Patents by Inventor Konstantin Tsigutkin
Konstantin Tsigutkin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230296533Abstract: A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.Type: ApplicationFiled: May 23, 2023Publication date: September 21, 2023Applicant: ASML Netherlands B.V.Inventors: Nitish KUMAR, Richard Quintanilha, Markus Gerardus Martinus Maria Van Kraaij, Konstantin Tsigutkin, Willem Marie Julia Marcel Coene
-
Patent number: 11692948Abstract: A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.Type: GrantFiled: January 8, 2019Date of Patent: July 4, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Nitish Kumar, Richard Quintanilha, Markus Gerardus Martinus Maria Van Kraaij, Konstantin Tsigutkin, Willem Marie Julia Marcel Coene
-
Patent number: 11635700Abstract: A method for producing a protective buffer flow in an EUV light source and an EUV mask inspection apparatus are provided. The method includes directing light along a light path from the EUV light source toward a collector. A first buffer gas from a buffer gas injector is injected through a plurality of through holes in the collector. The first buffer gas is directed away from a surface of the collector. A second buffer gas is injected from a ring manifold arranged peripherally to the collector and arranged a first distance toward the light path in relation to the collector. The second buffer gas is directed away from the surface of the collector. The first distance corresponds to a distance from the collector where the first buffer gas merges into a single flow.Type: GrantFiled: March 23, 2021Date of Patent: April 25, 2023Inventors: Erel Milshtein, Alexander Bykanov, Konstantin Tsigutkin, Lauren Wilson, Lubomyr Kucher, Brian Ahr, Maksim Alexandrovich Deminskii, Leonid Borisovich Zvedenuk, Aleksandr Vladimirovich Lebedev, Andrey Evgenievich Stepanov
-
Patent number: 11499924Abstract: Methods and systems for determining one or more characteristics of light in an optical system are provided. One system includes first detector(s) configured to detect light having one or more wavelengths shorter than 190 nm emitted from a light source at one or more first angles mutually exclusive of one or more second angles at which the light is collected from the light source by an optical system for illumination of a specimen and to generate first output responsive to the light detected by the first detector(s). In addition, the system includes a control subsystem configured for determining one or more characteristics of the light at one or more planes in the optical system based on the first output.Type: GrantFiled: May 27, 2020Date of Patent: November 15, 2022Assignee: KLA Corp.Inventors: Larissa Juschkin, Konstantin Tsigutkin
-
Publication number: 20220260928Abstract: A method for producing a protective buffer flow in an EUV light source and an EUV mask inspection apparatus are provided. The method includes directing light along a light path from the EUV light source toward a collector. A first buffer gas from a buffer gas injector is injected through a plurality of through holes in the collector. The first buffer gas is directed away from a surface of the collector. A second buffer gas is injected from a ring manifold arranged peripherally to the collector and arranged a first distance toward the light path in relation to the collector. The second buffer gas is directed away from the surface of the collector. The first distance corresponds to a distance from the collector where the first buffer gas merges into a single flow.Type: ApplicationFiled: March 23, 2021Publication date: August 18, 2022Inventors: Erel Milshtein, Alexander Bykanov, Konstantin Tsigutkin, Lauren Wilson, Lubomyr Kucher, Brian Ahr, Maksim Alexandrovich Deminskii, Leonid Borisovich Zvedenuk, Aleksandr Vladimirovich Lebedev, Andrey Evgenievich Stepanov
-
Patent number: 11293880Abstract: An inspection system and a method of using the same are disclosed. The inspection system comprises an illumination source configured to emit an extreme ultraviolet (EUV) illumination beam for illuminating a sample, one or more first multi-cell detectors configured to generate a first illumination intensity distribution signal based on a first photocurrent, one or more second multi-cell detectors configured to generate a second illumination intensity distribution signal based on a second photocurrent, a detector assembly configured to receive the illumination beam and generate images, and a controller configured to: receive the images from the detector assembly, calibrate the second illumination intensity distribution signal to the images by mapping distortions in the second illumination intensity distribution signal to distorted pixels in the images, increase or decrease intensities of the distorted pixels in the images to generate corrected images, and detect defects on the samples.Type: GrantFiled: December 3, 2020Date of Patent: April 5, 2022Assignee: KLA CorporationInventors: Larissa Juschkin, Konstantin Tsigutkin, Debashis De Munshi
