Patents by Inventor Kohtaro Kawamura
Kohtaro Kawamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10632419Abstract: A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which one or more abatement parts for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless are attached. The one or more abatement parts are selected, depending on the amount and kind of the exhaust gas discharged from the vacuum pump, from plural kinds of abatement parts which have different treatment types of exhaust gas and/or different treatment amounts of exhaust gas.Type: GrantFiled: March 20, 2018Date of Patent: April 28, 2020Assignee: EBARA CORPORATIONInventors: Toshiharu Nakazawa, Tetsuro Sugiura, Kohtaro Kawamura, Toyoji Shinohara, Takashi Kyotani, Keiichi Ishikawa, Seiji Kashiwagi, Yasuhiko Suzuki, Hideo Arai
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Patent number: 10227926Abstract: An exhaust gas abatement system includes an exhaust gas abatement section configured to abate exhaust gases by utilizing thermal energy and to cool the abated gases by using a liquid, a circulating section configured to circulate the liquid within a circulation path as a circulating liquid, a heat exchange tube configured to cool the circulating liquid and to executes a heat exchange between a cooling liquid which flows in an interior of the heat exchange tube and the circulating liquid which flows outside the heat exchange tube, and a circulating liquid storage portion configured to store the circulating liquid. The heat exchange tube is disposed in a heat exchange tube installation space which is in at least part of an interior of the circulating liquid storage portion.Type: GrantFiled: June 23, 2014Date of Patent: March 12, 2019Assignee: EBARA CORPORATIONInventors: Kazumasa Hosotani, Makoto Kashiwagi, Toyoji Shinohara, Kohtaro Kawamura
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Patent number: 10143964Abstract: A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which at least one abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The abatement part is selected from a plurality of abatement parts having different treatment types of exhaust gas and/or different treatment amounts of exhaust gas and/or different treatment performances of exhaust gas.Type: GrantFiled: May 21, 2014Date of Patent: December 4, 2018Assignee: EBARA CORPORATIONInventors: Kohtaro Kawamura, Toyoji Shinohara, Tetsuro Sugiura, Hideo Arai, Takashi Kyotani, Toshiharu Nakazawa, Keiichi Ishikawa, Seiji Kashiwagi, Yasuhiko Suzuki
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Publication number: 20180207580Abstract: A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which one or more abatement parts for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless are attached. The one or more abatement parts are selected, depending on the amount and kind of the exhaust gas discharged from the vacuum pump, from plural kinds of abatement parts which have different treatment types of exhaust gas and/or different treatment amounts of exhaust gas.Type: ApplicationFiled: March 20, 2018Publication date: July 26, 2018Inventors: Toshiharu NAKAZAWA, Tetsuro SUGIURA, Kohtaro KAWAMURA, Toyoji SHINOHARA, Takashi KYOTANI, Keiichi ISHIKAWA, Seiji KASHIWAGI, Yasuhiko SUZUKI, Hideo ARAI
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Patent number: 9956524Abstract: A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which one or more abatement parts for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless are attached. The one or more abatement parts are selected, depending on the amount and kind of the exhaust gas discharged from the vacuum pump, from plural kinds of abatement parts which have different treatment types of exhaust gas and/or different treatment amounts of exhaust gas.Type: GrantFiled: May 28, 2014Date of Patent: May 1, 2018Assignee: Ebara CorporationInventors: Toshiharu Nakazawa, Tetsuro Sugiura, Kohtaro Kawamura, Toyoji Shinohara, Takashi Kyotani, Keiichi Ishikawa, Seiji Kashiwagi, Yasuhiko Suzuki, Hideo Arai
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Patent number: 9822974Abstract: A vacuum pump includes a vacuum pump having a discharge port to which an abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The vacuum pump includes a cylindrical member having an exhaust gas introduction port for introducing the exhaust gas to be treated and a gas outlet port for discharging gases which have been treated, a plurality of fuel nozzles provided at a circumferential wall of the cylindrical member for ejecting a fuel, and a plurality of air nozzles provided at the circumferential wall of the cylindrical member for ejecting air so as to form a swirling flow of air along an inner circumferential surface of the circumferential wall. The air nozzles are disposed at a plurality of stages spaced in an axial direction of the cylindrical member.Type: GrantFiled: March 26, 2014Date of Patent: November 21, 2017Assignee: EBARA CORPORATIONInventors: Kohtaro Kawamura, Toyoji Shinohara, Tetsuro Sugiura, Hideo Arai, Toshiharu Nakazawa, Keiichi Ishikawa, Seiji Kashiwagi, Yasuhiko Suzuki, Takashi Kyotani
