Patents by Inventor Klaus Kunze

Klaus Kunze has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080093422
    Abstract: A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
    Type: Application
    Filed: December 21, 2006
    Publication date: April 24, 2008
    Applicant: Cabot Corporation
    Inventors: Toivo Kodas, Mark Hampden-Smith, Karel Vanheusden, Hugh Denham, Aaron Stump, Allen Schult, Paolina Atanassova, Klaus Kunze
  • Publication number: 20080093423
    Abstract: A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
    Type: Application
    Filed: December 21, 2006
    Publication date: April 24, 2008
    Applicant: Cabot Corporation
    Inventors: Toivo Kodas, Mark Hampden-Smith, Karel Vanheusden, Hugh Denham, Aaron Stump, Allen Schult, Paolina Atanassova, Klaus Kunze
  • Publication number: 20080034921
    Abstract: Processes for the production of metal nanoparticles. In one aspect, the invention is to a process comprising the steps of mixing a heated first solution comprising a base and/or a reducing agent (e.g., a non-polyol reducing agent), a polyol, and a polymer of vinyl pyrrolidone with a second solution comprising a metal precursor that is capable of being reduced to a metal by the polyol. In another aspect, the invention is to a process that includes the steps of heating a powder of a polymer of vinyl pyrrolidone; forming a first solution comprising the powder and a polyol; and mixing the first solution with a second solution comprising a metal precursor capable of being reduced to a metal by the polyol.
    Type: Application
    Filed: May 30, 2007
    Publication date: February 14, 2008
    Applicant: Cabot Corporation
    Inventors: Karel Vanheusden, Klaus Kunze, Hyungrak Kim, Aaron Stump, Allen Schult, Mark Hampden-Smith, Chuck Edwards, Anthony James, James Caruso, Toivo Kodas, Scott Haubrich, Mark Kowalski, Nathan Stott
  • Publication number: 20080022897
    Abstract: Methods for forming doped silane and/or semiconductor thin films, doped liquid phase silane compositions useful in such methods, and doped semiconductor thin films and structures. The composition is generally liquid at ambient temperatures and includes a Group IVA atom source and a dopant source. By irradiating a doped liquid silane during at least part of its deposition, a thin, substantially uniform doped oligomerized/polymerized silane film may be formed on a substrate. Such irradiation is believed to convert the doped silane film into a relatively high-molecular weight species with relatively high viscosity and relatively low volatility, typically by cross-linking, isomerization, oligomerization and/or polymerization. A film formed by the irradiation of doped liquid silanes can later be converted (generally by heating and annealing/recrystallization) into a doped, hydrogenated, amorphous silicon film or a doped, at least partially polycrystalline silicon film suitable for electronic devices.
    Type: Application
    Filed: October 8, 2007
    Publication date: January 31, 2008
    Inventors: Fabio Zurcher, Wenzhuo Guo, Joerg Rockenberger, Vladimir Dioumaev, Brent Ridley, Klaus Kunze, James Cleeves
  • Patent number: 7316790
    Abstract: Sulfur-containing phosphor powders, methods for making phosphor powders and devices incorporating same. The powders have a small particle size, narrow particle size distribution and are substantially spherical. The method of the invention permits the continuous production of such powders. The invention also relates to products such as display devices incorporating such phosphor powders.
    Type: Grant
    Filed: April 3, 2006
    Date of Patent: January 8, 2008
    Assignee: Cabot Corporation
    Inventors: Mark J. Hampden-Smith, Toivo T. Kodas, James Caruso, Daniel J. Skamser, Quint H. Powell, Klaus Kunze
  • Patent number: 7315068
    Abstract: The present invention is directed to methods for making electronic devices with a thin anisotropic conducting layer interface layer formed between a substrate and an active device layer that is preferably patterned conductive layer. The interface layer preferably provides Ohmic and/or rectifying contact between the active device layer and the substrate and preferably provides good adhesion of the active device layer to the substrate. The active device layer is preferably fashioned from a nanoparticle ink solution that is patterned using embossing methods or other suitable printing and/or imaging methods. The active device layer is preferably patterned into an array of gate structures suitable for the fabrication of thin film transistors and the like.
    Type: Grant
    Filed: March 9, 2005
    Date of Patent: January 1, 2008
    Assignee: Kovio Inc.
    Inventors: Scott Haubrich, Klaus Kunze, James C. Dunphy, Chris Gudeman, Joerg Rockenberger, Fabio Zurcher, Nassrin Sleiman, Mao Takashima, Chris Spindt
  • Patent number: 7314513
    Abstract: Methods for forming doped silane and/or semiconductor thin films, doped liquid phase silane compositions useful in such methods, and doped semiconductor thin films and structures. The composition is generally liquid at ambient temperatures and includes a Group IVA atom source and a dopant source. By irradiating a doped liquid silane during at least part of its deposition, a thin, substantially uniform doped oligomerized/polymerized silane film may be formed on a substrate. Such irradiation is believed to convert the doped silane film into a relatively high-molecular weight species with relatively high viscosity and relatively low volatility, typically by cross-linking, isomerization, oligomerization and/or polymerization. A film formed by the irradiation of doped liquid silanes can later be converted (generally by heating and annealing/recrystallization) into a doped, hydrogenated, amorphous silicon film or a doped, at least partially polycrystalline silicon film suitable for electronic devices.
