Patents by Inventor Koji Hasegawa

Koji Hasegawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190254548
    Abstract: The present invention provides a bio-electrode composition comprising a polymer compound having a repeating unit A that contains silver salt of fluorosulfonic acid, silver salt of fluorosulfonimide, or silver salt of fluorosulfonamide. This can form a living body contact layer for a bio-electrode with excellent electric conductivity, biocompatibility and light weight, which can be manufactured at low cost and does not cause large lowering of the electric conductivity even when it is wetted with water or dried. The present invention also provides a bio-electrode in which the living body contact layer is formed from the bio-electrode composition and a method for manufacturing the bio-electrode.
    Type: Application
    Filed: February 11, 2019
    Publication date: August 22, 2019
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Osamu WATANABE, Motoaki IWABUCHI, Shiori NONAKA, Koji HASEGAWA
  • Publication number: 20190241709
    Abstract: The present invention is a stretchable film composition including: a silicone main-chain type urethane having a structure shown by the following general formula (1)-1 and/or (1)-2, and a silicone-pendant type urethane having a structure shown by the following general formula (2)-1 and/or (2)-2. The present invention provides a stretchable film composition that has excellent stretchability and strength, with the film surface having excellent water repellency, and is favorably used for a non-tackiness stretchable film, a stretchable film using the stretchable film composition, and a method for forming the same.
    Type: Application
    Filed: January 29, 2019
    Publication date: August 8, 2019
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Motoaki IWABUCHI, Shiori NONAKA, Koji HASEGAWA
  • Publication number: 20190235381
    Abstract: A monomer of formula (1a) or (1b) is provided wherein A is a polymerizabie group, R1-R6 are monovalent hydrocarbon groups, X1 is a divalent hydrocarbon, group, Z1 is an aliphatic group, Z2 forms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer.
    Type: Application
    Filed: April 10, 2019
    Publication date: August 1, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Masayoshi Sagehashi, Koji Hasegawa, Jun Hatakeyama, Kazuhiro Katayama
  • Patent number: 10363555
    Abstract: The present invention provides a polymer compound for a conductive polymer, having one or more kinds of repeating units “a” represented by the following general formula (1), the polymer compound for a conductive polymer being synthesized by ion exchange of a lithium salt, a sodium salt, a potassium salt, a sulfonium compound salt, or a nitrogen compound salt of sulfonic acid residue with a weight average molecular weight in the range of 1,000 to 500,000, wherein R1 represents a hydrogen atom or a methyl group, R2 represents a fluorine atom or a trifluoromethyl group, “m” represents an integer of 1 to 4, and “a” satisfies 0<a?1.0. There can be provided a polymer compound for a conductive polymer having a specific superacidic sulfo group that is soluble in an organic solvent and suitably used for fuel cells or a dopant for conductive materials.
    Type: Grant
    Filed: August 3, 2015
    Date of Patent: July 30, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Masaki Ohashi, Masayoshi Sagehashi, Takayuki Nagasawa
  • Patent number: 10310376
    Abstract: A polymer comprising recurring units containing a specific lactone ring and having an alkyl group on ?-butyrolactone skeleton of fused ring lactone and an alkyl ester substituent group intervening between the lactone structure and the polymer backbone is provided. A resist composition comprising the polymer as base resin is improved in such properties as DOF margin and MEF and quite effective for precise micropatterning.
    Type: Grant
    Filed: December 8, 2016
    Date of Patent: June 4, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Teppei Adachi, Ryosuke Taniguchi, Koji Hasegawa, Kenji Yamada
  • Patent number: 10308735
    Abstract: A material for an organic light-emitting device, the material including a repeating unit represented by Formula 1: wherein, in Formula 1, R1, A, and X1 are the same as described in the specification.
