Patents by Inventor Klaus Muellen

Klaus Muellen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9624375
    Abstract: Boron-comprising perylene monoimides and a process for producing the boron-comprising perylene monoimides are provided. The boron-comprising perylene monoimides are useful as building blocks for producing perylene monoimide derivatives and monoimide derivatives. The boron-comprising perylene monoimides are also useful for preparing dye-sensitized solar cells.
    Type: Grant
    Filed: June 22, 2015
    Date of Patent: April 18, 2017
    Assignees: BASF SE, Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.
    Inventors: Henrike Wonneberger, Ingmar Bruder, Robert Send, Glauco Battagliarin, Chen Li, Klaus Muellen
  • Publication number: 20170081192
    Abstract: The present invention concerns ortho-Terphenyls of general formula (I); wherein R1, R2, R3 and R4 are independently selected from the group consisting of H; CN; NO2; and saturated, unsaturated or aromatic C1-C40 hydrocarbon residues, which can be substituted 1- to 5-fold with F, CI, OH, NH2, CN and/or NO2, and wherein one or more —CH2-groups can be replaced by —O—, —NH—, —S—, —C(?O)O—, —OC(?O)— and/or —C(?O)—; and X and Y are the same or different, and selected from the group consisting of F, CI, Br, I, and OTf (trifluoromethanesulfonate); and their use for the preparation of graphene nanoribbons as well as a process for the preparation of graphene nanoribbons from said ortho-Terphenyls.
    Type: Application
    Filed: May 12, 2015
    Publication date: March 23, 2017
    Applicants: BASF SE, Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.
    Inventors: Matthias Georg SCHWAB, Klaus MUELLEN, Xinliang FENG, Tim DUMSLAFF, Pascal RUFFIEUX, Roman FASEL
  • Publication number: 20170057826
    Abstract: The present invention relates to a process for preparing graphene, comprising (i) providing in a chemical deposition chamber a substrate which has a surface S1, (ii) subjecting the substrate to a thermal pre-treatment while feeding at least one gaseous or supercritical oxidant into the chemical deposition chamber so as to bring the surface S1 into contact with the at least one gaseous or supercritical oxidant and obtain a pre-treated surface S2, (iii) preparing graphene on the pre-treated surface S2 by chemical deposition.
    Type: Application
    Filed: April 24, 2015
    Publication date: March 2, 2017
    Applicants: BASF SE, Max-Planck-Gesellschaft zur/Foerderung der Wissenschaften e.V.
    Inventors: Andrew-James STRUDWICK, Matthias Georg SCHWAB, Klaus MUELLEN, Hermann SACHDEV, Nils-Eike WEBER, Axel BINDER
  • Publication number: 20170062744
    Abstract: The present invention relates to a cyclic amine surface modifier. In addition the present invention also relates to organic electronic devices comprising such cyclic amine surface modifier.
    Type: Application
    Filed: February 16, 2015
    Publication date: March 2, 2017
    Applicants: MERCK PATENT GMBH, INNOVATIONLAB GMBH, TECHNISCHE UNIVERSITAET BRAUNSCHWEIG, MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENS CHAFTEN E.V.
    Inventors: Malte JESPER, Manuel HAMBURGER, Janusz SCHINKE, Milan ALT, Klaus MUELLEN
  • Publication number: 20170062722
    Abstract: The present invention relates to a methoxyaryl surface modifier. In addition the present invention also relates to organic electronic devices comprising such methoxyaryl surface modifier.
    Type: Application
    Filed: February 16, 2015
    Publication date: March 2, 2017
    Applicants: Merck Patent GmbH, InnovationLab GmbH, Technische Universitaet Braunschweig, Max-Planck-Gesellschaft Zur Foerderung Der Wissens chaften E.V.
    Inventors: Malte JESPER, Manuel HAMBURGER, Janusz SCHINKE, Milan ALT, Klaus MUELLEN
  • Publication number: 20170051101
    Abstract: Provided are graphene nanoribbons with controlled zig-zag edge and cove edge configuration and methods for preparing such graphene nanoribbons. The nanoribbons are selected from the following formulae.
