Abstract: An apparatus (2) and a method for acquiring a complete image of a surface (4) of a semiconductor substrate (6) are disclosed. The apparatus encompasses a digital camera (11) having an objective (5) and a CCD chip (12). The objective (5) defines an optical axis (7) that is perpendicular to the CCD chip (12). Also provided is an illumination device (14) that is arranged above the surface (4) of the semiconductor substrate (6). The optical axis (7) forms with the surface (4) of the semiconductor substrate (6) an angle ([alpha]) that is less than 90°.

Abstract: An optical measurement arrangement includes an ellipsometer (45) and a device for ascertaining and correcting directional deviations between the line normal to the specimen surface and the angle bisector (25) between the incident and return beams (23, 24) of the ellipsometer (45). A measurement arrangement includes a mirror objective and a device for ascertaining directional deviations between the line normal to the specimen surface and the optical axis of the mirror objective, which has a deflection element in the unused aperture space of the mirror objective. A direction monitoring beam (30) is directed onto the specimen (P). An optical element for imaging the return reflection of the direction monitoring beam (30) onto an area detector that is connected to an evaluation circuit (46) is also provided. Positioning commands for a specimen stage (12) are available at the outputs of the evaluation circuit (46).

Abstract: The invention refers to an optical measurement arrangement having an ellipsometer (45) and a device for ascertaining and correcting directional deviations between the line normal to the specimen surface and the angle bisector (25) between the incident and return beams (23, 24) of the ellipsometer (45), and further to a measurement arrangement having a mirror objective and a device for ascertaining directional deviations between the line normal to the specimen surface and the optical axis of the mirror objective, which has a deflection element in the unused aperture space of the mirror objective.