Patents by Inventor Koji Tsushima
Koji Tsushima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8764431Abstract: In a method for transcripting fine patterns and an apparatus for transcripting fine patterns, the ingress of bubbles is prevented and patterns are transcripted with a high throughput by a relatively compact apparatus. For this purpose, a back surface of a stamper is vacuum sucked and the stamper is brought into close contact with a target of transcription with its surfaces coated with resist and pressure is applied thereto. At this time, the stamper is deformed into a spherical shape or bent to expand the close contact face from a central area to a peripheral area to prevent the ingress of air bubbles into between the target of transcription and the stamper.Type: GrantFiled: February 11, 2011Date of Patent: July 1, 2014Assignee: Hitachi High-Technologies CorporationInventors: Naoaki Yamashita, Toshimitsu Shiraishi, Koji Tsushima, Masashi Aoki
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Patent number: 8535035Abstract: A fine-structure transfer apparatus has a base plate, a first post and a second post erected on the upper surface of the base plate, an elongated stamper that is fixed at one end to the upper end face of the first post. The stamper is supported at the other end in a vertically movable manner by means of an ascending/descending unit provided on the second post. A transfer element holding stage is provided on the upper surface of the base plate between the first and second posts in a position that corresponds to the position of the lower surface of the elongated stamper where a fine pattern is formed. A pressure-applying unit is provided to reciprocate on the upper surface of the elongated stamper along a longitudinal direction thereof. The transfer apparatus is characterized by the ease with which the stamper can be detached from the transfer element.Type: GrantFiled: May 26, 2010Date of Patent: September 17, 2013Assignee: Hitachi High-Technologies CorporationInventors: Kyoichi Mori, Noritake Shizawa, Naoaki Yamashita, Koji Tsushima, Toshimitsu Shiraishi
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Patent number: 8333915Abstract: A fine-structure transfer method in which a fine-featured pattern formed on one of the two surfaces of a stamper is pressed against a coating of a resist on one of the two surfaces of a transfer element so as to transfer the fine-featured pattern to the resist coating, wherein the atmosphere in the space between the stamper and the transfer element is replaced by the vapor of the resist before the stamper is pressed against the transfer element.Type: GrantFiled: September 21, 2011Date of Patent: December 18, 2012Assignee: Hitachi High-Technologies CorporationInventors: Kyoichi Mori, Naoaki Yamashita, Noritake Shizawa, Koji Tsushima
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Patent number: 8096800Abstract: A fine-structure transfer apparatus includes a stamper, a stage on which to place a transfer element having a coating of resist, and a device for heating the resist coating to be vaporized or a device for supplying a vapor of the resist into a space between the stamper and the transfer element.Type: GrantFiled: February 24, 2010Date of Patent: January 17, 2012Assignee: Hitachi High-Technologies CorporationInventors: Kyoichi Mori, Naoaki Yamashita, Noritake Shizawa, Koji Tsushima
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Publication number: 20120007280Abstract: A fine-structure transfer method in which a fine-featured pattern formed on one of the two surfaces of a stamper is pressed against a coating of a resist on one of the two surfaces of a transfer element so as to transfer the fine-featured pattern to the resist coating, wherein the atmosphere in the space between the stamper and the transfer element is replaced by the vapor of the resist before the stamper is pressed against the transfer element.Type: ApplicationFiled: September 21, 2011Publication date: January 12, 2012Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Kyoichi MORI, Naoaki YAMASHITA, Noritake SHIZAWA, Koji TSUSHIMA
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Patent number: 8016585Abstract: A resin stamper is provided that is intended for use in an optical transfer-based nanostructure transfer apparatus and which is capable of automatic transport and alignment. The resin stamper includes a support member made of a light transmitting material and having mechanical strength, an intermediate layer also made of a light transmitting material, and a patterned resin layer which is also made of a light transmitting material. The support member is larger in size than the intermediate layer and the patterned resin layer. The intermediate layer is more flexible than the patterned resin layer. Also, the patterned resin layer has a pattern of high and low areas formed in a surface thereof that is the obverse of the pattern of high and low areas in a mold.Type: GrantFiled: November 13, 2008Date of Patent: September 13, 2011Assignee: Hitachi High-Technologies CorporationInventors: Susumu Komoriya, Kyoichi Mori, Noritake Shizawa, Takanori Yamasaki, Tetsuhiro Hatogai, Koji Tsushima
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Publication number: 20110217479Abstract: In a method for transcripting fine patterns and an apparatus for transcripting fine patterns, the ingress of bubbles is prevented and patterns are transcripted with a high throughput by a relatively compact apparatus. For this purpose, a back surface of a stamper is vacuum sucked and the stamper is brought into close contact with a target of transcription with its surfaces coated with resist and pressure is applied thereto. At this time, the stamper is deformed into a spherical shape or bent to expand the close contact face from a central area to a peripheral area to prevent the ingress of air bubbles into between the target of transcription and the stamper.Type: ApplicationFiled: February 11, 2011Publication date: September 8, 2011Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Naoaki YAMASHITA, Toshimitsu SHIRAISHI, Koji TSUSHIMA, Masashi AOKI