    Type: Application
    Filed: February 9, 2015
    Publication date: February 23, 2017
    Applicants: BASF SE, EMPA-Eidgenoessische Materialpruefungs- Und Forschngsanstalt, Max-Planck-Geselischaft zur Foerderung der Wissenschaften e.V.
    Inventors: Matthias Georg SCHWAB, Klaus MUELLEN, Xinliang FENG, Bo YANG, Tim DUMSLAFF, Roman FASEL, Pascal RUFFIEUX, Jia LIU, Jinming CAI, Carlos SANCHEZ-SANCHEZ, Junzhi LIU
  • Patent number: 9550678
    Abstract: An oligophenylene monomer of general formula (I) wherein R1 and R2 are independently of each other H, halogene, —OH, —NH2, —CN, —NO2 or a linear or branched, saturated or unsaturated C1-C40 hydrocarbon residue, which can be substituted 1-to 5-fold with halogene (F, Cl, Br, I), —OH, —NH2, —CN and/or —NO2, and wherein one or more CH2-groups can be replaced by —O— or —S—, or an optionally substituted aryl, alkylaryl or alkoxyaryl residue; and m represents 0, 1 or 2.
    Type: Grant
    Filed: December 17, 2012
    Date of Patent: January 24, 2017
    Assignees: BASF SE, Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V.
    Inventors: Matthias Georg Schwab, Akimitsu Narita, Xinliang Feng, Klaus Muellen
  • Publication number: 20170018717
    Abstract: The present invention relates to compounds of the formula I wherein X1, X2 are O or C(CN)2; A is selected from wherein, if present, X3, X4 are O or C(CN)2 and m, R4a, R4b, R5a, R5b, R6a, R6b, R6c, R6d, R7a, R7a, R8a, R8b, R9, R10a, R10b, Rm1, Rm2, Rm3 and Rm4 are as defined in the claims and description. The present invention also relates to a method for their preparation and their use as semiconductors, in particular as semiconductors in organic electronics and organic photovoltaics.
    Type: Application
    Filed: February 24, 2015
    Publication date: January 19, 2017
    Inventors: THOMAS GESSNER, Helmut REICHELT, Thomas WEITZ, Michael EUSTACHI, Daniel JAENSCH, Long CHEN, Artem N. SKABEEV, Klaus MUELLEN, Hans REICHERT
  • Publication number: 20160333141
    Abstract: Provided are graphene nanoribbon precursors comprising repeated units of the general formula (I) in which R1, R2 are each H, halogen, —OH, —NH2, —CN, —NO2 or a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), —OH, —NH2, —CN, and/or —NO2, where one or more CH2 groups may also be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR—, in which R is an optionally substituted C1C40-hydrocarbyl radical, or an optionally substituted aryl, alkylaryl or alkoxyaryl radical.
    Type: Application
    Filed: July 26, 2016
    Publication date: November 17, 2016
    Applicants: BASF SE, Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.
    Inventors: Matthias Georg SCHWAB, Klaus MUELLEN, Xinliang FENG, Lukas DOESSEL
  • Patent number: 9493422
    Abstract: Compounds of the general formula (I) and compounds of the general formula (II) Use of compounds (I) or (II) as visible or invisible markers, for staining materials, in the laser welding of materials, for detecting bases, acids or pH changes, as a dispersing assistant, pigment additive for organic pigments and intermediates for the production of pigment additives, in heat management or energy management, in photovoltaics or in optical data storage.
    Type: Grant
    Filed: May 20, 2009
    Date of Patent: November 15, 2016
    Assignees: BASF SE, Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.
    Inventors: Thomas Gessner, Helmut Reichelt, Klaus Muellen, Zhihong Liu, Chen Li
  • Patent number: 9434619
    Abstract: Provided are graphene nanoribbon precursors comprising repeated units of the general formula (I) in which R1, R2 are each H, halogen, —OH, —NH2, —CN, —NO2 or a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), —OH, —NH2, —CN, and/or —NO2, where one or more CH2 groups may also be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR—, in which R is an optionally substituted C1C40-hydrocarbyl radical, or an optionally substituted aryl, alkylaryl or alkoxyaryl radical.