    Type: Grant
    Filed: December 17, 2015
    Date of Patent: June 4, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Masashi Tsuji, Koji Hasegawa, Makoto Taguchi
  • Patent number: 10303056
    Abstract: A positive resist composition based on a polymer comprising recurring units (a) of (meth)acrylate having an iodized lactone ring, and recurring units (b1) having a carboxyl group substituted with an acid labile group and/or recurring units (b2) having a phenolic hydroxyl group substituted with an acid labile group has a high sensitivity and resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
    Type: Grant
    Filed: May 3, 2017
    Date of Patent: May 28, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Masayoshi Sagehashi
  • Patent number: 10286514
    Abstract: A spindle condition detection device for a machine tool includes: bearing load detecting means for detecting a load on a bearing that rotatably supports a spindle of a machine tool; and present usage ratio calculating means for calculating, based on the load detected by the bearing load detecting means, a present usage ratio that is a ratio of usage of the bearing with respect to a prescribed operating life of the bearing, which is achieved over a period until a present moment.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: May 14, 2019
    Assignee: JTEKT CORPORATION
    Inventors: Koji Hasegawa, Koji Kito, Takashi Matsui, Nobumitsu Hori, Osamu Higashimoto
  • Publication number: 20190079399
    Abstract: A monomer having formula (A) is provided. RA is H, methyl or trifluoromethyl, X1 is a single bond, ether, ester or amide bond, Ra is a C1-C20 monovalent hydrocarbon group, Rb is H or an acid labile group, X is halogen, n is an integer of 1 to 4, m is an integer of 0 to 3, and 1?n+m?4. A resist composition comprising a polymer derived from the monomer has a high sensitivity to high-energy radiation, especially EUV.
    Type: Application
    Filed: September 5, 2018
    Publication date: March 14, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Koji Hasegawa, Jun Hatakeyama
  • Publication number: 20190064664
    Abstract: A monomer and polymer having a substituent group capable of polarity switch under the action of acid are provided. A resist composition comprising the polymer forms at a high resolution a negative pattern insoluble in alkaline developer and having high etch resistance.
    Type: Application
    Filed: August 22, 2018
    Publication date: February 28, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Masayoshi Sagehashi, Koji Hasegawa, Teppei Adachi, Kazuhiro Katayama
  • Publication number: 20190064665
    Abstract: A resist composition comprising a sulfonium compound of specific structure as PAG has excellent lithography performance factors such as minimal defects, high sensitivity, improved LWR and CDU, and is a quite effective resist material for precise micropatterning.
    Type: Application
    Filed: August 22, 2018
    Publication date: February 28, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Ryo Mitsui, Masaki Ohashi, Ryosuke Taniguchi, Koji Hasegawa
  • Patent number: 10216085
    Abstract: The present invention provides a tetracarboxylic acid diester compound shown by the following general formula (1), wherein X1 represents a tetravalent organic group; and R1 represents a group shown by the following general formula (2), Y1nRf)k??(2) wherein the dotted line represents a bond; Y1 represents an organic group with a valency of k+1; Rf represents a linear, branched, or cyclic alkyl group having 1 to 20 carbon atoms or an aromatic group in which a part or all of hydrogen atoms is/are substituted with a fluorine atom(s); “k” represents 1, 2, or 3; and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound that can give a polyimide precursor polymer soluble in a safe organic solvent widely used as a solvent of a composition, and usable as a base resin of a negative photosensitive resin composition.
    Type: Grant
    Filed: June 7, 2017
    Date of Patent: February 26, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Katsuya Takemura, Hiroyuki Urano, Masashi Iio, Masayoshi Sagehashi, Koji Hasegawa
  • Patent number: 10203601
    Abstract: The present invention provides a tetracarboxylic acid diester compound represented by the following general formula (1), wherein, X1 represents a tetravalent organic group, and R1 represents a group represented by the following general formula (2), wherein, the dotted line represents a bonding, Y1 represents an organic group with a valency of k+1, Rs represents a group containing at least one silicon atom, “k” represents 1, 2 or 3, and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound which can lead a polymer of a polyimide precursor capable of using a base resin of a negative photosensitive resin composition which is capable of forming a fine pattern and giving high resolution, a polymer of a polyimide precursor obtained by using the tetracarboxylic acid diester compound and a method for producing the same.
    Type: Grant
    Filed: September 15, 2017
    Date of Patent: February 12, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki Urano, Katsuya Takemura, Masashi Iio, Koji Hasegawa, Kenji Funatsu
  • Publication number: 20190041262
    Abstract: A measurement device includes: a sensor for sensing a condition of an object to be measured; a plurality of output lines L for outputting a sensing result of the sensor; and a control unit for applying voltages to the plurality of output lines based on the sensing result of the sensor. The control unit performs self-failure diagnosis and outputs a result of the self-failure diagnosis with a combination of the voltages applied to the plurality of output lines L.
