Patents by Inventor Koen Cuypers
Koen Cuypers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240036477Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.Type: ApplicationFiled: September 8, 2023Publication date: February 1, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Erik Henricus Egidius Catharina EUMMELEN, Frank Debougnoux, Koen Cuypers, Han Henricus Aldegonda Lempens, Theodorus Wilhelmus Polet, Jorge Alberto Vieyra Salas, John Maria Bombeeck, Johannes Cornelis Paulus Melman, Giovanni Luca Gattobigio
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Patent number: 11860546Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: GrantFiled: September 23, 2022Date of Patent: January 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
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Publication number: 20230333480Abstract: A fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus so that a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system including a replaceable plate with an outer surface that includes a plurality of fluid openings configured for supply and/or extraction of immersion liquid and/or gas in a channel between the fluid handling system and the substrate, wherein the outer surface is coated.Type: ApplicationFiled: November 25, 2021Publication date: October 19, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Christianus Wilhelmus Johannes BERENDSEN, Theodorus Wilhelmus POLET, Erik Henricus Egidius Catharina EUMMELEN, Giovanni Luca GATTOBIGIO, Koen CUYPERS
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Patent number: 11774857Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.Type: GrantFiled: June 13, 2022Date of Patent: October 3, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Erik Henricus Egidius Catharina Eummelen, Frank Debougnoux, Koen Cuypers, Han Henricus Aldegonda Lempens, Theodorus Wilhelmus Polet, Jorge Alberto Vieyra Salas, John Maria Bombeeck, Johannes Cornelis Paulus Melman, Giovanni Luca Gattobigio
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Publication number: 20230053840Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: ApplicationFiled: September 23, 2022Publication date: February 23, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Pepijn VAN DEN EIJNDEN, Cornelius Maria ROPS, Theodorus Wilhelmus POLET, Floor Lodewijk KEUKENS, Gheorghe TANASA, Rogier Hendrikus Magdalena CORTIE, Koen CUYPERS, Harold Sebastiaan BUDDENBERG, Giovanni Luca GATTOBIGIO, Evert VAN VLIET, Nicolaas TEN KATE, Mark Johannes Hermanus FRENCKEN, Jantien Laura VAN ERVE, Marcel Maria Cornelius Franciscus TEUNISSEN
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Publication number: 20220308459Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.Type: ApplicationFiled: June 13, 2022Publication date: September 29, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Erik Henricus Egidius Catharina EUMMELEN, Frank Debougnoux, Koen Cuypers, Han Henricus Aldegonda Lempens, Theodorus Wilhelmus Polet, Jorge Alberto Vieyra Salas, John Maria Bombeeck, Johannes Cornelis Paulus Melman, Giovanni Luca Gattobigio
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Patent number: 11454892Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: GrantFiled: May 10, 2021Date of Patent: September 27, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
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Patent number: 11372336Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.Type: GrantFiled: November 1, 2017Date of Patent: June 28, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Erik Henricus Egidius Catharina Eummelen, Frank Debougnoux, Koen Cuypers, Han Henricus Aldegonda Lempens, Theodorus Wilhelmus Polet, Jorge Alberto Vieyra Salas, John Maria Bombeeck, Johannes Cornelis Paulus Melman, Giovanni Luca Gattobigio
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Publication number: 20220075264Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.Type: ApplicationFiled: November 12, 2021Publication date: March 10, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Stef Marten Johan JANSSENS, Koen CUYPERS, Rogier Hendrikus Magdalena CORTIE, Sudhir SRIVASTAVA, Theodorus Johannes Antonius RENCKENS, Jeroen Gerard GOSEN, Erik Henricus Egidius Catharina EUMMELEN, Hendrikus Johannes SCHELLENS, Adrianus Marinus Wouter HEEREN, Bo LENSSEN
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Patent number: 11199771Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.Type: GrantFiled: September 18, 2017Date of Patent: December 14, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Stef Marten Johan Janssens, Koen Cuypers, Rogier Hendrikus Magdalena Cortie, Sudhir Srivastava, Theodorus Johannes Antonius Renckens, Jeroen Gerard Gosen, Erik Henricus Egidius Catharina Eummelen, Hendrikus Johannes Schellens, Adrianus Marinus Wouter Heeren, Bo Lenssen
