Patents by Inventor Kohtaro Kawamura

Kohtaro Kawamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10632419
    Abstract: A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which one or more abatement parts for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless are attached. The one or more abatement parts are selected, depending on the amount and kind of the exhaust gas discharged from the vacuum pump, from plural kinds of abatement parts which have different treatment types of exhaust gas and/or different treatment amounts of exhaust gas.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: April 28, 2020
    Assignee: EBARA CORPORATION
    Inventors: Toshiharu Nakazawa, Tetsuro Sugiura, Kohtaro Kawamura, Toyoji Shinohara, Takashi Kyotani, Keiichi Ishikawa, Seiji Kashiwagi, Yasuhiko Suzuki, Hideo Arai
  • Patent number: 10227926
    Abstract: An exhaust gas abatement system includes an exhaust gas abatement section configured to abate exhaust gases by utilizing thermal energy and to cool the abated gases by using a liquid, a circulating section configured to circulate the liquid within a circulation path as a circulating liquid, a heat exchange tube configured to cool the circulating liquid and to executes a heat exchange between a cooling liquid which flows in an interior of the heat exchange tube and the circulating liquid which flows outside the heat exchange tube, and a circulating liquid storage portion configured to store the circulating liquid. The heat exchange tube is disposed in a heat exchange tube installation space which is in at least part of an interior of the circulating liquid storage portion.
    Type: Grant
    Filed: June 23, 2014
    Date of Patent: March 12, 2019
    Assignee: EBARA CORPORATION
    Inventors: Kazumasa Hosotani, Makoto Kashiwagi, Toyoji Shinohara, Kohtaro Kawamura
  • Patent number: 10143964
    Abstract: A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which at least one abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The abatement part is selected from a plurality of abatement parts having different treatment types of exhaust gas and/or different treatment amounts of exhaust gas and/or different treatment performances of exhaust gas.
    Type: Grant
    Filed: May 21, 2014
    Date of Patent: December 4, 2018
    Assignee: EBARA CORPORATION
    Inventors: Kohtaro Kawamura, Toyoji Shinohara, Tetsuro Sugiura, Hideo Arai, Takashi Kyotani, Toshiharu Nakazawa, Keiichi Ishikawa, Seiji Kashiwagi, Yasuhiko Suzuki
  • Publication number: 20180207580
    Abstract: A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which one or more abatement parts for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless are attached. The one or more abatement parts are selected, depending on the amount and kind of the exhaust gas discharged from the vacuum pump, from plural kinds of abatement parts which have different treatment types of exhaust gas and/or different treatment amounts of exhaust gas.
    Type: Application
    Filed: March 20, 2018
    Publication date: July 26, 2018
    Inventors: Toshiharu NAKAZAWA, Tetsuro SUGIURA, Kohtaro KAWAMURA, Toyoji SHINOHARA, Takashi KYOTANI, Keiichi ISHIKAWA, Seiji KASHIWAGI, Yasuhiko SUZUKI, Hideo ARAI
  • Patent number: 9956524
    Abstract: A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which one or more abatement parts for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless are attached. The one or more abatement parts are selected, depending on the amount and kind of the exhaust gas discharged from the vacuum pump, from plural kinds of abatement parts which have different treatment types of exhaust gas and/or different treatment amounts of exhaust gas.
    Type: Grant
    Filed: May 28, 2014
    Date of Patent: May 1, 2018
    Assignee: Ebara Corporation
    Inventors: Toshiharu Nakazawa, Tetsuro Sugiura, Kohtaro Kawamura, Toyoji Shinohara, Takashi Kyotani, Keiichi Ishikawa, Seiji Kashiwagi, Yasuhiko Suzuki, Hideo Arai
  • Patent number: 9822974
    Abstract: A vacuum pump includes a vacuum pump having a discharge port to which an abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The vacuum pump includes a cylindrical member having an exhaust gas introduction port for introducing the exhaust gas to be treated and a gas outlet port for discharging gases which have been treated, a plurality of fuel nozzles provided at a circumferential wall of the cylindrical member for ejecting a fuel, and a plurality of air nozzles provided at the circumferential wall of the cylindrical member for ejecting air so as to form a swirling flow of air along an inner circumferential surface of the circumferential wall. The air nozzles are disposed at a plurality of stages spaced in an axial direction of the cylindrical member.
    Type: Grant
    Filed: March 26, 2014
    Date of Patent: November 21, 2017
    Assignee: EBARA CORPORATION
    Inventors: Kohtaro Kawamura, Toyoji Shinohara, Tetsuro Sugiura, Hideo Arai, Toshiharu Nakazawa, Keiichi Ishikawa, Seiji Kashiwagi, Yasuhiko Suzuki, Takashi Kyotani
  • Patent number: 9625168
    Abstract: An exhaust system (2) is used for evacuating a chamber of a manufacturing apparatus (1) for manufacturing semiconductor devices, liquid crystal panels, LEDs, or solar cells. The exhaust system (2) includes a vacuum pump apparatus (3) for evacuating the chamber, an exhaust gas treatment apparatus (5) for treating an exhaust gas discharged from the chamber, and a controller (6) for controlling the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5). Information of operation process of the manufacturing apparatus (1), and the kind of gas and the flow rate of the gas supplied to the manufacturing apparatus (1) is inputted into the controller (6) to control the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5).
