Abstract: Provided is a flexographic printing plate precursor which can suppress chipping of relief images while maintaining printing properties. The flexographic printing plate precursor (10) includes a photosensitive layer (16) which includes (A) a water-dispersed latex, (B) a millable rubber, (C) a surfactant, (D) photopolymerizable compounds, and (E) a photopolymerization initiator, the (D) including the following (d1) to (d3). (d1) is a photopolymerizable compound of a chain structure having no cyclic structure, (d2) is a monofunctional photopolymerizable compound having a cyclic structure, and (d3) is a bifunctional photopolymerizable compound having a cyclic structure.

Abstract: A spot welding method includes a heating step of energizing an electrode in pressure contact with an Al alloy member to heat and melt a join part by resistance heating and a cooling step of cooling the join part after the heating step in a state in which the electrode is in pressure contact with the Al alloy member. The alloy is a wrought alloy of Mg: 0.2 to 1.2 mass %, Si: 0.4 to 1.5%, and Cu: 1.1% or less or a casting alloy of Si: 7 to 11% and Mg: 0.1 to 0.4% with respect to 100% as a whole. The cooling step includes a first cooling process performed with a reduced amount of input energy to the join part as compared with the heating step and a second cooling process performed after the first cooling process at a higher cooling rate than that in the first cooling process.

Abstract: Provided is a flexographic printing plate precursor which can suppress chipping of relief images while maintaining printing properties. The flexographic printing plate precursor (10) includes a photosensitive layer (16) which includes (A) a water-dispersed latex, (B) a millable rubber, (C) a surfactant, (D) photopolymerizable compounds, and (E) a photopolymerization initiator, the (D) including the following (d1) to (d3). (d1) is a photopolymerizable compound of a chain structure having no cyclic structure, (d2) is a monofunctional photopolymerizable compound having a cyclic structure, and (d3) is a bifunctional photopolymerizable compound having a cyclic structure.

Abstract: Provided is a method for treating a printing plate developer liquid by which a developer waste liquid can be reused by also removing components that are dissolved in the developer waste liquid, and a system for treating a printing plate developer liquid. A method for treating a printing plate developer liquid includes making a developer waste liquid pass through packed beds 2, 3 filled with activated carbon, the developer waste liquid containing a polymer component generated in a developing step to perform development of a printing plate member including a photosensitive resin layer on which a latent image is formed with the use of an aqueous developer liquid mainly made of water, and replacing a passage liquid made to pass through the packed beds in a supply unit supplying the aqueous developer liquid in a developing machine 1, and reusing the passage liquid as an aqueous developer liquid.

Abstract: Disclosed is a flexographic printing plate precursor in which formation of cracks and wrinkles in an infrared ablation layer is suppressed and the scratch resistance of the layer is improved. The precursor includes a support, photosensitive resin layer, and an infrared ablation layer that are laminated in the order presented. The binder polymer contained in the infrared ablation layer contains a polymer (A) and an acrylic resin (B). The polymer (A) contains the same structural unit as the structural unit contained in the binder polymer in the photosensitive resin layer. The mass ratio (A/B) of the component (A) with respect to the component (B) is within a range of 1/3 to 3/1. The difference between a plastic hardness (Ha) of the infrared ablation layer and a plastic hardness (Hb) of the photosensitive resin layer is 30 mN/mm2 or smaller.

Abstract: Disclosed is a flexographic printing plate precursor in which formation of cracks and wrinkles in an infrared ablation layer is suppressed and the scratch resistance of the layer is improved. The precursor includes a support, photosensitive resin layer, and an infrared ablation layer that are laminated in the order presented. The binder polymer contained in the infrared ablation layer contains a polymer (A) and an acrylic resin (B). The polymer (A) contains the same structural unit as the structural unit contained in the binder polymer in the photosensitive resin layer. The mass ratio (A/B) of the component (A) with respect to the component (B) is within a range of 1/3 to 3/1. The difference between a plastic hardness (Ha) of the infrared ablation layer and a plastic hardness (Hb) of the photosensitive resin layer is 30 mN/mm2 or smaller.

Abstract: Disclosed is a photosensitive resin composition that provides an excellent water developability, drying property, and image reproducibility. The photosensitive resin composition comprises a water-dispersible latex (A), a rubber (B), a surfactant (C), a photopolymerizable monomer (D), and a photopolymerization initiator (E). A ratio of a mass of the component (C) to a total mass of the components (A), (B), and (C) is within a range of 0.1 to 20%. A ratio of a mass of the component (A) to a total mass of the components (A) and (B) is within 20 to 90%. A size of a dispersed phase consisting mainly of the component (B) is 10 ?m or smaller.

Abstract: Disclosed is a photosensitive resin composition that provides an excellent water developability, drying property, and image reproducibility. The photosensitive resin composition comprises a water-dispersible latex (A), a rubber (B), a surfactant (C), a photopolymerizable monomer (D), and a photopolymerization initiator (E). A ratio of a mass of the component (C) to a total mass of the components (A), (B), and (C) is within a range of 0.1 to 20%. A ratio of a mass of the component (A) to a total mass of the components (A) and (B) is within 20 to 90%. A size of a dispersed phase consisting mainly of the component (B) is 10 ?m or smaller.

Abstract: A porous elastic pavement material is provided which is excellent in noise reducing effect and yet sustainably has a wet state slip resistance for a long period of time. The porous elastic pavement material comprises elastic aggregates (1), hard aggregates (2) and a binder (3) which binds the elastic aggregates (1) and the hard aggregates (2), wherein the hard aggregates (2) have an average particle diameter of 0.2 to 2 mm, and are present in a proportion of 25 to 65 vol % based on the elastic aggregates (1).

Abstract: A porous elastic pavement material is provided which is excellent in noise reducing effect and yet sustainably has a wet state slip resistance for a long period of time. The porous elastic pavement material comprises elastic aggregates (1), hard aggregates (2) and a binder (3) which binds the elastic aggregates (1) and the hard aggregates (2), wherein the hard aggregates (2) have an average particle diameter of 0.2 to 2 mm, and are present in a proportion of 25 to 65 vol % based on the elastic aggregates (1).