Patents by Inventor Kosei Aso

Kosei Aso has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8809732
    Abstract: An ablation method including a steps of ablating a region of a substrate (1) by a laser beam (3); and removing debris ablated from the region (1) by a flow of a fluid (7), namely, a gas or vapor, a liquid or a combination of the fluids. The flow of fluid (7) is directed to flow over the region so as to entrap debris and thereafter remove the entrapped debris from the region by directing the flow of fluid, with any entrapped debris, away from region along a predetermined path (6) avoiding subsequent deposition of entrapped debris on the substrate.
    Type: Grant
    Filed: December 19, 2012
    Date of Patent: August 19, 2014
    Assignees: TEL Solar AG, Sony Corporation
    Inventors: Neil Sykes, Yoshinari Sasaki, Hidehisa Murase, Naoki Yamada, Kosei Aso
  • Patent number: 8581140
    Abstract: A laser processing apparatus is provided. The laser processing apparatus includes a laser processing head having a transmission window, an opening portion, an outlet hole, a first vent hole and a second vent hole. The transmission window transmits laser light by which a processing object is irradiated. The opening portion passes the transmitted laser light to a bottom portion of the laser processing head. The outlet hole discharges an atmosphere in the vicinity of a laser light irradiation region of the processing object to the outside. The first vent hole directs gas into the vicinity of the laser light irradiation region. The second vent hole discharges the atmosphere in the vicinity of the laser light irradiation region. Debris generated from the processing object is discharged from the outlet hole and the second vent hole that are continuous with the opening portion provided at the bottom portion of the laser processing head.
    Type: Grant
    Filed: August 25, 2006
    Date of Patent: November 12, 2013
    Assignees: Sony Corporation, Exitech Limited
    Inventors: Kosei Aso, Yoshinari Sasaki, Hidehisa Murase, Naoki Yamada
  • Patent number: 8288681
    Abstract: A laser processing apparatus is provided. The laser processing apparatus removes and extracts debris generated by irradiating a transparent resin layer formed on a substrate with laser light during a patterning process, and includes a debris extraction module provided on the upper side of the substrate, wherein the debris extraction module sucks and extracts debris due to sublimation, thermal processing and composite action thereof generated from the transparent resin layer on the substrate irradiated with the laser light from the lower side thereof.
    Type: Grant
    Filed: September 6, 2006
    Date of Patent: October 16, 2012
    Assignee: Sony Corporation
    Inventors: Hidehisa Murase, Yoshinari Sasaki, Kosei Aso, Naoki Yamada
  • Patent number: 8283596
    Abstract: A laser processing apparatus is provided for patterning with laser light a resin film or a metal film formed on a substrate. The apparatus includes a laser light source; and a debris collection device having a transmission window through which the laser light is transmitted, a vortex generation mechanism generating a vortex gas flow by allowing gas to flow into a region near a laser light-irradiated area of the resin film or the metal film, and a screening device having an opening through which the incident laser light passes and screening a flow of debris. The mechanism is placed close to the resin film or the metal film on the substrate. Debris generated by laser light irradiation and before and after being stacked on the object film is entrained in the vortex gas flow generated by the vortex generation mechanism and is exhausted to outside through the screening device.
    Type: Grant
    Filed: June 12, 2008
    Date of Patent: October 9, 2012
    Assignee: Sony Corporation
    Inventors: Hidehisa Murase, Yoshinari Sasaki, Kosei Aso, Naoki Yamada
  • Publication number: 20110227255
    Abstract: Disclosed herein is a manufacturing method for a molded article having a very fine uneven surface structure wherein, while a laser irradiation region is successively moved with respect to a working face of a working object article for each one shot, a laser beam is repetitively irradiated upon the working face of the working object article, the manufacturing method including the steps of: setting an energy density for the laser beam; setting a number of shots with which a desired fine shape is to be formed; calculating a speed of movement of the laser irradiation region with respect to the working face; and irradiating the laser beam of the set energy density while the working face is moved relative to the laser irradiation region at the calculated speed of movement to form a very fine uneven structure formed from working marks on the working face on which the fine shape is formed.
