Abstract: An apparatus for manufacturing an integrated thin film solar cell in which a plurality of unit cells are electrically connected in series to each other in vacuum may be provided that includes: a photoelectric converter forming process chamber which forms a photoelectric converter by emitting a photoelectric conversion material on a substrate where a first conductive layer has been formed from one basic line within each of a plurality of trenches formed in the substrate to a bottom of each of the trenches, to one side continuous from the bottom, and to a protruding surface of the substrate, which is continuous from the one side; and a second conductive layer forming process chamber which forms a second conductive layer from another basic line within each of the trenches to the bottom of each of the trenches, to the other side continuous from the bottom, and to a protruding surface of the substrate, which is continuous from the other side.

Abstract: Disclosed is a method for manufacturing a photovoltaic device.

Abstract: Disclosed are a thin film solar cell and a method of manufacturing the thin film solar cell. The thin film solar cell according to an exemplary embodiment of the present invention thin film solar cell includes a substrate: a front electrode layer formed on the substrate; an oxide layer formed on the front electrode layer: a light absorbing layer (intrinsic layer) formed on the oxide layer; and a back electrode layer formed on the light absorbing layer, wherein the oxide layer is formed of a material selected from MoO3, WO3, V2O5, NiO and CrO3.

Abstract: Provided is a method of manufacturing a see-through-type integrated solar cell and a method of manufacturing the same. The method comprises forming a first conductive material being apart and strip patterned on a transparent substrate so that the first conductive material comprises a predetermined space for enabling light to directly pass through the transparent substrate, forming a solar cell (semiconductor) layer, obliquely depositing a second conductive material and etching the solar cell layer using the second conductive material layer as a mask.

Abstract: The present invention relates to a material pattern, and mold using thereof, metal thin-film pattern, metal pattern, and method of forming the sames. A method of forming the material pattern according to the present invention comprises the steps of; (a) forming a photo-sensitive material film by coating a photo-sensitive material on a substrate; (b) deciding an exposure section on the photo-sensitive material film; (c) disposing a light refraction film and a light diffusion film at a route of light exposed on the photo-sensitive material film; and (d) forming a pattern on the photo-sensitive material film, by projecting a light on the exposure section of the photo-sensitive material film, wherein the light transmits the light refraction film and the light diffusion film.

Abstract: Provided are an integrated thin-film solar cell and a method of manufacturing the same. The method comprises forming and patterning a conductive material to be adjacently spaced a predetermined distance apart from each other on a substrate; forming a solar cell (semiconductor) layer on the resultant substrate; obliquely depositing a first transparent conductive material on the solar cell layer; etching the solar cell layer using the first transparent conductive material as a mask; and obliquely depositing a second transparent conductive material on the resultant substrate, and electrically connecting the conductive material with the first transparent conductive material.

Abstract: Provided are an integrated thin-film solar cell and a method of manufacturing the same. The method comprises forming and patterning a conductive material to be adjacently spaced a predetermined distance apart from each other on a substrate; forming a solar cell (semiconductor) layer on the resultant substrate; obliquely depositing a first transparent conductive material on the solar cell layer; etching the solar cell layer using the first transparent conductive material as a mask; and obliquely depositing a second transparent conductive material on the resultant substrate, and electrically connecting the conductive material with the first transparent conductive material.

Abstract: Provided are an integrated thin-film solar cell and a method of manufacturing the same. The method comprises forming and patterning a conductive material to be adjacently spaced a predetermined distance apart from each other on a substrate; forming a solar cell (semiconductor) layer on the resultant substrate; obliquely depositing a first transparent conductive material on the solar cell layer; etching the solar cell layer using the first transparent conductive material as a mask; and obliquely depositing a second transparent conductive material on the resultant substrate, and electrically connecting the conductive material with the first transparent conductive material.

Abstract: Disclosed is an integrated thin film photovoltaic device. The integrated thin film photovoltaic device includes: a substrate including trenches formed therein; a first semiconductor material layer formed on the substrate from a first basic line within each of the trenches through one side of each of the trenches to the projected surface of the substrate, which is adjacent to the one side; a second semiconductor material layer formed on a resultant substrate from a second basic line on the first semiconductor material layer within each of the trenches through the other side of each of the trenches to the projected surface of the resultant substrate, which is adjacent to the other side, so that a portion of the first semiconductor material layer and a portion of the second semiconductor material layer are overlapped with each other within each of the trenches.

