Patents by Inventor Klaus J. Przybilla

Klaus J. Przybilla has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive-working radiation-sensitive mixture
    Patent number: 5525453
    Abstract: A novel positive-working radiation-sensitive mixture having a high sensitivity to radiation in a short-wavelength UV region is provided which can be developed in an aqueous alkaline solution, has a stable acid latent image and is used for the production of a semiconductor. The mixture comprises, as indispensable components, a) a binder insoluble in water but soluble in an aqueous alkaline solution, b) a compound having at least one bond cleavable with an acid, c) a compound capable of producing an acid upon radiation, and d.sub.1) a basic ammonium compound or d.sub.2) a basic sulfonium compound.
    Type: Grant
    Filed: February 15, 1994
    Date of Patent: June 11, 1996
    Assignee: Hoechst Japan Limited
    Inventors: Klaus J. Przybilla, Takanori Kudo, Seiya Masuda, Yoshiaki Kinoshita, Natumi Suehiro, Munirathna Padmanaban, Hiroshi Okazaki, Hajime Endo, Ralph Dammel, Georg Pawlowski