-
Publication number: 20210262944Abstract: An inspection system and a method of using the same are disclosed. The inspection system comprises an illumination source configured to emit an extreme ultraviolet (EUV) illumination beam for illuminating a sample, one or more first multi-cell detectors configured to generate a first illumination intensity distribution signal based on a first photocurrent, one or more second multi-cell detectors configured to generate a second illumination intensity distribution signal based on a second photocurrent, a detector assembly configured to receive the illumination beam and generate images, and a controller configured to: receive the images from the detector assembly, calibrate the second illumination intensity distribution signal to the images by mapping distortions in the second illumination intensity distribution signal to distorted pixels in the images, increase or decrease intensities of the distorted pixels in the images to generate corrected images, and detect defects on the samples.Type: ApplicationFiled: December 3, 2020Publication date: August 26, 2021Applicant: KLA CorporationInventors: Larissa Juschkin, Konstantin Tsigutkin, Debashis De Munshi
-
Publication number: 20200378901Abstract: Methods and systems for determining one or more characteristics of light in an optical system are provided. One system includes first detector(s) configured to detect light having one or more wavelengths shorter than 190 nm emitted from a light source at one or more first angles mutually exclusive of one or more second angles at which the light is collected from the light source by an optical system for illumination of a specimen and to generate first output responsive to the light detected by the first detector(s). In addition, the system includes a control subsystem configured for determining one or more characteristics of the light at one or more planes in the optical system based on the first output.Type: ApplicationFiled: May 27, 2020Publication date: December 3, 2020Inventors: Larissa Juschkin, Konstantin Tsigutkin
-
Publication number: 20200348244Abstract: A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.Type: ApplicationFiled: January 8, 2019Publication date: November 5, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Nitish KUMAR, Richard QUINTANILHA, Markus Gerardus Martinus Maria VAN KRAAIJ, Konstantin TSIGUTKIN, Willem Marie Julia Marcel COENE
-
Patent number: 9544984Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.Type: GrantFiled: July 18, 2014Date of Patent: January 10, 2017Assignee: KLA-Tencor CorporationInventors: Alexander Bykanov, Oleg Khodykin, Daniel C. Wack, Konstantin Tsigutkin, Layton Hale, Joseph Walsh, Frank Chilese, Rudy F. Garcia, Brian Ahr
-
Publication number: 20150076359Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.Type: ApplicationFiled: July 18, 2014Publication date: March 19, 2015Inventors: Alexander Bykanov, Oleg Khodykin, Daniel C. Wack, Konstantin Tsigutkin, Layton Hale, Joseph Walsh, Frank Chilese
-
Patent number: 8767291Abstract: A pulsed laser system includes a variable attenuator located in a secondary optical path bounded by a target surface and one or more reflective surfaces outside of the primary laser oscillator of the laser system. The variable attenuator isolates an output optical amplifier of the laser system from light reflected from the target during time periods between laser pulses. In some embodiments, the variable attenuator is synchronously controlled with the primary laser oscillator. In some other embodiments, the variable attenuator is controlled separately from the primary laser oscillator to shape the generated laser pulses.Type: GrantFiled: March 8, 2013Date of Patent: July 1, 2014Assignee: KLA-Tencor CorporationInventor: Konstantin Tsigutkin
-
Publication number: 20130242380Abstract: A pulsed laser system includes a variable attenuator located in a secondary optical path bounded by a target surface and one or more reflective surfaces outside of the primary laser oscillator of the laser system. The variable attenuator isolates an output optical amplifier of the laser system from light reflected from the target during time periods between laser pulses. In some embodiments, the variable attenuator is synchronously controlled with the primary laser oscillator. In some other embodiments, the variable attenuator is controlled separately from the primary laser oscillator to shape the generated laser pulses.Type: ApplicationFiled: March 8, 2013Publication date: September 19, 2013Applicant: KLA-TENCOR CORPORATIONInventor: Konstantin Tsigutkin