration-controlled object is disclosed. The vibration control system comprises: (i) actuator units each including a piezoelectric element configured to expand and contract; (ii) a drive power source configured to supply drive voltages to the piezoelectric elements of the actuator units for causing the piezoelectric elements to expand and contract; (iii) a vibration detector configured to detect a status of vibration of the vibration-controlled object; and (iv) a vibration controller configured to control the vibration of the vibration-controlled object by controlling the voltages supplied by the drive power source to the piezoelectric elements of the actuator units based on the status of vibration detected by the vibration detector, respectively.

Abstract: A position measurement apparatus includes a movable stage structure, a measurement unit using a laser to measure a moved position of the stage and to output a corresponding measured value, a first filter configured to attenuate a first component of a certain frequency region of the measured value outputted by the measurement unit, a second filter connected in parallel with the first filter configured to attenuate a second component other than the certain frequency region of the measured value outputted by the measurement unit, a third filter connected in series to the second filter with the series connection of the second and third filters connected in parallel with the first filter, configured to attenuate the first component of the certain frequency region of the measured value outputted by the measurement unit, and a processing unit configured to combine an output of the first filter and an output of the series connection of the second and third filters and to thereby output a first combined value.

Abstract: A position measurement apparatus includes a movable stage structure, a measurement unit using a laser to measure a moved position of the stage and to output a corresponding measured value, a first filter configured to attenuate a first component of a certain frequency region of the measured value outputted by said measurement unit, a second filter connected in parallel with said first filter configured to attenuate a second component other than the certain frequency region of the measured value outputted by said measurement unit, a third filter connected in series to said second filter with the series connection of said second and third filters connected in parallel with the first filter, configured to attenuate the first component of said certain frequency region of the measured value outputted by said measurement unit, and a synthetic unit configured to combine an output of said first filter and an output of the series connection of the second and third filters and to thereby output a first combined value.