Abstract: The CPA-attached connector 1a includes a connector body 11 and a CPA member 12. The connector body 11 includes a temporary latch portion 112 for the CPA member 12, a full latch portion 113 which, before the mating with a mating connector, restricts full latch of the CPA member, and which, during the mating, cancels restriction of the full latch by the mating connector, and a hood portion 114 configured to cover, in a manner of a canopy, a portion of the CPA member 12 in the full latch state. The CPA member 12 includes a CPA body 121 and a finger rest portion 122 provided on the CPA body 121, a portion of the finger rest portion 122 being exposed from the hood portion 114 even in the full latch state, an inclined surface 122a being formed in the exposed portion to incline toward a central axis of the connector body 11 in accordance with a distance from the hood portion 114.

Abstract: A guide display unit for a crane, wherein a data processing unit: calculates a measurement area corresponding to the measurement area of a camera; the measurement area from the viewpoint of the camera and generates a first image; performs mosaic-processing on the image captured by the camera according to the particle size of the three-dimensional map and generates a second image; performs registration processing on the first image and the second image and calculates the amount of deviation between the first image and the second image; corrects the position of a guide frame figure with respect to the image of a suspended load and a feature on the basis of the calculated amount of deviation; and overlays the guide frame figure on the images of the suspended load and the feature and displays the result on the data display unit.

Abstract: A recording apparatus includes a conveyance unit that conveys a recording medium in a first direction toward a recording head for ejecting a liquid, a tank including a containing chamber containing the liquid to be supplied to the recording head, and an injection port through which the liquid is injected into the containing chamber, the tank being disposed downstream of the conveyance unit in the first direction, a rotatable lever that holds a tank cap for closing the injection port, and a cover that rotates about a rotation shaft between an open position for exposing the lever and a closed position for covering the lever, the rotation shaft being disposed upstream of the conveyance unit in the first direction. The cover includes a sliding portion that is provided on a surface facing the lever and comes into contact with the lever while the cover is rotating toward the closed position.

Abstract: An X-ray fluoroscopic imaging apparatus reduces the number of memory switches and performs an auto-positioning for a larger number of rotation positions. The apparatus includes a C-arm 9 supporting the X-ray tube 5 and the X-ray detector 7 face to be rotatable around two axes orthogonal to each other. A rotation position memory storage element 61 stores the rotation position information of the C-arm 9 in correspondence with any of memory switches 55; and a touch panel 43 displays the rotation position information stored in correspondence with selected memory switches 55. The rotation position memory storage element 61 stores a plurality of rotation position information corresponding to the respective memory switches 55, and the touch panel 43 displays any of the plurality of rotation position information stored in correspondence with the memory switches 55 in a predetermined display manner.

Abstract: A semiconductor light emitting device includes a light emitting module, a stem, and a surrounding member. The stem includes a conductive base and a conductive heat sink extending upright from the base. The light emitting module is mounted on the heat sink. The surrounding member is arranged on the base and surrounds the light emitting module and the heat sink. The light emitting module includes a substrate mounted on the heat sink, a light emitting element mounted on the substrate, and a light emitting element drive circuit mounted on the substrate. The light emitting element drive circuit includes a transistor configured to drive the light emitting element. The transistor is a vertical MOSFET mounted on the substrate.

Abstract: A multi-screw kneader is configured to exhibit an extensional flow function before and behind holes of a disk-shaped segment and a method for producing a nano-composite uses the multi-screw kneader. The multi-screw kneader includes a plurality of kneading screws and the disk-shaped segment in a barrel. The disk-shaped segment partitions the inside of the barrel downstream of a part for supplying a kneading material and includes shaft receiving parts through which rotating shafts of the kneading screws are to rotatably pass and the holes are defined in a periphery of the shaft penetrating parts and are configured to serve as flow channels of the kneading material. The method for producing the nano-composite includes charging nanoparticles as a resin additive using the multi-screw kneader.

Abstract: An inspection device and an inspection method are provided. The inspection device includes: a main body portion, configured to be held by an inspector; a camera portion, disposed on the main body portion and configured to capture an inspected portion of a vehicle; and a guiding portion, configured to guide a camera direction of the camera portion to the inspector, so that an image obtained through the camera portion becomes a prescribed image suitable for inspection.

Abstract: A technique capable of certainly suppressing adhesion of waste ink to hands, clothes, and the like during replacement of a waste ink tank is provided. There are included a container portion provided with an insertion port which a discharge member discharging waste ink can be inserted into and pulled out from and a shielding portion movable between a shielding position where the insertion port is shielded and an open position where the insertion port is opened.

Abstract: A recording apparatus includes a tank including a chamber configured to store liquid to be supplied to a recording head that ejects the liquid and a filling port from which the liquid is injected into the chamber, and an injection auxiliary member configured to assist injecting of the liquid into the chamber from the filling port, the injection auxiliary member including a first and a second flow channels each defined by a first or a second upper end portion that opens toward outside of the tank and a first or a second lower end portion that opens toward inside of the tank, wherein the second flow channel has an expansion portion arranged in a middle portion between the second upper end portion and the second lower end portion and configured to form a step to expand a cross-sectional area.

