Patents by Inventor Koichi Orito

Koichi Orito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11800583
    Abstract: A communication system includes a first device and a plurality of second devices, and each of the second devices includes a pairing processing unit, a device information storage unit, and a data control unit. The pairing processing unit performs a pairing process including an authentication process with the first device by using device-specific information of the second device. The device information storage unit stores device information including pairing authentication information. The pairing processing unit performs, by using device-specific information of another second device the pairing process between the first device and the another second device, and stores the pairing authentication information in the device information storage unit. The data control unit transmits the pairing authentication information to the another second device. The data control unit of the another second device stores the received pairing authentication information in the device information storage unit.
    Type: Grant
    Filed: June 9, 2021
    Date of Patent: October 24, 2023
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventor: Koichi Orito
  • Patent number: 11789539
    Abstract: A display includes: a monitor that includes an input/output region and performs haptic feedback when detecting an input from an operator while an image is displayed, the input/output region being obtained by superimposing a first region for displaying an image, a second region including a plurality of input detection regions each for detecting an input from an operator, and a third region including a plurality of haptic feedback regions each for performing haptic feedback to the operator; and a data processor that determines a haptic output value in each of the plurality of haptic feedback regions on the basis of image data of an image being displayed on the first region and a detection result of an input from an operator in each of the plurality of input detection regions.
    Type: Grant
    Filed: May 29, 2020
    Date of Patent: October 17, 2023
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventor: Koichi Orito
  • Publication number: 20230319912
    Abstract: A communication system includes a first device and a plurality of second devices, and each of the second devices includes a pairing processing unit, a device information storage unit, and a data control unit. The pairing processing unit performs a pairing process including an authentication process with the first device by using device-specific information of the second device. The device information storage unit stores device information including pairing authentication information. The pairing processing unit performs, by using device-specific information of another second device the pairing process between the first device and the another second device, and stores the pairing authentication information in the device information storage unit. The data control unit transmits the pairing authentication information to the another second device. The data control unit of the another second device stores the received pairing authentication information in the device information storage unit.
    Type: Application
    Filed: June 9, 2021
    Publication date: October 5, 2023
    Applicant: Mitsubishi Electric Corporation
    Inventor: Koichi ORITO
  • Publication number: 20230117256
    Abstract: A display includes: a monitor that includes an input/output region and performs haptic feedback when detecting an input from an operator while an image is displayed, the input/output region being obtained by superimposing a first region for displaying an image, a second region including a plurality of input detection regions each for detecting an input from an operator, and a third region including a plurality of haptic feedback regions each for performing haptic feedback to the operator; and a data processor that determines a haptic output value in each of the plurality of haptic feedback regions on the basis of image data of an image being displayed on the first region and a detection result of an input from an operator in each of the plurality of input detection regions.
    Type: Application
    Filed: May 29, 2020
    Publication date: April 20, 2023
    Applicant: Mitsubishi Electric Corporation
    Inventor: Koichi ORITO
  • Publication number: 20230069255
    Abstract: A content distribution system includes: external display terminals; displays; an integrated monitoring device that generates content to be provided to an external display terminal among the plurality of external display terminals when the external display terminal is connected to a display among the displays; and an AP that transmits the content to the external display terminal through wireless communication. When the external display terminal is brought toward the display to a point at a specific distance from the display, the external display terminal transmits terminal attribute information to the display through wireless communication, the display transmits device attribute information and the terminal attribute information, to the integrated monitoring device, the integrated monitoring device generates the content corresponding to the device attribute information and the terminal attribute information, and the external display terminal displays the content.
    Type: Application
    Filed: April 21, 2020
    Publication date: March 2, 2023
    Applicant: Mitsubishi Electric Corporation
    Inventors: Shinichi USUI, Koichi ORITO
  • Patent number: 11587459
    Abstract: A display includes a calculation unit to calculate, when first and second events that occur in an external device are transmitted from the external device, operating time from when the first event is ended by operation for the first event to when the second event is ended by operation for the second event; a storage unit to store operating procedures that are histories of the operation for the second event and the associated operating times; and a display unit to display any of the operating procedures in the storage unit, according to instruction from the calculation unit. When the second event is newly transmitted after the calculation of the operating time is completed, the calculation unit selects an operating procedure used for operation guidance from among the operating procedures based on the operating times and causes the display unit to display the selected operating procedure, thereby executing the operation guidance.
    Type: Grant
    Filed: July 12, 2018
    Date of Patent: February 21, 2023
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventor: Koichi Orito
  • Publication number: 20200168118
    Abstract: A display includes a calculation unit to calculate, when first and second events that occur in an external device are transmitted from the external device, operating time from when the first event is ended by operation for the first event to when the second event is ended by operation for the second event; a storage unit to store operating procedures that are histories of the operation for the second event and the associated operating times; and a display unit to display any of the operating procedures in the storage unit, according to instruction from the calculation unit. When the second event is newly transmitted after the calculation of the operating time is completed, the calculation unit selects an operating procedure used for operation guidance from among the operating procedures based on the operating times and causes the display unit to display the selected operating procedure, thereby executing the operation guidance.