    Type: Grant
    Filed: July 25, 2011
    Date of Patent: April 18, 2017
    Assignee: Ebara Corporation
    Inventors: Toyoji Shinohara, Kohtaro Kawamura, Toshiharu Nakazawa
  • Patent number: 9364786
    Abstract: A vacuum pump has a discharge port coupled to an abatement chamber for treating an exhaust gas discharged from a chamber of a manufacturing apparatus to make the exhaust gas harmless. The vacuum pump is coupled to a heat exchanger configured to heat an inert gas by using heat generated when the exhaust gas is treated to be made harmless in the abatement part. The inert gas heated by the heat exchanger is introduced into the vacuum pump.
    Type: Grant
    Filed: March 26, 2014
    Date of Patent: June 14, 2016
    Assignee: Ebara Corporation
    Inventors: Kohtaro Kawamura, Toyoji Shinohara, Tetsuro Sugiura, Hideo Arai, Takashi Kyotani, Toshiharu Nakazawa, Keiichi Ishikawa, Seiji Kashiwagi, Yasuhiko Suzuki
  • Publication number: 20150000870
    Abstract: An exhaust gas abatement system includes an exhaust gas abatement section configured to abate exhaust gases by utilizing thermal energy and to cool the abated gases by using a liquid, a circulating section configured to circulate the liquid within a circulation path as a circulating liquid, a heat exchange tube configured to cool the circulating liquid and to executes a heat exchange between a cooling liquid which flows in an interior of the heat exchange tube and the circulating liquid which flows outside the heat exchange tube, and a circulating liquid storage portion configured to store the circulating liquid. The heat exchange tube is disposed in a heat exchange tube installation space which is in at least part of an interior of the circulating liquid storage portion.
    Type: Application
    Filed: June 23, 2014
    Publication date: January 1, 2015
    Inventors: Kazumasa Hosotani, Makoto Kashiwagi, Toyoji Shinohara, Kohtaro Kawamura
  • Publication number: 20140352820
    Abstract: A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which one or more abatement parts for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless are attached. The one or more abatement parts are selected, depending on the amount and kind of the exhaust gas discharged from the vacuum pump, from plural kinds of abatement parts which have different treatment types of exhaust gas and/or different treatment amounts of exhaust gas.
    Type: Application
    Filed: May 28, 2014
    Publication date: December 4, 2014
    Applicant: EBARA CORPORATION
    Inventors: Toshiharu NAKAZAWA, Tetsuro SUGIURA, Kohtaro KAWAMURA, Toyoji SHINOHARA, Takashi KYOTANI, Keiichi ISHIKAWA, Seiji KASHIWAGI, Yasuhiko SUZUKI, Hideo ARAI
  • Publication number: 20140348717
    Abstract: A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which at least one abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The abatement part is selected from a plurality of abatement parts having different treatment types of exhaust gas and/or different treatment amounts of exhaust gas and/or different treatment performances of exhaust gas.
    Type: Application
    Filed: May 21, 2014
    Publication date: November 27, 2014
    Applicant: EBARA CORPORATION
    Inventors: Kohtaro KAWAMURA, Toyoji SHINOHARA, Tetsuro SUGIURA, Hideo ARAI, Takashi KYOTANI, Toshiharu NAKAZAWA, Keiichi ISHIKAWA, Seiji KASHIWAGI, Yasuhiko SUZUKI
  • Publication number: 20140290919
    Abstract: A vacuum pump has an abatement part for treating an exhaust gas discharged from a chamber of a manufacturing apparatus to make the exhaust gas harmless. The vacuum pump includes a heat exchanger configured to heat an inert gas by using heat generated when the exhaust gas is treated to be made harmless in the abatement part. The inert gas heated by the heat exchanger is introduced into the vacuum pump.
    Type: Application
    Filed: March 26, 2014
    Publication date: October 2, 2014
    Inventors: Kohtaro KAWAMURA, Toyoji SHINOHARA, Tetsuro SUGIURA, Hideo ARAI, Takashi KYOTANI, Toshiharu NAKAZAWA, Keiichi ISHIKAWA, Seiji KASHIWAGI, Yasuhiko SUZUKI
  • Publication number: 20140295362
    Abstract: A vacuum pump includes a vacuum pump having a discharge port to which an abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The vacuum pump includes a cylindrical member having an exhaust gas introduction port for introducing the exhaust gas to be treated and a gas outlet port for discharging gases which have been treated, a plurality of fuel nozzles provided at a circumferential wall of the cylindrical member for ejecting a fuel, and a plurality of air nozzles provided at the circumferential wall of the cylindrical member for ejecting air so as to form a swirling flow of air along an inner circumferential surface of the circumferential wall. The air nozzles are disposed at a plurality of stages spaced in an axial direction of the cylindrical member.
