Patents by Inventor Kiyoshi Onodera

Kiyoshi Onodera has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5554443
    Abstract: A resin-coated, bonding fine wire for use in forming bonded electrical connections on a semiconductor device, wherein the bonding wire comprises an elongated fine wire of electrically conductive material, and first and second non-conductive coating layers. The first non-conductive coating layer covers the elongated fine wire and is of a material having good insulating property and heat resistance. The second non-conducting coating layer covers the first non-conductive coating layer and is of a material having good abrasion resistance. The first non-conductive coating layer includes at least one aromatic polyester resins, and the second non-conductive coating layer includes at least one resin selected from the group consisting of polyurethanes, polyester imides and polyimides. The second non-conductive coating layer is built up from a plurality of successive coats to define the second non-conductive coating layer as a non-conductive multilayer coating structure.
    Type: Grant
    Filed: May 12, 1995
    Date of Patent: September 10, 1996
    Assignees: Texas Instruments Incorporated, Nippon Steel Corporation
    Inventors: Hiroyuki Kondo, Kohei Tatsumi, Masao Kimura, Kiyoshi Onodera
  • Patent number: 5318632
    Abstract: A cap inserted into a wafer process tube for vertical furnaces is provided with exhaust flow normalizing means which can control or prevent variations in exhaust flow rates in the process tube, and thereby control variations in thickness of wafers subjected to film forming and annealing.In the alternative, an annular hollow ring is hermetically sealed around an outer circumferential surface of the process tube. An exhaust pipe is connected to the hollow annular ring. Gas communication holes are formed in the wall of the process tube to accommodate the flow of gas between the tube and the hollow annular ring. The spacing and cross-sectional area of the communication holes are such as to equalize flow resistance circumferentially around the cap. In-plane variations and wafer to wafer variations in thickness and quality of wafers subjected to film forming and annealing thereby are reduced and controlled.
    Type: Grant
    Filed: May 21, 1993
    Date of Patent: June 7, 1994
    Assignee: Kawasaki Steel Corporation
    Inventor: Kiyoshi Onodera
  • Patent number: 4357982
    Abstract: An apparatus for operating a hatch cover consisting of at least three pivotally interconnected cover sections foldable vertically accordionwise in a storage space adjacent to one hatch end, with the first lower section pivoted to said hatch end and the last cover section being connected to endless chain means extending along the hatch coaming and selectively engageable with drive means for pulling the hatch cover from open to closing position, said apparatus comprising telescopically extendable and retractable pivot arm means pivoted to said hatch end swingable between an upward vertical position and a downward horizontal position on a level below stud means projecting sidewise from each cover section, whereby said pivot arm means is selectively extendable for engagement with stud means of the cover section nearest to said hatch end.
    Type: Grant
    Filed: September 3, 1981
    Date of Patent: November 9, 1982
    Assignee: MacGregor International S.A.
    Inventors: Kikuo Yamada, Kiyoshi Onodera