Abstract: The present invention relates to a process and a system for processing waste water containing organic compounds. The system includes a UV/ozone oxidation removal module, or one or more removal modules connected in series whereas such a serial connection can be continuous or discontinuous. A UV/ozone oxidation removal module mainly includes an ozone generator, an ozone injector, an ozone dissolution tank, an ozone decomposition device, a UV reaction tank, a recycling pipeline. The efficiency of the UV/ozone oxidation removal module is controlled by the recycling ratio, the ozone concentration, and the intensity of UV light.

Abstract: The present invention relates to a process and a system for processing waste water containing organic compounds. The system includes a UV/ozone oxidation removal module, or one or more removal modules connected in series whereas such a serial connection can be continuous or discontinuous. A UV/ozone oxidation removal module mainly includes an ozone generator, an ozone injector, an ozone dissolution tank, an ozone decomposition device, a UV reaction tank, a recycling pipeline. The efficiency of the UV/ozone oxidation removal module is controlled by the recycling ratio, the ozone concentration, and the intensity of UV light.

Abstract: The present invention discloses a technique of removing a substance from a substrate surface, such as stripping photoresist from a wafer, or forming a substance on a substrate surface. Substrates to be treated are parallel arranged at an equal interval and are immersed in a liquid with only a lower portion thereof being below the liquid surface. Gas such as ozone is introduced into the liquid and is continuously bubbling below the substrates. The bubbles will ascend between two adjacent substrates and climb on the surfaces of the substrates before they burst. The liquid boundary layers on the substrate surfaces are compressed and refreshed in the course of a dragging ascent of the bubbles, enhancing mass transfer between gas/liquid/solid substances across the liquid boundary layer, thereby resulting in a fast reaction and a fast treatment of the surface of the substrates.

Abstract: A method is devised to produce a reaction liquid, for example deionized water, containing a high concentration of ozone. The method makes use of a chemical control mechanism and a recycling mechanism to enhance the dissolution of the ozone in the reaction liquid. The chemical control mechanism includes the addition of the chemical radical scavenger to a dissolution system, and the recycling mechanism recycling a portion of the resulting ozone-containing liquid back to the dissolution system, so as to enhance the ozone dissolution to an extent that the ozone concentration reaches a saturation point attainable under thermodynamics of the dissolution system.

Abstract: The present invention discloses a process and an apparatus for removing deep sub-micron particles from water. The invented process includes adjusting pH value and conductivity, adding an oxidation agent, performing an electro coagulation reaction/an electro-oxidation reaction, and performing a flocculation sedimentation, etc. The invented apparatus includes a front adjustment tank for adjusting the properties of waste water, wherein the adjustment includes a pH adjustment, an electrolyte adjustment, or an oxidant addition, etc.

Abstract: The present invention relates to a process and a system for processing waste water containing organic compounds. The system includes a UV/ozone oxidation removal module, or one or more removal modules connected in series whereas such a serial connection can be continuous or discontinuous. A UV/ozone oxidation removal module mainly includes an ozone generator, an ozone injector, an ozone dissolution tank, an ozone decomposition device, a UV reaction tank, a recycling pipeline. The efficiency of the UV/ozone oxidation removal module is controlled by the recycling ratio, the ozone concentration, and the intensity of UV light.