Abstract: A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a light adjusting layer in an optical path of light shone on the polymer or resist layer, and adjusting the light adjusting layer to adjust a direction or intensity of the light shone on the polymer or resist layer. Based on the method, it is easy to fabricate a polymer or resist pattern, a metal film pattern, metal pattern structure, and a polymer mold, each having three-dimensional structures with various slopes or shapes by adjusting a direction or intensity of incident light when performing a lithography process.

Abstract: The present invention relates to integrated thin film solar cells, and more particularly, to integrated thin film solar cells, which minimize the loss of integrated solar cells caused at the time of a manufacturing process and become available at a low cost process, and a method of manufacturing thereof, a processing method of a transparent electrode for integrated thin film solar cells, which widens an effective area and reduces manufacturing costs by minimizing a (insulating) gap between unit cells of the integrated thin film solar cells, and a structure thereof, and a transparent substrate having the transparent electrode.

Abstract: Disclosed is a method for manufacturing a photovoltaic device.

Abstract: An integrated thin-film solar cell and a method of manufacturing the same.

Abstract: Provided are an integrated thin-film solar cell and a method of manufacturing the same. The method comprises forming and patterning a conductive material to be adjacently spaced a predetermined distance apart from each other on a substrate; forming a solar cell (semiconductor) layer on the resultant substrate; obliquely depositing a first transparent conductive material on the solar cell layer; etching the solar cell layer using the first transparent conductive material as a mask; and obliquely depositing a second transparent conductive material on the resultant substrate, and electrically connecting the conductive material with the first transparent conductive material.

Abstract: Provided are an integrated thin-film solar cell and a method of manufacturing the same. The method comprises forming and patterning a conductive material to be adjacently spaced a predetermined distance apart from each other on a substrate; forming a solar cell (semiconductor) layer on the resultant substrate; obliquely depositing a first transparent conductive material on the solar cell layer; etching the solar cell layer using the first transparent conductive material as a mask; and obliquely depositing a second transparent conductive material on the resultant substrate, and electrically connecting the conductive material with the first transparent conductive material.

Abstract: A projection display apparatus using a microlens array and a micromirror array comprises a substrate, multiple micromirror arrays and multiple microlens arrays. The substrate is disposed apart with a predetermined distance from a light source. The multiple micromirror arrays are disposed over the substrate to be assembled together to have a predetermined incidence angle with respect to the incident rays. The multiple microlens arrays are configured to correspond to the micromirror arrays. More specifically, a first microlens array is disposed in a predetermined region between the light source and the substrate and comprises multiple microlenses. A second microlens array is disposed in a light path of reflection rays reflected from the micromirrors.

Abstract: The present invention relates to a material pattern, and mold using thereof, metal thin-film pattern, metal pattern, and method of forming the sames. A method of forming the material pattern according to the present invention comprises the steps of; (a) forming a photo-sensitive material film by coating a photo-sensitive material on a substrate; (b) deciding an exposure section on the photo-sensitive material film; (c) disposing a light refraction film and a light diffusion film at a route of light exposed on the photo-sensitive material film; and (d) forming a pattern on the photo-sensitive material film, by projecting a light on the exposure section of the photo-sensitive material film, wherein the light transmits the light refraction film and the light diffusion film.

Abstract: The present invention relates to integrated thin film solar cells, and more particularly, to integrated thin film solar cells, which minimize the loss of integrated solar cells caused at the time of a manufacturing process and become available at a low cost process, and a method of manufacturing thereof, a processing method of a transparent electrode for integrated thin film solar cells, which widens an effective area and reduces manufacturing costs by minimizing a (insulating) gap between unit cells of the integrated thin film solar cells, and a structure thereof, and a transparent substrate having the transparent electrode.

Abstract: Provided is a display apparatus using a micromirror or an image display device. The display apparatus is designed to eliminate dark regions, usually formed by pixel partitions or black matrixes, display a high-quality image by increasing light usage efficiency, and improve the power consumption. A display apparatus using a microlens includes a micromirror array, a substrate, and a microlens array. The micromirror array includes a plurality of micromirrors arranged to reflect incident light rays from a light source. The substrate supports the micromirror array. The microlens array includes a plurality of microlenses disposed between the light source and the micromirror array to condense the incident light rays from the light source upon the micromirror array and correct a traveling path of reflected light rays from the micromirror array.

Abstract: A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a light adjusting layer in an optical path of light shone on the polymer or resist layer, and adjusting the light adjusting layer to adjust a direction or intensity of the light shone on the polymer or resist layer. Based on the method, it is easy to fabricate a polymer or resist pattern, a metal film pattern, metal pattern structure, and a polymer mold, each having three-dimensional structures with various slopes or shapes by adjusting a direction or intensity of incident light when performing a lithography process.