Patents by Inventor Konoe Miura

Konoe Miura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive composition
    Patent number: 4083725
    Abstract: A photosensitive composition is prepared from a mixture of a cinnamic acid photosensitive resin and a halogen-substituted benzanthrone sensitizer.
    Type: Grant
    Filed: April 19, 1976
    Date of Patent: April 11, 1978
    Assignee: Mitsubishi Chemical Industries Ltd.
    Inventors: Hideo Fukutani, Konoe Miura, Chihiro Eguchi, Yoshihiro Takahashi, Kazuo Torige
  • Photosensitive composition
    Patent number: 4063953
    Abstract: A photosensitive composition is prepared from a mixture of a photosensitive resin containing radicals having the formula ##STR1## wherein X and Y represent hydrogen, halogen, cyano or nitro, Ar represents an aryl radical or a substituted aryl radical, and n represents 1 or 2, and a solvent having the formula ##STR2## wherein R and R" represent a lower alkyl radical and R' represents a lower alkylene radical.
    Type: Grant
    Filed: December 3, 1975
    Date of Patent: December 20, 1977
    Assignee: Mitsubishi Chemical Industries, Ltd.
    Inventors: Hideo Fukutani, Konoe Miura, Yoshihiro Takahashi, Kazuo Torige