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Publication number: 20100303947Abstract: A fine-structure transfer apparatus has a base plate, a first post and a second post erected on the upper surface of the base plate, an elongated stamper that is fixed at one end to the upper end face of the first post. The stamper is supported at the other end in a vertically movable manner by means of an ascending/descending unit provided on the second post. A transfer element holding stage is provided on the upper surface of the base plate between the first and second posts in a position that corresponds to the position of the lower surface of the elongated stamper where a fine pattern is formed. A pressure-applying unit is provided to reciprocate on the upper surface of the elongated stamper along a longitudinal direction thereof. The transfer apparatus is characterized by the ease with which the stamper can be detached from the transfer element.Type: ApplicationFiled: May 26, 2010Publication date: December 2, 2010Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Kyoichi Mori, Noritake Shizawa, Naoaki Yamashita, Koji Tsushima, Toshimitsu Shiraishi
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Publication number: 20100289183Abstract: The present invention includes the steps of: applying resist to a surface of a disk base material mounted on a base; mounting a stamper on the resist, wherein the stamper includes not only an area larger than the disk base material but also a concavo-convex region between chamfered sections for an inner-diameter section and an outer-diameter section of the disk base material; mounting an elastic plate on the stamper, wherein the elastic plate includes an inner-diameter section and an outer-diameter section smaller than chamfered sections of the inner-diameter section and the outer-diameter section of the disk base material and larger than the concavo-convex region of the stamper; mounting a pressing member on the elastic plate and pressing the elastic plate toward the disk base material; exposing the resist and etching the disk base material using the exposed resist as a mask; and removing the remaining resist from the disk base material.Type: ApplicationFiled: May 7, 2010Publication date: November 18, 2010Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Koji TSUSHIMA, Naoaki YAMASHITA, Noritake SHIZAWA, Kyoichi MORI
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Publication number: 20100219548Abstract: A fine-structure transfer method in which a fine-featured pattern formed on one of the two surfaces of a stamper is pressed against a coating of a resist on one of the two surfaces of a transfer element so as to transfer the fine-featured pattern to the resist coating, wherein the atmosphere in the space between the stamper and the transfer element is replaced by the vapor of the resist before the stamper is pressed against the transfer element. Also disclosed is a fine-structure transfer apparatus having at least a stamper and a stage on which to place a transfer element having a coating of a resist, further having a device for heating the resist coating to be vaporized or a device for supplying the vapor of the resist into the space between the stamper and the transfer element.Type: ApplicationFiled: February 24, 2010Publication date: September 2, 2010Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Kyoichi MORI, Naoaki YAMASHITA, Noritake SHIZAWA, Koji TSUSHIMA
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Publication number: 20090123590Abstract: A resin stamper is provided that is intended for use in an optical transfer-based nanostructure transfer apparatus and which is capable of automatic transport and alignment. The resin stamper comprises a support member made of a light transmitting material and having mechanical strength, an intermediate layer also made of a light transmitting material, and a patterned resin layer which is also made of a light transmitting material, the support member being larger in size than the intermediate layer and the patterned resin layer, the intermediate layer being more flexible than the patterned resin layer, and the patterned resin layer having a pattern of high and low areas formed in a surface thereof that is the obverse of the pattern of high and low areas in a mold.Type: ApplicationFiled: November 13, 2008Publication date: May 14, 2009Inventors: Susumu Komoriya, Kyoichi Mori, Noritake Shizawa, Takanori Yamasaki, Tetsuhiro Hatogai, Koji Tsushima
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Patent number: 5145134Abstract: A tiltable turntable for supporting a display monitor, for example, has a support base, a monitor base, and a post of a substantially H-shaped cross section by which the support base and the monitor base are resiliently coupled to each other for relative tilting and rotational movement. The support base has two spaced stoppers. To assemble the tiltable turntable, the support base and the monitor base are sandwiched by the post, and the support base is turned with respect to the monitor base until a retaining member of the post rides over an inclined surface of one of the stoppers. When the retaining member of the post is positioned between the stoppers, the post is retained between the stoppers against dislodgment from the support base and limits the range of relative rotational movement between the support base and the monitor base. The support base and the monitor base are resiliently held together by the retaining member of the post.Type: GrantFiled: June 12, 1991Date of Patent: September 8, 1992Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Kimio Hashimoto, Katsuyuki Ikoma, Koji Tsushima