Abstract: A method and apparatus for directing an ion beam toward a surface of a substrate is disclosed. Certain embodiments of the invention relate generally to ion beam sources adapted to direct ion beams toward a surface of a substrate at an oblique angle of incidence relative to the surface. Certain embodiments of the invention are adapted to direct two ion beam portions toward a substrate surface, the ion beam portions having substantially equal throw distances. Preferred embodiments of the invention may be useful in etching applications, where the angle of incidence and throw distance of two ion beam portions are well suited for etching the surface of a substrate.

Abstract: Multiple cavity low-emissivity coatings. The coating includes three infrared-reflection film regions, which may each include silver.

Abstract: Low-emissivity coatings that are highly reflective to infrared radiation. The coating includes three infrared-reflection film regions, which may each include silver.

Abstract: A substrate carrying a temporary protective cover and related methods of producing and processing substrates are described. In one embodiment, a substrate bears a hydrophilic coating carrying a temporary protective cover that protects the hydrophilic coating against contamination but that can readily be readily removed from the hydrophilic coating by washing with a given washing fluid.

Abstract: The invention provides graded photocatalytic coatings. In one aspect, the invention provides a substrate carrying a photocatalytic coating that includes a first graded film region and a second graded film region. The first graded film region has a substantially continuously decreasing concentration of a first transparent dielectric material and a substantially continuously increasing concentration of a second transparent dielectric material. The second graded film region has a substantially continuously decreasing concentration of the second transparent dielectric material and a substantially continuously increasing concentration of a third transparent dielectric material. In certain embodiments, the first transparent dielectric material comprises silicon dioxide, the second transparent dielectric material comprises zirconium oxide, and the third transparent dielectric material comprises titanium oxide. The invention also provides methods and equipment for depositing graded photocatalytic coatings.

Abstract: A glass article which has a water-sheeting coating. In one embodiment, a glass sheet is provided bearing a sputtered water-sheeting coating comprising silica on an exterior surface and bearing a reflective coating on an interior surface. The interior surface of a sheet of glass can be coated with a reflective coating by sputtering, in sequence, at least one dielectric layer, at least one metal layer, and at least one dielectric layer. The exterior surface of the glass can be coated with a water-sheeting coating by sputtering silica directly onto the exterior surface of the sheet of glass. Both the reflective coating and the water-sheeting coating can optionally be applied during the same pass through the same sputter coating apparatus.

Abstract: A corrosion-resistant low-emissivity coating is provided. The low-emissivity coating comprises, in sequence outwardly, a corrosion-resistant inner infrared-reflective layer, a transparent dielectric middle coat, and an outer infrared-reflective layer. The outer infrared-reflective layer consists essentially of silver and the corrosion-resistant inner infrared-reflective layer has a different composition than the outer infrared-reflective layer. Also provided are methods for depositing coatings of this nature, as well as substrates bearing these coatings.

Abstract: A coater having a substrate cleaning device is disclosed. The substrate cleaning device comprises an ion gun (i.e., an ion source) that is positioned beneath a path of substrate travel (e.g., beneath a substrate support) extending through the coater and that is adapted for treating a bottom major surface of a substrate. Certain embodiments involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device. In some embodiments of this nature, the upward coating apparatus is configured for depositing a photocatalytic coating upwardly onto the bottom major surface of the substrate. Certain embodiments of the invention involve a downward coating apparatus, wherein the substrate cleaning device is further along the path of substrate travel than the downward coating apparatus. Some embodiments involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device.

Abstract: A substrate bearing a low-emissivity coating, the coating comprising two infrared-reflective layers separated by a middle coat, the middle coat comprising two zinc tin oxide film regions separated by a tin oxide film region.

Abstract: A substrate bearing a removable cover is provided. The removable cover includes two or more removable films, wherein at least one film is removable by a different removing process than another film. For example, in some cases one film is an organic film removable by heat treatment and another film is an inorganic film durable to heat treatment but is soluble to a mild acid or a mild base.

