Abstract: A positive photoresist composition is described, which comprises an alkali-soluble resin and 1,2-naphthoquinone-diazido-5-(and/or -4-)sulfonate of a polyhydroxy compound represented by the following formula (I): ##STR1## wherein R.sub.1 to R.sub.11 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxyl group, an acyl group or a cycloalkyl group, provided that at least one of R.sub.1 to R.sub.11 is a cycloalkyl group; A represents -CH(R.sub.12)-, in which R.sub.12 represents a hydrogen atom or an alkyl group; and m represents 2 or 3.

Abstract: The present invention provides new image forming methods. The image forming methods use a combination of a light-sensitive material and an image receiving material. The light-sensitive material comprises a support, a strippable layer and a light-sensitive polymerizable layer in order. The light-sensitive polymerizable layer contains silver halide, a reducing agent and an ethylenically unsaturated polymerizable compound or a cross-linkable polymer. The light-sensitive polymerizable layer may further contain a colorant. An image forming method using the light-sensitive polymerizable layer containing no colorant comprises an exposing step, a developing step, a toning step and a transferring step. Another image forming method using the colorant-containing light-sensitive polymerizable layer comprises an exposing step, a developing step, a removing step and a transferring step.