    Type: Grant
    Filed: October 24, 2012
    Date of Patent: September 6, 2016
    Assignees: BASF SE, Max-Planck-Gesellschaft zur Foerderung der Wissenshaften e.V.
    Inventors: Matthias Georg Schwab, Klaus Muellen, Xinliang Feng, Lukas Doessel
  • Patent number: 9428518
    Abstract: A sensitizer in a dye-sensitized solar cell, including a compound of formula (I?) where: R1 and R2 are hydrogen, a halogen, an alkyl group, a cycloalkyl group, an aryl group, a hetaryl group, an alkoxy group, an aryloxy group, an arylthio group, a hetaryloxy group, a hetarylthio group, a diarylamino group, or a dialkylamino group; m, n are each independently an integer from 0-4; X is sulfur, oxygen, or NR3, where R3 is hydrogen, an alkyl group, a cycloalkyl group, an aryl group, or a hetaryl group; Y1 is oxygen or N—Z-A, where A is —COOM, —SO3M, or —PO3M, where M is hydrogen, an alkali metal cation, or [NR?]4+, where each R? is independently hydrogen or an alkyl group, and where Z is C1-C6-alkylene or 1,4-phenylene, where the phenylene radical is optionally substituted by one or more alkyl, nitro, cyano, and halogen substituents.
    Type: Grant
    Filed: March 12, 2014
    Date of Patent: August 30, 2016
    Assignees: BASF SE, Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.
    Inventors: Henrike Wonneberger, Neil Gregory Pschirer, Flavio Luiz Benedito, Ingmar Bruder, Robert Send, Yulian Zagranyarski, Chen Li, Klaus Muellen, Long Chen, Artem Nikolaevich Skabeev
  • Publication number: 20160225991
    Abstract: The present invention relates to the use of an amine precursor of formula I (X1—R1)n—NH(3-n) (I) or its ammonium salts for depositing a graphene film having a nitrogen content of from 0 to 65% by weight on a substrate S1 by chemical vapor deposition (CVD), wherein R1 is selected from (a) C1 to C10 alkanediyl, which may all optionally be interrupted by at least one of O, NH and NR2, (b) alkenediyl, which may all optionally be interrupted by at least one of O, NH and NR2, (c) alkynediyl, which may all optionally be interrupted by at least one of O, NH and NR2, (d) C6 to C20 aromatic divalent moiety, and (e) CO and CH2CO, X1 is selected from H, OH, OR2, NH2, NHR2, or NR22, wherein two groups X1 may together form a bivalent group X2 being selected from a chemical bond, O, NH, or NR2, R2 is selected from C1 to C10 alkyl and a C6 to C20 aromatic moiety which may optionally be substituted by one or more substituents X1, n is 1, 2, or 3.
    Type: Application
    Filed: September 29, 2014
    Publication date: August 4, 2016
    Inventors: Matthias Georg Schwab, Klaus Müllen, Hermann Sachdev, Yoshikazu Ito
  • Publication number: 20160207774
    Abstract: Oligophenylene monomers for the synthesis of polymeric precursors for the preparation of graphene nanoribbons, the polymeric precursors, and methods for preparing them, as well as methods for preparing the graphene nauoribbons from the polymeric precursors and the monomers are provided.
    Type: Application
    Filed: March 28, 2016
    Publication date: July 21, 2016
    Applicants: BASF SE, Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.
    Inventors: Sorin IVANOVICI, Matthias SCHWAB, Xinliang FENG, Klaus MUELLEN
  • Patent number: 9385326
    Abstract: The present invention related to thermally stable p-conducting oligomers and polymers of triangulene of formula (I) and their use in dye sensitized solar cells.
    Type: Grant
    Filed: January 14, 2014
    Date of Patent: July 5, 2016
    Assignees: BASF SE, Max-Planck-Gesellschaft zur Foerderung der Wissenschafen e.V.