Abstract: A substrate having a surface carrying a removable transparent film that can be removed by the surface by a desired washing process, and removable presence indicator associated with the removable transparent film, the presence indicator being removable by the same desired washing process as the removable transparent film. A method of producing a substrate having a presence indicator in contact with a removable transparent film a method of washing a substrate having a presence indicator in contact with a removable transparent film are also disclosed.

Abstract: A coater having a substrate cleaning device is disclosed. Also disclosed are methods of processing substrates in a coater equipped with a substrate cleaning device. The substrate cleaning device comprises an ion gun (i.e., an ion source) that is positioned beneath a path of substrate travel (e.g., beneath a substrate support) extending through the coater and that is adapted for treating a bottom major surface of a substrate. Certain embodiments involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device. In some embodiments of this nature, the upward coating apparatus is configured for depositing a photocatalytic coating upwardly onto the bottom major surface of the substrate. Certain embodiments of the invention involve a downward coating apparatus, wherein the substrate cleaning device is further along the path of substrate travel than the downward coating apparatus.

Abstract: A corrosion-resistant low-emissivity coating is provided. The low-emissivity coating comprises, in sequence outwardly, a corrosion-resistant inner infrared-reflective layer, a transparent dielectric middle coat, and an outer infrared-reflective layer. The outer infrared-reflective layer consists essentially of silver and the corrosion-resistant inner infrared-reflective layer has a different composition than the outer infrared-reflective layer. Also provided are methods for depositing coatings of this nature, as well as substrates bearing these coatings.

Abstract: The invention provides a substrate bearing a low-emissivity coating. The low-emissivity coating comprises at least one graded film region. In certain embodiments, at least one graded film region is provided between the two infrared-reflective layers of a double-type low-emissivity coating. The graded film region has a substantially continuously decreasing concentration of a first dielectric material and a substantially continuously increasing concentration of a second dielectric material. Also provided are methods of depositing such low-emissivity coatings and substrates bearing these coatings.

Abstract: Sputtering targets and sputtering methods for depositing a film that includes tin and niobium. Substrates bearing coatings comprising tin and niobium, for example, low-emissivity coatings including blocker films comprising tin and niobium, or solar control coatings (e.g., conductive oxide coatings) including tin and niobium methods of manufacturing sputtering targets comprising tin and niobium.

Abstract: The invention is a method for obtaining a reactive sputtering process with a reduced or eliminated hysteresis behavior. This is achieved by employing a target made from a mixture of metal and compound materials. In the method according to the present invention, the fraction of compound material is large enough to eliminate or significantly reduce the hysteresis behavior of the reactive sputtering process and enable a stable deposition of compound films at a rate significantly higher than what is possible from a target completely made from compound material.

Abstract: A nonstick transport roller is provided, the roller having an outer surface defined by a thickness of nonstick material. A rope can optionally be wound around the outer surface of the roller to define an elevated support for engaging a major substrate surface. A vacuum deposition chamber for applying thin films onto substrates is also provided, the chamber having a cavity in which a controlled vacuous environment can be established, the chamber including a series of transport rollers, at least one of the transport rollers comprising a cylindrical tube having an outer surface defined by a thickness of nonstick material, optionally with a rope wound around the tube to define an elevated support for engaging a bottom major surface of a substrate.

Abstract: The invention provides methods and equipment for depositing films. In certain embodiments, there is provided a deposition chamber having a substrate-coating region and an electrode-cleaning region. In these embodiments, an electrode is positioned in the deposition chamber and has an interior cavity in which first and second magnet systems are disposed. In certain embodiments, there is provided a method for depositing films onto substrates using a deposition chamber of the described nature. The invention also provides electrode assemblies for film-deposition equipment. In certain embodiments, the electrode assembly comprises a rotatable electrode (optionally having an outer coating of carbon or the like) having an interior cavity, with stationary first and second generally-opposed magnet systems being disposed in this interior cavity.

Abstract: The invention provides low-emissivity coatings that are highly reflective of infrared radiation. The coating includes three infrared-reflection film regions, which may each comprise silver.

Abstract: The invention provides multiple cavity low-emissivity coatings. The coating includes three infrared-reflection film regions, which may each comprise silver.