Abstract: Probe card is a part which is incorporated into probing equipment to test finished IC chips. This card is customarily mounted with a plurality of probes, very fine needle and generally L letter shaped, each of which is disposed so that its front end may project downwardly toward an IC chip. Conventional probes are difficult to align all the probe front ends with electrical ends on the IC chip. Overdrive is normally taken to produce adequate contact pressures with respective probes after all contacts between the probe front ends and the IC ends are formed, but this action often causes conventional probe ends to slip down from the IC ends. The proposed probe card includes a new provision of a resin layer of an elastic, insulative characteristic to fill the central open area of the supporter which is assembled into the probe card. The filling, by such a resin layer, makes the probe front ends resiliently held in position so that a deviation from proper respective dispositions by overdrive becomes avoidable.

Abstract: Probe card is a part which is incorporated into probing equipment to test finished IC chips. This card is customarily mounted with a plurality of probes, very fine needle and generally L letter shaped, each of which is disposed so that its front end may project downwardly toward an IC chip. Conventional probes are difficult to align all the probe front ends with electrical ends on the IC chip. Overdrive is normally taken to produce adequate contact pressures with respective probes after all contacts between the probe front ends and the IC ends are formed, but this action often causes conventional probe ends to slip down from the IC ends. The proposed probe card includes a new provision of a resin layer of an elastic, insulative characteristic to fill the central open area of the supporter which is assembled into the probe card. The filling, by such a resin layer, makes the probe front ends resiliently held in position so that a deviation from proper respective dispositions by overdrive becomes avoidable.

Abstract: A 1,3,5-triazine derivative represented by the following formula (I) ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4, independently from each other, represent a hydrogen atom or a group selected from the class consisting of linear or branched C.sub.1 -C.sub.6 alkyl groups, C.sub.2 -C.sub.6 alkenyl groups, C.sub.2 -C.sub.6 alkynyl groups, C.sub.1 -C.sub.6 alkyl groups substituted by C.sub.1 -C.sub.6 alkoxy or alkylthio, C.sub.3 -C.sub.6 cycloalkyl groups, a phenyl group unsubstituted or substituted by a substituent selected from halogen, nitro, cyano, lower alkyl, lower alkoxy, lower alkylthio and fluoro-substituted lower alkyl, C.sub.7 -C.sub.9 aralkyl groups unsubstituted or substituted by a substituent selected from halogen, nitro, cyano, lower alkyl, lower alkoxy, lower alkylthio and fluoro-substituted lower alkyl, and alkoxycarbonylmethyl groups having 1 to 6 carbon atoms in the alkoxy moiety; and Y represents a fluoro-substituted C.sub.1 -C.sub.3 alkyl group and a herbicidal use thereof.

Abstract: An ion emmisive head for fusing a metal to emit ion beam is disclosed, wherein a fused metal is designed to infiltrate through a porous portion for flow control and to reach an extremely sharpened needle which is provided after infiltration and wherefrom the fused metal is converted to ion beam by electrical action. Thus, ionized metallic beam is rendered to have smaller width or more focused ray. Submicron technology used in the IC industry, for instance, desires far thinner, finer beam line to attain more compact circuits, which need will be responded in the present invention by disposing a tipping needle to extend out of a porous tip portion which receives the fused metal from melting zone. Appropriate combination of sharpness at the needle point and provision of a beam guiding electrode in neighborhood of an emitting needle point enable to produce about 0.1 micron beam width by prevention of plasma ball which will otherwise diffuse the emitted beam.

Abstract: An ion source having a sintered metal head for ionizing various substances is disclosed. This ion source comprises a container made of a material which has a higher fusing point than that of the substance which is to be ionized, and a tip formed of a molded sintered metal of a higher fusing point than that of the substance which is to be ionized. The head is formed into a nearly conical shape and has a porosity capable of allowing the substance which is to be ionized to infiltrate therethrough in the molten state and the tip of the head is positioned at the opening of one end of the container for the ionizable material and arranged in such a manner that it protrudes beyond the end of the container.

Abstract: In the process for the production of a thiolcarbamate compound of the formula ##STR1## wherein R.sup.1 and R.sup.2 are as defined in claim, comprising reacting a tertiary halogen compound of the formula ##STR2## wherein X and R.sup.3 are as defined in claim, with a thiolcarbamic acid salt of the formula ##STR3## wherein M represents a member selected from the group consisting of the alkali metals, ammonium group and immonium group, in an aqueous reaction medium, in the presence of a strong base; the improvement wherein the reaction is carried out under conditions in which the reaction system is adjusted to a pH ranging from about 9 to about 13.