    Type: Application
    Filed: March 26, 2014
    Publication date: October 2, 2014
    Inventors: Kohtaro KAWAMURA, Toyoji SHINOHARA, Tetsuro SUGIURA, Hideo ARAI, Toshiharu NAKAZAWA, Keiichi ISHIKAWA, Seiji KASHIWAGI, Yasuhiko SUZUKI, Takashi KYOTANI
  • Publication number: 20130171919
    Abstract: An exhaust system (2) is used for evacuating a chamber of a manufacturing apparatus (1) for manufacturing semiconductor devices, liquid crystal panels, LEDs, or solar cells. The exhaust system (2) includes a vacuum pump apparatus (3) for evacuating the chamber, an exhaust gas treatment apparatus (5) for treating an exhaust gas discharged from the chamber, and a controller (6) for controlling the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5). Information of operation process of the manufacturing apparatus (1), and the kind of gas and the flow rate of the gas supplied to the manufacturing apparatus (1) is inputted into the controller (6) to control the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5).
    Type: Application
    Filed: July 25, 2011
    Publication date: July 4, 2013
    Applicant: EBARA CORPORATION
    Inventors: Toyoji Shinohara, Kohtaro Kawamura, Toshiharu Nakazawa
  • Patent number: 7607914
    Abstract: A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.
    Type: Grant
    Filed: February 23, 2007
    Date of Patent: October 27, 2009
    Assignee: Ebara Corporation
    Inventors: Tetsuo Komai, Kohtaro Kawamura, Takeshi Tsuji, Rikiya Nakamura, Kazutaka Okuda, Keiichi Ishikawa, Tomonori Ohashi, Yoshiro Takemura, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao
  • Publication number: 20070160946
    Abstract: A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.
    Type: Application
    Filed: February 23, 2007
    Publication date: July 12, 2007
    Inventors: Tetsuo Komai, Kohtaro Kawamura, Takeshi Tsuji, Rikiya Nakamura, Kazutaka Okuda, Keiichi Ishikawa, Tomonori Ohashi, Yoshiro Takemura, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao
  • Publication number: 20050271988
    Abstract: A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.
    Type: Application
    Filed: August 18, 2005
    Publication date: December 8, 2005
    Inventors: Tetsuo Komai, Kohtaro Kawamura, Takeshi Tsuji, Rikiya Nakamura, Kazutaka Okuda, Keiichi Ishikawa, Tomonori Ohashi, Yoshiro Takemura, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao
  • Patent number: 6948929
    Abstract: A combustion type waste gas treatment system is capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.
    Type: Grant
    Filed: September 26, 2001
    Date of Patent: September 27, 2005
    Assignee: Ebara Corporation
    Inventors: Tetsuo Komai, Kohtaro Kawamura, Takeshi Tsuji, Rikiya Nakamura, Kazutaka Okuda, Keiichi Ishikawa, Tomonori Ohashi, Yoshiro Takemura, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao
  • Patent number: 6796794
    Abstract: A combustor for waste gas treatment having a flame stabilizing zone surrounded by a peripheral wall and closed with a bottom wall. The flame stabilizing zone is provided to face a combustion chamber. Burner ports for auxiliary combustible gas are provided in the peripheral wall to inject an auxiliary combustible gas into the flame stabilizing zone so as to produce swirling flows. Burner ports for waste gas are provided in the bottom wall to inject a gas into the flame stabilizing zone.
    Type: Grant
    Filed: August 9, 2002
    Date of Patent: September 28, 2004
    Assignee: Ebara Corporation
    Inventors: Yoshiro Takemura, Kohtaro Kawamura, Yuji Shirao, Rikiya Nakamura
  • Patent number: 6797045
    Abstract: A scrubber including a casing having an exhaust gas inlet and an exhaust gas outlet. An impeller is mounted in the casing, and the impeller is rotatable about its own axis. An exhaust gas can be introduced into the center of the impeller through the exhaust gas inlet of the casing. A cleaning liquid discharge nozzle is positioned at the center of the impeller for spraying a cleaning liquid in the impeller. Also, a baffle member is spaced apart from and surrounds the impeller. A mixture of the exhaust gas and the cleaning liquid exiting the impeller impinges on the baffle member. The cleaning liquid discharge nozzle is provided inside and rigidly connected to the impeller so as to rotate together with the impeller. The nozzle has a plurality of cleaning liquid discharge orifices extending radially through a cylindrical wall thereof to discharge a cleaning liquid into the impeller.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: September 28, 2004
    Assignee: Ebara Corporation
    Inventors: Kazutaka Okuda, Kohtaro Kawamura, Takeshi Tsuji, Yuji Shirao, Yoshihiro Ueda