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Publication number: 20210263424Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: ApplicationFiled: May 10, 2021Publication date: August 26, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Pepijn VAN DEN EIJNDEN, Cornelius Maria ROPS, Theodorus Wilhelmus POLET, Floor Lodewijk KEUKENS, Gheorghe TANASA, Rogier Hendrikus Magdalena CORTIE, Koen CUYPERS, Harold Sebastiaan BUDDENBERG, Giovanni Luca GATTOBIGIO, Evert VAN VLIET, Nicolaas TEN KATE, Mark Johannes Hermanus FRENCKEN, Jantien Laura VAN ERVE, Marcel Maria Cornelius Franciscus TEUNISSEN
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Patent number: 11029607Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: GrantFiled: August 28, 2017Date of Patent: June 8, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
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Publication number: 20210096471Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.Type: ApplicationFiled: November 1, 2017Publication date: April 1, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Erik Henricus Egidius Catharina EUMMELEN, Frank DEBOUGNOUX, Koen CUYPERS, Han Henricus Aldegonda LEMPENS, Theodoras Wilhelmus POLET, Jorge Alberto VIEYRA SALAS, John Maria BOMBEECK, Johannes Cornelis Paulus MELMAN, Giovanni Luca GATTOBIGIO
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Publication number: 20200409270Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: ApplicationFiled: August 28, 2017Publication date: December 31, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Pepijn VAN DEN EIJNDEN, Cornelius Maria ROPS, Theodorus Wilhelmus POLET, Floor Lodewijk KEUKENS, Gheorghe TANASA, Rogier Hendrikus Magdalen CORTIE, Koen CUYPERS, Harold Sebastiaan BUDDENBERG, Giovanni Luca GATTOBIGIO, Evert VAN VLIET, Nicolaas TEN KATE, Mark Johannes Hermanus FRENCKEN, Jantien Laura VAN ERVE, Marcel Maria Cornelius Franciscu TEUNISSEN
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Publication number: 20200041895Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.Type: ApplicationFiled: September 18, 2017Publication date: February 6, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Stef Marten Johan JANSSENS, Koen CUYPERS, Rogier Hendrikus Magdalena CORTIE, Sudhir SRIVASTAVA, Theodorus Johannes Antonius RENCKENS, Jeroen Gerard GOSEN, Erik Henricus Egidius Catharina EUMMELEN, Hendrikus Johannes SCHELLENS, Adrianus Marinus Wouter HEEREN, Bo LENSSEN
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Patent number: 10031428Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.Type: GrantFiled: February 20, 2014Date of Patent: July 24, 2018Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Koen Cuypers, Marcelo Henrique De Andrade Oliveira, Marinus Jan Remie, Chattarbir Singh, Laurentius Johannes Adrianus Van Bokhoven, Henricus Anita Jozef Wilhemus Van De Ven, José Nilton Fonseca Junior, Frank Johannes Jacobus Van Boxtel, Daniel Nathan Burbank, Erik Roelof Loopstra, Johannes Onvlee, Mark Josef Schuster, Robertus Nicodemus Jacobus Van Ballegoij, Christopher Charles Ward, Jan Steven Christiaan Westerlaken
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Patent number: 9939740Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.Type: GrantFiled: January 20, 2015Date of Patent: April 10, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Günes Nakiboglu, Martijn Van Baren, Frank Johannes Jacobus Van Boxtel, Koen Cuypers, Jeroen Gerard Gosen, Laurentius Johannes Adrianus Van Bokhoven
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Publication number: 20160349631Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.Type: ApplicationFiled: January 20, 2015Publication date: December 1, 2016Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Martijn VAN BAREN, Frank Johannes Jacobs VAN BOXTEL, Koen CUYPERS, Jeroen Gerard GOSEN, Laurentius Johannes Adrianus VAN BOKHOVEN
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Publication number: 20150355557Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.Type: ApplicationFiled: February 20, 2014Publication date: December 10, 2015Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Koen CUYPERS, Marcelo Henrique DE ANDRADE OLIVEIRA, Marinus Jan REMIE, Chattarbir SINGH, Laurentius Johannes Adrianus VAN BOKHOVEN, Henricus Anita Jozef Wilhemus VAN DE VEN, José Nilton FONSECA JUNIOR, Frank Johannes Jacobus VAN BOXTEL, Daniel Nathan BURBANK, Erik Roelof LOOPSTRA, Johannes ONVLEE, Mark Josef SCHUSTER, Robertus Nicodemus Jacobus VAN BALLEGOIJ, Christopher Charles WARD, Jan Steven Christiaan WESTERLAKEN
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Patent number: 9013673Abstract: An immersion lithographic apparatus is provided having a table configured to support a substrate; a sensor or target for a sensor is provided on a surface of the table and a cover is provided extending from an edge of the table; in addition, a liquid displacement device is provided including a gas outlet configured to direct a localized gas flow towards the sensor or target so as to displace liquid from the sensor or target over the cover and off the table.Type: GrantFiled: November 23, 2010Date of Patent: April 21, 2015Assignee: ASML Netherlands B.V.Inventors: Jeroen Gerard Gosen, Koen Cuypers