Patents by Inventor Koichi KAJIYOSHI

Koichi KAJIYOSHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10551510
    Abstract: Provided are a data processing apparatus a method of obtaining the characteristic of each pixel and a method of data processing, and a program. A data processing apparatus 100 to correct X-ray intensity data measured by a pixel detector includes a characteristic storage unit 130 to store the characteristic of each pixel in a specific detector, a correction table generation unit 120 to apply a measurement condition input as that in measurement by a specific detector and a value expressing the characteristic of each pixel to an approximate formula expressing the count value of each pixel and to generate a correction table for the specific detector using the calculation result of the approximate formula, and a correction unit 160 to correct the X-ray intensity data measured by the specific detector using the generated correction table.
    Type: Grant
    Filed: July 10, 2015
    Date of Patent: February 4, 2020
    Assignee: RIGAKU CORPORATION
    Inventors: Takuto Sakumura, Yasukazu Nakaye, Yuji Tsuji, Koichi Kajiyoshi, Takeyoshi Taguchi, Kazuyuki Matsushita
  • Publication number: 20180203132
    Abstract: Provided are a data processing apparatus a method of obtaining the characteristic of each pixel and a method of data processing, and a program. A data processing apparatus 100 to correct X-ray intensity data measured by a pixel detector includes a characteristic storage unit 130 to store the characteristic of each pixel in a specific detector, a correction table generation unit 120 to apply a measurement condition input as that in measurement by a specific detector and a value expressing the characteristic of each pixel to an approximate formula expressing the count value of each pixel and to generate a correction table for the specific detector using the calculation result of the approximate formula, and a correction unit 160 to correct the X-ray intensity data measured by the specific detector using the generated correction table.
    Type: Application
    Filed: July 10, 2015
    Publication date: July 19, 2018
    Applicant: Rigaku Corporation
    Inventors: Takuto SAKUMURA, Yasukazu NAKAYE, Yuji TSUJI, Koichi KAJIYOSHI, Takeyoshi TAGUCHI, Kazuyuki MATSUSHITA
  • Patent number: 9558582
    Abstract: An image processing method and an image processing apparatus which remove the effects of cosmic rays, noise and defective pixels without losing data in a specified time and which can correct image data efficiently and with high accuracy are provided. An image processing method of performing correction processing on an abnormal value of X-ray image data is provided which includes the steps of: (S3) determining whether or not there exists a target element with intensity significantly different from intensity of peripheral elements, in a three dimensional space formed with a space axis and a time axis defined by a series of captured image frames; and (S9) replacing the intensity of the target element with a replacement value calculated from the intensity of peripheral elements.
    Type: Grant
    Filed: January 29, 2015
    Date of Patent: January 31, 2017
    Assignee: RIGAKU Corporation
    Inventors: Takuto Sakumura, Yasukazu Nakaye, Koichi Kajiyoshi, Satoshi Mikusu
  • Patent number: 9322792
    Abstract: There is provided an X-ray diffraction apparatus configured to irradiate a sample S on a sample stage with X-rays generated from an X-ray source and detect the X-rays diffracted by a sample using a detector, including a virtual mask setting section and a signal processing section. The detector outputs detection signals according to intensity of the X-rays received by detection elements, for each of the plurality of detection elements forming a detection surface. The virtual mask setting section is capable of setting a virtual mask on the detection surface of the detector, and setting at least an opening dimension of the virtual mask as an opening condition of the virtual mask independently in an X direction and a Y direction. The signal processing section processes the detection signals outputted from the detector according to the opening condition of the virtual mask set in the virtual mask setting section.
    Type: Grant
    Filed: January 27, 2014
    Date of Patent: April 26, 2016
    Assignee: RIGAKU CORPORATION
    Inventors: Shintaro Kobayashi, Toru Mitsunaga, Koichi Kajiyoshi, Kazuyoshi Arai
  • Publication number: 20150213623
    Abstract: An image processing method and an image processing apparatus which remove the effects of cosmic rays, noise and defective pixels without losing data in a specified time and which can correct image data efficiently and with high accuracy are provided. An image processing method of performing correction processing on an abnormal value of X-ray image data is provided which includes the steps of: (S3) determining whether or not there exists a target element with intensity significantly different from intensity of peripheral elements, in a three dimensional space formed with a space axis and a time axis defined by a series of captured image frames; and (S9) replacing the intensity of the target element with a replacement value calculated from the intensity of peripheral elements.
    Type: Application
    Filed: January 29, 2015
    Publication date: July 30, 2015
    Applicant: RIGAKU CORPORATION
    Inventors: Takuto SAKUMURA, Yasukazu NAKAYE, Koichi KAJIYOSHI, Satoshi MIKUSU
  • Publication number: 20150146861
    Abstract: There is provided an X-ray diffraction apparatus configured to irradiate a sample S on a sample stage with X-rays generated from an X-ray source and detect the X-rays diffracted by a sample using a detector, including a virtual mask setting section and a signal processing section. The detector outputs detection signals according to intensity of the X-rays received by detection elements, for each of the plurality of detection elements forming a detection surface. The virtual mask setting section is capable of setting a virtual mask on the detection surface of the detector, and setting at least an opening dimension of the virtual mask as an opening condition of the virtual mask independently in an X direction and a Y direction. The signal processing section processes the detection signals outputted from the detector according to the opening condition of the virtual mask set in the virtual mask setting section.
    Type: Application
    Filed: January 27, 2014
    Publication date: May 28, 2015
    Inventors: Shintaro KOBAYASHI, Toru MITSUNAGA, Koichi KAJIYOSHI, Kazuyoshi ARAI
  • Patent number: 9006673
    Abstract: An X-ray analysis apparatus converts an X-ray intensity distribution of discrete data determined for each pixel, from a first plane where the distribution is known into a second plane where the distribution is not known. The X-ray analysis apparatus projects onto the second plane, a grid point which specifies a pixel on the first plane and an intermediate point between the grid points, as nodes, calculates an area of a region where a polygon expressing a projected pixel specified by the projected nodes overlaps with each pixel on the second plane, to thereby calculate an occupancy ratio of the polygon expressing the projected pixel to each pixel on the second plane and distributes X-ray intensity in the pixel on the first plane to the pixel on the second plane based on the occupancy ratio, to thereby convert the X-ray intensity distribution.
    Type: Grant
    Filed: May 30, 2013
    Date of Patent: April 14, 2015
    Assignee: Rigaku Corporation
    Inventors: Kazuki Ito, Yoshinori Ueji, Koichi Kajiyoshi, Kunio Nishi
  • Publication number: 20140021364
    Abstract: An X-ray analysis apparatus converts an X-ray intensity distribution of discrete data determined for each pixel, from a first plane where the distribution is known into a second plane where the distribution is not known. The X-ray analysis apparatus projects onto the second plane, a grid point which specifies a pixel on the first plane and an intermediate point between the grid points, as nodes, calculates an area of a region where a polygon expressing a projected pixel specified by the projected nodes overlaps with each pixel on the second plane, to thereby calculate an occupancy ratio of the polygon expressing the projected pixel to each pixel on the second plane and distributes X-ray intensity in the pixel on the first plane to the pixel on the second plane based on the occupancy ratio, to thereby convert the X-ray intensity distribution.
    Type: Application
    Filed: May 30, 2013
    Publication date: January 23, 2014
    Inventors: Kazuki ITO, Yoshinori UEJI, Koichi KAJIYOSHI, Kunio NISHI