Abstract: The present technology relates to a communication device capable of improving a system throughput. Provided is a communication device including a control unit that transmits a second signal including a transmission request for a first signal for measuring reception power or propagation loss to another communication device, receives the first signal transmitted from the other communication device, measures the reception power or the propagation loss on the basis of the received first signal, and controls transmission power on the basis of the measured reception power or propagation loss. The present technology can be applied to, for example, a wireless LAN system.

Abstract: An etching method includes providing a substrate on a substrate support in a chamber of a plasma processing apparatus. The etching method further includes etching the substrate with plasma generated in the chamber, thereby forming a recess in the substrate. In the etching, an electrical bias is supplied to the substrate support, to attract ions from the plasma into the substrate. In the etching, at least one of a bias frequency, which is a reciprocal of a time length of a waveform cycle of the electrical bias, and a pulse duty ratio of a pulsed electrical bias is modified to maintain an ion energy flux to the substrate.

Abstract: An ink tank that enables to check whether a cover of an ink tank is normally bonded to the ink tank includes a first chamber having a supply port for supplying ink to a printing head that ejects ink, a second chamber having an external air introduction port capable of introducing external air, a partition wall configured to separate the first chamber and the second chamber, a communication path provided in the partition wall and configured to place the first chamber and the second chamber in communication with each other, a first cover member configured to cover an opening of the first chamber without extending over an opening of the second chamber, and a second cover member configured to cover the opening of the second chamber without extending over the opening of the first chamber.

Abstract: A rotating electrical machine includes: a rotor; a stator including a stator core and a coil and including a radial protrusion for fastening located above a rotation center of the rotor; a housing member that houses the rotor and the stator and to which the radial protrusion is fastened; and an oil passage portion located above the rotation center of the rotor and extending in an axial direction within a range in which the stator core extends in the axial direction, the oil passage portion having a discharge hole that discharges oil in a direction toward a position radially outward of the radial protrusion as viewed in the axial direction.

Abstract: Provided is a technique capable of suppressing pressure fluctuations within a plasma processing chamber. A plasma processing apparatus according to the present disclosure includes: a chamber; a gas supply that supplies a processing gas into the chamber; a power supply that generates a source RF signal to form a plasma from the processing gas within the chamber; a storage that stores in advance a source set value that is a set value of a parameter of the source RF signal; a pressure regulation valve connected to the chamber, the pressure regulation valve being configured to regulate an internal pressure of the chamber; an opening degree calculator that calculates an opening degree of the pressure regulation valve, the opening degree being calculated based on the source set value; and an opening degree controller that controls the opening degree of the pressure regulation valve based on the calculated opening degree.

Abstract: A foamable resin composition includes a styrenic thermoplastic elastomer and a dynamically crosslinked thermoplastic elastomer in a total amount of 100 parts by mass. An amount of the dynamically crosslinked thermoplastic elastomer is 10 to 40 parts by mass. The composition further includes high-temperature expandable microcapsules and low-temperature expandable microcapsules in a total amount of 25 to 50 parts by mass relative to 100 parts by mass of the elastomers, and an amount of the low-temperature expandable microcapsules is 17 to 67% by mass relative to the total amount of the two types of microcapsules.

Abstract: A method of processing a substrate includes patterning a mask over a dielectric layer and etching openings in the dielectric layer. The dielectric layer is disposed over the substrate. The etching includes flowing an etchant, a polar or H-containing gas, and a phosphorus-halide gas. The method may further include forming contacts by filling the openings with a conductive material.

Abstract: A plasma processing method includes: providing a substrate including a silicon-containing film and a mask film having an opening pattern, on a substrate support; and etching the silicon-containing film using the mask film as a mask, with a plasma generated by a plasma generator provided in the chamber. The etching includes: supplying a processing gas containing one or more gases including carbon, hydrogen, and fluorine into the chamber; generating a plasma from the processing gas by supplying a source RF signal to the plasma generator; and supplying a bias RF signal to the substrate support unit. In the etching, the silicon-containing film is etched by at least hydrogen fluoride generated from the processing gas, while forming a carbon-containing film on at least a part of a surface of the mask film.

Abstract: A plasma etching apparatus includes: a chamber; a support configured to support a substrate in the chamber; a gas supply configured to supply a processing gas into the chamber, the processing gas including hydrogen fluoride gas with a volume flow ratio of 30% or more with respect to a total flow rate of the processing gas; a plasma generator configured to generate a plasma from the processing gas in the chamber to etch the substrate with the plasma; and a cooler configured to maintain the support at 0° C. or lower during generation of the plasma.

Abstract: A disclosed etching method includes (a) forming a protective film containing carbon on a surface in a chamber of a plasma processing apparatus. The etching method further includes (b) etching an etch film of a substrate with plasma generated from an etching gas that includes a hydrogen fluoride gas and a hydrofluorocarbon gas within the chamber. The substrate includes the etch film, which is a silicon-containing film, and a mask containing carbon and provided on the etch film.

Abstract: In one exemplary embodiment, a method for forming a pattern includes (a) forming, on a substrate, a first pattern having an opening and containing a first material, (b) forming a filling portion in the opening, the filling portion containing a second material different from the first material, and (c) removing the first pattern so that the filling portion remains as a second pattern inverted with respect to the first pattern. At least one of the first material or the second material contains tin.