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Patent number: 9625168Abstract: An exhaust system (2) is used for evacuating a chamber of a manufacturing apparatus (1) for manufacturing semiconductor devices, liquid crystal panels, LEDs, or solar cells. The exhaust system (2) includes a vacuum pump apparatus (3) for evacuating the chamber, an exhaust gas treatment apparatus (5) for treating an exhaust gas discharged from the chamber, and a controller (6) for controlling the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5). Information of operation process of the manufacturing apparatus (1), and the kind of gas and the flow rate of the gas supplied to the manufacturing apparatus (1) is inputted into the controller (6) to control the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5).Type: GrantFiled: July 25, 2011Date of Patent: April 18, 2017Assignee: Ebara CorporationInventors: Toyoji Shinohara, Kohtaro Kawamura, Toshiharu Nakazawa
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Patent number: 9364786Abstract: A vacuum pump has a discharge port coupled to an abatement chamber for treating an exhaust gas discharged from a chamber of a manufacturing apparatus to make the exhaust gas harmless. The vacuum pump is coupled to a heat exchanger configured to heat an inert gas by using heat generated when the exhaust gas is treated to be made harmless in the abatement part. The inert gas heated by the heat exchanger is introduced into the vacuum pump.Type: GrantFiled: March 26, 2014Date of Patent: June 14, 2016Assignee: Ebara CorporationInventors: Kohtaro Kawamura, Toyoji Shinohara, Tetsuro Sugiura, Hideo Arai, Takashi Kyotani, Toshiharu Nakazawa, Keiichi Ishikawa, Seiji Kashiwagi, Yasuhiko Suzuki
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Publication number: 20150000870Abstract: An exhaust gas abatement system includes an exhaust gas abatement section configured to abate exhaust gases by utilizing thermal energy and to cool the abated gases by using a liquid, a circulating section configured to circulate the liquid within a circulation path as a circulating liquid, a heat exchange tube configured to cool the circulating liquid and to executes a heat exchange between a cooling liquid which flows in an interior of the heat exchange tube and the circulating liquid which flows outside the heat exchange tube, and a circulating liquid storage portion configured to store the circulating liquid. The heat exchange tube is disposed in a heat exchange tube installation space which is in at least part of an interior of the circulating liquid storage portion.Type: ApplicationFiled: June 23, 2014Publication date: January 1, 2015Inventors: Kazumasa Hosotani, Makoto Kashiwagi, Toyoji Shinohara, Kohtaro Kawamura
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Publication number: 20140352820Abstract: A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which one or more abatement parts for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless are attached. The one or more abatement parts are selected, depending on the amount and kind of the exhaust gas discharged from the vacuum pump, from plural kinds of abatement parts which have different treatment types of exhaust gas and/or different treatment amounts of exhaust gas.Type: ApplicationFiled: May 28, 2014Publication date: December 4, 2014Applicant: EBARA CORPORATIONInventors: Toshiharu NAKAZAWA, Tetsuro SUGIURA, Kohtaro KAWAMURA, Toyoji SHINOHARA, Takashi KYOTANI, Keiichi ISHIKAWA, Seiji KASHIWAGI, Yasuhiko SUZUKI, Hideo ARAI
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Publication number: 20140348717Abstract: A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which at least one abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The abatement part is selected from a plurality of abatement parts having different treatment types of exhaust gas and/or different treatment amounts of exhaust gas and/or different treatment performances of exhaust gas.Type: ApplicationFiled: May 21, 2014Publication date: November 27, 2014Applicant: EBARA CORPORATIONInventors: Kohtaro KAWAMURA, Toyoji SHINOHARA, Tetsuro SUGIURA, Hideo ARAI, Takashi KYOTANI, Toshiharu NAKAZAWA, Keiichi ISHIKAWA, Seiji KASHIWAGI, Yasuhiko SUZUKI
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Publication number: 20140290919Abstract: A vacuum pump has an abatement part for treating an exhaust gas discharged from a chamber of a manufacturing apparatus to make the exhaust gas harmless. The vacuum pump includes a heat exchanger configured to heat an inert gas by using heat generated when the exhaust gas is treated to be made harmless in the abatement part. The inert gas heated by the heat exchanger is introduced into the vacuum pump.Type: ApplicationFiled: March 26, 2014Publication date: October 2, 2014Inventors: Kohtaro KAWAMURA, Toyoji SHINOHARA, Tetsuro SUGIURA, Hideo ARAI, Takashi KYOTANI, Toshiharu NAKAZAWA, Keiichi ISHIKAWA, Seiji KASHIWAGI, Yasuhiko SUZUKI