    Type: Grant
    Filed: September 24, 2004
    Date of Patent: January 1, 2008
    Assignee: Kovio, Inc.
    Inventors: Fabio Zürcher, Wenzhuo Guo, Joerg Rockenberger, Vladimir K. Dioumaev, Brent Ridley, Klaus Kunze, James Montague Cleeves
  • Publication number: 20070290384
    Abstract: In one aspect, the present invention relates to a method of making multi-phase particles that include nanoparticulates and matrix, which maintains the nanoparticulates in a dispersed state. A flowing gas dispersion is generated that includes droplets of a precursor medium dispersed in a gas phase. The precursor medium contains liquid vehicle and at least a first precursor to a first material and a second precursor to a second material. The multi-phase particles are formed from the gas dispersion by removing at least a portion of the liquid vehicle from the droplets of precursor medium. The nanoparticulates in the multi-phase particles include the first material and the matrix in the multi-phase particles includes the second material.
    Type: Application
    Filed: August 8, 2005
    Publication date: December 20, 2007
    Applicant: CABOT CORPORATION
    Inventors: Toivo Kodas, Mark Hampden-Smith, Klaus Kunze, David Dericotte, Karel Vanheusden, Aaron Stump
  • Publication number: 20070279182
    Abstract: The invention is to printed resistors and processes for forming same. The resistors comprise a conductive phase, preferably comprising conductive nanoparticles, and a resistive phase. In the processes of the invention, a resistor may be formed from a single ink or a plurality of inks. In the single ink embodiment, an ink is deposited which comprises a conductive phase precursor, a resistive phase precursor and a vehicle. The vehicle in removed and the conductive and resistive phase precursors are converted to a conductive phase and a resistive phase, respectively. In the multiple ink embodiment, a first ink comprising the conductive phase precursor and a first vehicle and a second ink comprising the resistive phase precursor and a second vehicle are deposited on the substrate. The vehicles are removed and the conductive and resistive phase precursors are converted to a conductive phase and a resistive phase, respectively.
    Type: Application
    Filed: May 31, 2006
    Publication date: December 6, 2007
    Applicant: Cabot Corporation
    Inventors: Toivo T. Kodas, Chuck Edwards, Klaus Kunze, Hyungrak Kim, Ned Jay Hardman
  • Publication number: 20070221887
    Abstract: A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
    Type: Application
    Filed: December 21, 2006
    Publication date: September 27, 2007
    Applicant: Cabot Corporation
    Inventors: Toivo Kodas, Mark Hampden-Smith, Karel Vanheusden, Hugh Denham, Aaron Stump, Allen Schult, Paolina Atanassova, Klaus Kunze
  • Publication number: 20070207565
    Abstract: Processes for forming photovoltaic features and in particular photovoltaic conductive features. In one aspect, the process comprises printing a primer material onto a substrate; etching the substrate with the primer material to form an etched substrate; printing a precursor composition onto the etched substrate, wherein the precursor composition comprises at least one of metallic nanoparticles comprising a metal or a metal precursor compound to the metal; and heating the precursor composition to form the photovoltaic feature on the substrate.
    Type: Application
    Filed: May 9, 2007
    Publication date: September 6, 2007
    Applicant: Cabot Corporation
    Inventors: Toivo Kodas, Mark Hampden-Smith, Karel Vanheusden, Hugh Denham, Aaron Stump, Allen Schult, Paolina Atanassova, Klaus Kunze
  • Patent number: 7259101
    Abstract: A method for making nanoparticles, nanoparticle inks and device layers therefrom is disclosed. In accordance with the present invention, nanoparticles are isolated from a composite material that is formed by treating a metal oxide precursor to form the metal nanoparticles and a metal oxide matrix. The nanoparticles are then isolated from the composite material by etching at least a portion of the metal oxide matrix to release the metal nanoparticles. In accordance with the embodiments of the invention, the nanoparticles are treated with surfactants and wetting agents either while etching or after etching, are isolated from the etchant and dispersed in a solvent medium and/or are otherwise treated or modified for use in a nanoparticle inks. A layer of the metal nanoparticle ink can then be used to form doped, undoped, patterned and unpatterned device layers or structures in micro-devices.
    Type: Grant
    Filed: November 10, 2005
    Date of Patent: August 21, 2007
    Assignee: Kovio, Inc.
    Inventors: Fabio Zurcher, Brent Ridley, Klaus Kunze, Scott Haubrich, Joerg Rockenberger
  • Patent number: 7259100
    Abstract: A method for making nanoparticles, nanoparticle inks and device layers therefrom is disclosed. In accordance with the present invention, nanoparticles are isolated from a composite material that is formed by treating a metal oxide precursor to form the metal nanoparticles and a metal oxide matrix. The nanoparticles are then isolated from the composite material by etching at least a portion of the metal oxide matrix to release the metal nanoparticles. In accordance with the embodiments of the invention, the nanoparticles are treated with surfactants and wetting agents either while etching or after etching, are isolated from the etchant and dispersed in a solvent medium and/or are otherwise treated or modified for use in a nanoparticle inks. A layer of the metal nanoparticle ink can then be used to form doped, undoped, patterned and unpatterned device layers or structures in micro-devices.