    Type: Application
    Filed: July 12, 2018
    Publication date: May 28, 2020
    Applicant: Mitsubishi Electric Corporation
    Inventor: Koichi ORITO
  • Patent number: 7825039
    Abstract: A vertical plasma processing apparatus for a semiconductor process includes a process container having a process field configured to accommodate a plurality of target substrates at intervals in a vertical direction, and a marginal space out of the process field. In processing the target substrates, a control section simultaneously performs supply of a process gas to the process field from a process gas supply circuit and supply of a blocking gas to the marginal space from a blocking gas supply circuit to inhibit the process gas from flowing into the marginal space.
    Type: Grant
    Filed: March 25, 2009
    Date of Patent: November 2, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Toshiki Takahashi, Kohei Fukushima, Koichi Orito, Jun Sato
  • Publication number: 20090181548
    Abstract: A vertical plasma processing apparatus for a semiconductor process includes a process container having a process field configured to accommodate a plurality of target substrates at intervals in a vertical direction, and a marginal space out of the process field. In processing the target substrates, a control section simultaneously performs supply of a process gas to the process field from a process gas supply circuit and supply of a blocking gas to the marginal space from a blocking gas supply circuit to inhibit the process gas from flowing into the marginal space.
    Type: Application
    Filed: March 25, 2009
    Publication date: July 16, 2009
    Inventors: Toshiki Takahashi, Kohei Fukushima, Koichi Orito, Jun Sato
  • Publication number: 20080274605
    Abstract: A method of manufacturing a silicon nitride film that forms a silicon nitride film on a surface of a substrate comprises sequentially repeating first through third steps. The first step includes feeding a first gas containing silicon and nitrogen to the surface of the substrate. The second step includes feeding a second gas containing nitrogen to the surface of the substrate. The third step includes feeding a third gas containing hydrogen to the surface of the substrate.
    Type: Application
    Filed: July 2, 2008
    Publication date: November 6, 2008
    Applicants: Semiconductor Leading Edge Technologies, Inc., TOKYO ELECTRON LIMITED
    Inventors: Takeshi Hoshi, Tsuyoshi Saito, Hitoshi Kato, Koichi Orito
  • Publication number: 20070234961
    Abstract: A vertical plasma processing apparatus for a semiconductor process includes a process container having a process field configured to accommodate a plurality of target substrates at intervals in a vertical direction, and a marginal space out of the process field. In processing the target substrates, a control section simultaneously performs supply of a process gas to the process field from a process gas supply circuit and supply of a blocking gas to the marginal space from a blocking gas supply circuit to inhibit the process gas from flowing into the marginal space.
    Type: Application
    Filed: April 4, 2007
    Publication date: October 11, 2007
    Inventors: Toshiki Takahashi, Kohei Fukushima, Koichi Orito, Jun Sato
  • Patent number: 7094708
    Abstract: A CVD method is to form a silicon nitride film on a target substrate (W). The method includes heating the substrate (W) accommodated in a process container (8), at a process temperature, and supplying a process gas including hexaethylamino-disilane gas and ammonia gas onto the substrate (W) heated at the process temperature, thereby depositing a silicon nitride film on the substrate (W).
    Type: Grant
    Filed: January 19, 2004
    Date of Patent: August 22, 2006
    Assignee: Tokyo Electron Limited
    Inventors: Hitoshi Kato, Koichi Orito, Hiroyuki Kikuchi, Shingo Maku
  • Publication number: 20060022228
    Abstract: A method of manufacturing a silicon nitride film that forms a silicon nitride film on a surface of a substrate comprises sequentially repeating first through third steps. The first step includes feeding a first gas containing silicon and nitrogen to the surface of the substrate. The second step includes feeding a second gas containing nitrogen to the surface of the substrate. The third step includes feeding a third gas containing hydrogen to the surface of the substrate.
    Type: Application
    Filed: January 21, 2005
    Publication date: February 2, 2006
    Applicants: Semiconductor Leading Edge Technologies, Inc., TOKYO ELECTRON LIMITED
    Inventors: Takeshi Hoshi, Tsuyoshi Saito, Hitoshi Kato, Koichi Orito
  • Publication number: 20050255712
    Abstract: A CVD method is to form a silicon nitride film on a target substrate (W). The method includes heating the substrate (W) accommodated in a process container (8), at a process temperature, and supplying a process gas including hexaethylamino-disilane gas and ammonia gas onto the substrate (W) heated at the process temperature, thereby depositing a silicon nitride film on the substrate (W).
    Type: Application
    Filed: January 19, 2004
    Publication date: November 17, 2005
    Applicant: TOKYO ELECTRONLIMITED
    Inventors: Hitoshi Kato, Koichi Orito, Hiroyuki Kikuchi, Shingo Maku