Abstract: The present invention provides film formation systems and film formation methods. A high frequency (HF) electric power supply (11) applies a high frequency voltage to a cathode (5) which is provided, at its rear surface, with a permanent magnet (10), thereby to generate a reactive-mode plasma, and film formation by plasma polymerization is performed by the use of the generated reactive-mode plasma. The pressure of a plasma source gas in a vacuum chamber (1) is regulated, thereby to generate not a reactive-mode plasma but a metallic-mode plasma. The cathode (5) as a target is subjected to sputtering by the generated metallic-mode plasma, and film formation by magnetron sputtering is carried out.

Abstract: A running toy having a chassis with a plurality of pivotably connected portions and a power source for moving the chassis over a surface including uneven portions and obstructions. Each of the pivotably connected portions of the chassis has mounted thereon gears which engage the gears on an adjacent pivotably connected portion so that a driving force provided by the power source is transmitted to the gears of each of the pivotably connected portions in a manner so as to move the running toy. The gears on each of the pivotably connected portions are mounted so that the gears on adjacent pivotably connected portions remain engaged regardless of the pivotable relationship between adjacent portions of the chassis. At least one of the gears on each of the pivotably connected portions has mounted thereon a hub and drive wheel. Because the chassis comprises pivotably connected portions, the running toy can traverse uneven surfaces and obstacles having a wide variety of heights and inclinations.