    Type: Grant
    Filed: November 10, 2005
    Date of Patent: August 21, 2007
    Assignee: Kovio, Inc.
    Inventors: Fabio Zurcher, Brent Ridley, Klaus Kunze, Scott Haubrich, Joerg Rockenberger
  • Publication number: 20070181844
    Abstract: A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
    Type: Application
    Filed: April 18, 2007
    Publication date: August 9, 2007
    Applicant: CABOT CORPORATION
    Inventors: Toivo Kodas, Mark Hampden-Smith, Karel Vanheusden, Hugh Denham, Aaron Stump, Allen Schult, Paolina Atanassova, Klaus Kunze
  • Publication number: 20070178163
    Abstract: In one aspect, the present invention relates to a method of making multi-phase particles that include nanoparticulates and matrix, which maintains the nanoparticulates in a dispersed state. A flowing gas dispersion is generated that includes droplets of a precursor medium dispersed in a gas phase. The precursor medium contains liquid vehicle and at least a first precursor to a first material and a second precursor to a second material. The multi-phase particles are formed from the gas dispersion by removing at least a portion of the liquid vehicle from the droplets of precursor medium. The nanoparticulates in the multi-phase particles include the first material and the matrix in the multi-phase particles includes the second material.
    Type: Application
    Filed: August 8, 2005
    Publication date: August 2, 2007
    Applicant: CABOT CORPORATION
    Inventors: Toivo Kodas, Mark Hampden-Smith, Klaus Kunze, David Dericotte, Karel Vanheusden, Aaron Stump
  • Publication number: 20070178232
    Abstract: Precursor compositions in the form of a tape that can be transferred to a substrate and converted to an electronic feature at a relatively low temperature, such as not greater than about 200° C. The tape composition can be disposed on a carrier to form a ribbon structure that is flexible and can be handled in a variety of industrial processes.
    Type: Application
    Filed: December 21, 2006
    Publication date: August 2, 2007
    Applicant: Cabot Corporation
    Inventors: Toivo Kodas, Mark Hampden-Smith, Karel Vanheusden, Hugh Denham, Aaron Stump, Allen Schult, Paolina Atanassova, Klaus Kunze
  • Publication number: 20070167019
    Abstract: A method for making nanoparticles, nanoparticle inks and device layers therefrom is disclosed. In accordance with the present invention, nanoparticles are isolated from a composite material that is formed by treating a metal oxide precursor to form the metal nanoparticles and a metal oxide matrix. The nanoparticles are then isolated from the composite material by etching at least a portion of the metal oxide matrix to release the metal nanoparticles. In accordance with the embodiments of the invention, the nanoparticles are treated with surfactants and wetting agents either while etching or after etching, are isolated from the etchant and dispersed in a solvent medium and/or are otherwise treated or modified for use in a nanoparticle inks. A layer of the metal nanoparticle ink can then be used to form doped, undoped, patterned and unpatterned device layers or structures in micro-devices.
    Type: Application
    Filed: November 10, 2005
    Publication date: July 19, 2007
    Inventors: Fabio Zurcher, Brent Ridley, Klaus Kunze, Scott Haubrich, Joerg Rockenberger
  • Publication number: 20070138438
    Abstract: Photoluminescent phosphor powders and a method for making phosphor powders. The phosphor powders have a small particle size, narrow particle size distribution and are substantially spherical. The method of the invention advantageously permits the economic production of such powders. The invention also relates to improved devices, such as display devices and lighting elements, incorporating the phosphor powders.
    Type: Application
    Filed: February 21, 2007
    Publication date: June 21, 2007
    Applicant: CABOT CORPORATION
    Inventors: Mark Hampden-Smith, Toivo Kodas, James Caruso, Quint Powell, Klaus Kunze, Daniel Skamser
  • Patent number: 7229572
    Abstract: Photoluminescent phosphor powders and a method for making phosphor powders. The phosphor powders have a small particle size, narrow particle size distribution and are substantially spherical. The method of the invention advantageously permits the economic production of such powders. The invention also relates to improved devices, such as display devices and lighting elements, incorporating the phosphor powders.
    Type: Grant
    Filed: December 8, 2003
    Date of Patent: June 12, 2007
    Assignee: Cabot Corporation
    Inventors: Mark J. Hampden-Smith, Toivo T. Kodas, James Caruso, Daniel J. Skamser, Quint H. Powell, Klaus Kunze
  • Publication number: 20070125989
    Abstract: A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
    Type: Application
    Filed: December 21, 2006
    Publication date: June 7, 2007
    Applicant: Cabot Corporation
    Inventors: Toivo Kodas, Mark Hampden-Smith, Karel Vanheusden, Hugh Denham, Aaron Stump, Allen Schult, Paolina Atanassova, Klaus Kunze