    Type: Application
    Filed: January 31, 2017
    Publication date: February 7, 2019
    Inventors: Koji HASEGAWA, Takashi TOYODA
  • Publication number: 20190018320
    Abstract: A polymer of a polyimide precursor which includes a structural unit represented by the following general formula (7), where X1 represents a tetravalent organic group, X2 represents a divalent organic group, and R1 represents a group represented by the following general formula (2), where the dotted line represents a bonding, Y1 represents an organic group with a valency of k+1, Rs represents a group containing at least one silicon atom, “k” represents 1, 2 or 3, and “n” represents 0 or 1.
    Type: Application
    Filed: September 21, 2018
    Publication date: January 17, 2019
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki URANO, Katsuya TAKEMURA, Masashi IIO, Koji HASEGAWA, Kenji FUNATSU
  • Publication number: 20190020173
    Abstract: It is an object of the present invention to provide a laser light source module capable of diverting current flowing to a laser diode when the laser diode does not emit light. A laser light source module includes a laser diode, a bypass circuit parallelly connected to the laser diode and diverting current flowing to a laser diode in an on state, a light detection circuit detecting laser light of the laser diode, and the bypass circuit switching circuit switching the bypass circuit to the on state in accordance with a control signal being input thereto, and the bypass circuit switching circuit can switch the bypass circuit to the on state in accordance with a state where the light detection circuit does not detect the laser light.
    Type: Application
    Filed: March 29, 2016
    Publication date: January 17, 2019
    Applicant: Mitsubishi Electric Corporation
    Inventor: Koji HASEGAWA
  • Publication number: 20180373148
    Abstract: A resist composition comprising a polymer comprising recurring units having an optionally substituted brominated phenol has advantages including high sensitivity, high resolution and reduced acid diffusion and forms a pattern of good profile with improved CDU.
    Type: Application
    Filed: June 12, 2018
    Publication date: December 27, 2018
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Masahiro Fukushima
  • Patent number: 10131730
    Abstract: A resist composition comprising a polymer comprising recurring units of lactone and a PAG is provided. The resist composition has a high dissolution contrast during organic solvent development, and improved resist properties including MEF and CDU and forms a fine hole pattern with improved roundness and size control.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: November 20, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Masayoshi Sagehashi, Koji Hasegawa, Kenichi Oikawa
  • Patent number: 10126649
    Abstract: The present invention provides a resist composition containing a base resin composed of a polymer compound that contains a repeating unit “a” shown by formula (1) and a repeating unit “b” having either or both of a carboxyl group in which a hydrogen atom is substituted with an acid-labile group and a phenolic hydroxyl group in which a hydrogen atom is substituted with an acid-labile group, with a weight average molecular weight of 1,000 to 500,000. There can be provided a resist composition that has high sensitivity and high resolution, and can give a pattern with low dimensional variation and good pattern profile after exposure. wherein R1 represents a hydrogen atom or a methyl group; Z represents a hydroxybenzoquinone group, or a hydroxynaphthoquinone group optionally containing a substituent; and a fraction “a” of the repeating unit “a” satisfies 0<a<1.0, and a fraction “b” of the repeating unit “b” satisfies 0<b<1.0.
    Type: Grant
    Filed: June 27, 2017
    Date of Patent: November 13, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Masayoshi Sagehashi
  • Patent number: 10125202
    Abstract: The present invention provides a polymer compound for a conductive polymer comprising one or more repeating units “a” shown by the formula (1), and having a weight-average molecular weight in the range of 1,000 to 500,000. There can be provided a polymer compound for a conductive polymer having a specific superacidic sulfo group which is soluble in an organic solvent, and suitably used for a fuel cell or a dopant for a conductive material. wherein R1 represents a hydrogen atom or a methyl group; R2 represents any of a single bond, an ester group, and a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms, the hydrocarbon group optionally containing an ether group, an ester group, or both; “Z” represents any of a single bond, a phenylene group, a naphthylene group, an ether group, and an ester group; and “a” is a number satisfying 0<a?1.0.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: November 13, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Nagasawa, Koji Hasegawa