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Publication number: 20140295362Abstract: A vacuum pump includes a vacuum pump having a discharge port to which an abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The vacuum pump includes a cylindrical member having an exhaust gas introduction port for introducing the exhaust gas to be treated and a gas outlet port for discharging gases which have been treated, a plurality of fuel nozzles provided at a circumferential wall of the cylindrical member for ejecting a fuel, and a plurality of air nozzles provided at the circumferential wall of the cylindrical member for ejecting air so as to form a swirling flow of air along an inner circumferential surface of the circumferential wall. The air nozzles are disposed at a plurality of stages spaced in an axial direction of the cylindrical member.Type: ApplicationFiled: March 26, 2014Publication date: October 2, 2014Inventors: Kohtaro KAWAMURA, Toyoji SHINOHARA, Tetsuro SUGIURA, Hideo ARAI, Toshiharu NAKAZAWA, Keiichi ISHIKAWA, Seiji KASHIWAGI, Yasuhiko SUZUKI, Takashi KYOTANI
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Publication number: 20130171919Abstract: An exhaust system (2) is used for evacuating a chamber of a manufacturing apparatus (1) for manufacturing semiconductor devices, liquid crystal panels, LEDs, or solar cells. The exhaust system (2) includes a vacuum pump apparatus (3) for evacuating the chamber, an exhaust gas treatment apparatus (5) for treating an exhaust gas discharged from the chamber, and a controller (6) for controlling the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5). Information of operation process of the manufacturing apparatus (1), and the kind of gas and the flow rate of the gas supplied to the manufacturing apparatus (1) is inputted into the controller (6) to control the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5).Type: ApplicationFiled: July 25, 2011Publication date: July 4, 2013Applicant: EBARA CORPORATIONInventors: Toyoji Shinohara, Kohtaro Kawamura, Toshiharu Nakazawa
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Patent number: 7607914Abstract: A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.Type: GrantFiled: February 23, 2007Date of Patent: October 27, 2009Assignee: Ebara CorporationInventors: Tetsuo Komai, Kohtaro Kawamura, Takeshi Tsuji, Rikiya Nakamura, Kazutaka Okuda, Keiichi Ishikawa, Tomonori Ohashi, Yoshiro Takemura, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao
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Publication number: 20070160946Abstract: A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.Type: ApplicationFiled: February 23, 2007Publication date: July 12, 2007Inventors: Tetsuo Komai, Kohtaro Kawamura, Takeshi Tsuji, Rikiya Nakamura, Kazutaka Okuda, Keiichi Ishikawa, Tomonori Ohashi, Yoshiro Takemura, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao
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Publication number: 20050271988Abstract: A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.Type: ApplicationFiled: August 18, 2005Publication date: December 8, 2005Inventors: Tetsuo Komai, Kohtaro Kawamura, Takeshi Tsuji, Rikiya Nakamura, Kazutaka Okuda, Keiichi Ishikawa, Tomonori Ohashi, Yoshiro Takemura, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao
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Patent number: 6948929Abstract: A combustion type waste gas treatment system is capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.Type: GrantFiled: September 26, 2001Date of Patent: September 27, 2005Assignee: Ebara CorporationInventors: Tetsuo Komai, Kohtaro Kawamura, Takeshi Tsuji, Rikiya Nakamura, Kazutaka Okuda, Keiichi Ishikawa, Tomonori Ohashi, Yoshiro Takemura, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao
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Patent number: 6796794Abstract: A combustor for waste gas treatment having a flame stabilizing zone surrounded by a peripheral wall and closed with a bottom wall. The flame stabilizing zone is provided to face a combustion chamber. Burner ports for auxiliary combustible gas are provided in the peripheral wall to inject an auxiliary combustible gas into the flame stabilizing zone so as to produce swirling flows. Burner ports for waste gas are provided in the bottom wall to inject a gas into the flame stabilizing zone.Type: GrantFiled: August 9, 2002Date of Patent: September 28, 2004Assignee: Ebara CorporationInventors: Yoshiro Takemura, Kohtaro Kawamura, Yuji Shirao, Rikiya Nakamura
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Patent number: 6797045Abstract: A scrubber including a casing having an exhaust gas inlet and an exhaust gas outlet. An impeller is mounted in the casing, and the impeller is rotatable about its own axis. An exhaust gas can be introduced into the center of the impeller through the exhaust gas inlet of the casing. A cleaning liquid discharge nozzle is positioned at the center of the impeller for spraying a cleaning liquid in the impeller. Also, a baffle member is spaced apart from and surrounds the impeller. A mixture of the exhaust gas and the cleaning liquid exiting the impeller impinges on the baffle member. The cleaning liquid discharge nozzle is provided inside and rigidly connected to the impeller so as to rotate together with the impeller. The nozzle has a plurality of cleaning liquid discharge orifices extending radially through a cylindrical wall thereof to discharge a cleaning liquid into the impeller.Type: GrantFiled: November 8, 2002Date of Patent: September 28, 2004Assignee: Ebara CorporationInventors: Kazutaka Okuda, Kohtaro Kawamura, Takeshi Tsuji, Yuji Shirao, Yoshihiro Ueda