    Inventors: Henrike Wonneberger, Ingmar Bruder, Robert Send, Florian Schluetter, Klaus Muellen, Milan Kivala
  • Patent number: 9382264
    Abstract: The present invention provides the compounds of formulae (3) and (1), wherein n is 0 or 1, R11 and R12 are the same and are selected from the group consisting of CN, OR300, Si(R301)3, NHR302, NR303R304, SR305 and R306, or R11 and R12 together are selected from the group consisting of (a), (b), and (c) and X is Cl, Br or I, and a process for the preparation of compounds of formula (3) comprising the compounds of formula (1) as key intermediates.
    Type: Grant
    Filed: August 27, 2013
    Date of Patent: July 5, 2016
    Assignees: BASF SE, MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN E.V.
    Inventors: Thomas Gessner, Helmut Reichelt, Yulian Zagranyarski, Long Chen, Chen Li, Klaus Muellen
  • Patent number: 9359675
    Abstract: Two-dimensional nanomaterials are produced in a process comprising the steps of (a) providing (a1) a mixture comprising graphene oxide particles, water and at least one cationic surfactant and/or nonionic surfactant or (a2) a mixture comprising graphene particles, at least one solvent useful for solution exfoliation of graphite and at least one cationic surfactant and/or nonionic surfactant, (b) adding at least one sol precursor compound to the mixture from step (a), (c) reacting the mixture from step (b) in a sol/gel process to form gel from the at least one sol precursor compound on the graphene oxide particles or, respectively, the graphene particles, (d) removing the at least one surfactant, and (e) optionally heating the gel-coated graphene oxide particles for at least 1 min to at least 500° C. under inert gas atmosphere to reduce the graphene oxide to graphene.
    Type: Grant
    Filed: April 21, 2011
    Date of Patent: June 7, 2016
    Assignees: BASF SE, Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V.
    Inventors: Sorin Ivanovici, Shubin Yang, Xinliang Feng, Klaus Müllen
  • Publication number: 20160024106
    Abstract: The present invention relates to the use of a compound of formula I: in dye-sensitized solar cells. It also relates to a compound of formula I?: to a compound of formula I?: to the use of a compound of formula II: as a precursor compound for manufacturing the compound of formula I when q is 0 or 1 and as a precursor compound for manufacturing the compound of formula I? when q is 1; to a compound of formula III: to the use of the compounds of formulae I, I? or I? as sensitizers in dye-sensitized solar cells; and to such dye-sensitized solar cells.
    Type: Application
    Filed: March 12, 2014
    Publication date: January 28, 2016
    Applicants: BASF SE, Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.
    Inventors: Henrike WONNEBERGER, Neil Gregory PSCHIRER, Flavio Luiz BENEDITO, Ingmar BRUDER, Robert SEND, Yullian ZAGRANYARSKI, Chen LI, Klaus MUELLEN, Long CHEN, Artem Nikolaevich SKABEEV
  • Patent number: 9243089
    Abstract: Copolymer-modified nanoparticles produced by a process in which nanoparticles are ablated by laser radiation from a surface of a substrate in a liquid include an amphiphilic copolymer.
    Type: Grant
    Filed: April 19, 2011
    Date of Patent: January 26, 2016
    Inventors: Stephan Barcikowski, Christin Menneking, Markus Klapper, Klaus Müllen, Michael Hoffmann, Simon Stelzig, Dennis Langanke, Helmut Goldmann
  • Publication number: 20150333124
    Abstract: The present invention relates to a process for edge-halogenation of a graphene material; wherein the graphene material, which is selected from graphene, a graphene nanoribbon, a graphene molecule, or a mixture thereof, is reacted with a halogen-donor compound in the presence of a Lewis acid, so as to obtain an edge-halogenated graphene material.
    Type: Application
    Filed: December 2, 2013
    Publication date: November 19, 2015
    Applicants: BASF SE, MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V.
    Inventors: Tobias Hintermann, Klaus Muellen, Xinliang Feng, Yuan-Zhi Tan