Patents by Inventor Kizoh Shibagaki

Kizoh Shibagaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Single wafer type substrate cleaning method and apparatus
    Patent number: 6915809
    Abstract: A single wafer type wet-cleaning apparatus for effectively preventing chemical fluids from flowing to the back face of a wafer when the back face thereof is wet-cleaned by chemical fluids, wherein purified water is injected and supplied to the back face of the wafer while a plurality of chemical fluids is sequentially supplied vertically from above to the wafer, which is rotatably supported, so that the purified water cleans the back face of the wafer and effectively prevents the chemical fluids from flowing to the back face of the wafer.
    Type: Grant
    Filed: May 15, 2003
    Date of Patent: July 12, 2005
    Assignee: S.E.S. Company Limited
    Inventor: Kizoh Shibagaki
  • Single wafer type substrate cleaning method and apparatus
    Patent number: 6824621
    Abstract: A single wafer type wet-cleaning technique for effectively preventing chemical fluids from flowing to the back face of a wafer when the back face thereof is wet-cleaned by chemical fluids, wherein purified water is injected and supplied to the back face of the wafer while a plurality of chemical fluids is sequentially supplied vertically from above to the wafer, which is rotatably supported, so that the purified water cleans the back face of the wafer and effectively prevents the chemical fluids from flowing to the back face of the wafer.
    Type: Grant
    Filed: September 10, 2001
    Date of Patent: November 30, 2004
    Assignee: S.E.S. Company Limited
    Inventor: Kizoh Shibagaki
  • Single wafer type substrate cleaning method and apparatus
    Publication number: 20030205253
    Abstract: A single wafer type wet-cleaning technique for effectively preventing chemical fluids from flowing to the back face of a wafer when the back face thereof is wet-cleaned by chemical fluids, wherein purified water is injected and supplied to the back face of the wafer while a plurality of chemical fluids is sequentially supplied vertically from above to the wafer, which is rotatably supported, so that the purified water cleans the back face of the wafer and effectively prevents the chemical fluids from flowing to the back face of the wafer.
    Type: Application
    Filed: May 15, 2003
    Publication date: November 6, 2003
    Applicant: S.E.S. Company Limited
    Inventor: Kizoh Shibagaki
  • Single wafer type substrate cleaning method and apparatus
    Publication number: 20020195128
    Abstract: A single wafer type wet-cleaning technique for effectively preventing chemical fluids from flowing to the back face of a wafer when the back face thereof is wet-cleaned by chemical fluids, wherein purified water is injected and supplied to the back face of the wafer while a plurality of chemical fluids is sequentially supplied vertically from above to the wafer, which is rotatably supported, so that the purified water cleans the back face of the wafer and effectively prevents the chemical fluids from flowing to the back face of the wafer.
    Type: Application
    Filed: September 10, 2001
    Publication date: December 26, 2002
    Applicant: S.E.S. Company Limited
    Inventor: Kizoh Shibagaki