    Type: Application
    Filed: February 23, 2011
    Publication date: September 22, 2011
    Applicant: Sony Corporation
    Inventors: Hidehisa Murase, Yoshinari Sasaki, Shunsuke Matsui, Kosei Aso
  • Patent number: 7863542
    Abstract: A laser processing apparatus is provided. The laser processing apparatus is for performing pattern processing of a transparent conductive film that is formed on a multilayer film on a substrate by using laser light, includes debris extraction module having a vortex generation mechanism that generates a vortex flow by directing gas into the vicinity of a laser-irradiated portion of the transparent conductive film. The debris extraction module is disposed close to the substrate, and debris before deposition and after deposition on the substrate, which is generated by laser irradiation, is entrapped into the vortex flow to be extracted to the outside with the gas.
    Type: Grant
    Filed: August 25, 2006
    Date of Patent: January 4, 2011
    Assignees: Sony Corporation, Exitech Limited
    Inventors: Hidehisa Murase, Yoshinari Sasaki, Kosei Aso, Naoki Yamada
  • Patent number: 7692115
    Abstract: Disclosed is a laser processing device. The laser processing device includes a laser beam source irradiating a laser beam, and a laser processing head. The laser processing head includes a transmitting window through which the laser beam passes, an aperture formed in a bottom of the laser head and allowing the laser beam to pass through via the transmitting window, an introducing hole introducing a gas into the laser processing head, and an exhausting hole discharging a gas in the laser processing head to outside. The laser processing head further includes a air hole introducing the gas to the periphery of the laser irradiating area, an air hole allowing to discharge the ambient gas of the laser irradiating area, and a masking shield having an opening placed between the transmitting window and the aperture, and an aerating portion communicated with the introducing hole and exhausting hole.
    Type: Grant
    Filed: November 1, 2007
    Date of Patent: April 6, 2010
    Assignee: Sony Corporation
    Inventors: Yoshinari Sasaki, Kosei Aso, Hidehisa Murase, Naoki Yamada
  • Publication number: 20100062222
    Abstract: Disclosed herein is a die manufacturing method including the steps of: forming a pattern on the machining surface of a cylindrical resin original plate by laser machining; and fabricating a cylindrical die by the electroforming method using the resin original plate having the pattern formed.
    Type: Application
    Filed: September 2, 2009
    Publication date: March 11, 2010
    Applicant: SONY CORPORATION
    Inventors: Hidehisa Murase, Yoshinari Sasaki, Kosei Aso, Tomohide Jozaki, Setsuo Okino
  • Publication number: 20090068598
    Abstract: A laser processing apparatus is provided for patterning with laser light a resin film or a metal film formed on a substrate. The apparatus includes a laser light source; and a debris collection device having a transmission window through which the laser light is transmitted, a vortex generation mechanism generating a vortex gas flow by allowing gas to flow into a region near a laser light-irradiated area of the resin film or the metal film, and a screening device having an opening through which the incident laser light passes and screening a flow of debris. The mechanism is placed close to the resin film or the metal film on the substrate. Debris generated by laser light irradiation and before and after being stacked on the object film is entrained in the vortex gas flow generated by the vortex generation mechanism and is exhausted to outside through the screening device.
    Type: Application
    Filed: June 12, 2008
    Publication date: March 12, 2009
    Applicant: SONY CORPORATION
    Inventors: Hidehisa Murase, Yoshinari Sasaki, Kosei Aso, Naoki Yamada
  • Publication number: 20080210675
    Abstract: Disclosed is a laser processing device. The laser processing device includes a laser beam source irradiating a laser beam, and a laser processing head. The laser processing head includes a transmitting window through which the laser beam passes, an aperture formed in a bottom of the laser head and allowing the laser beam to pass through via the transmitting window, an introducing hole introducing a gas into the laser processing head, and an exhausting hole discharging a gas in the laser processing head to outside. The laser processing head further includes a air hole introducing the gas to the periphery of the laser irradiating area, an air hole allowing to discharge the ambient gas of the laser irradiating area, and a masking shield having an opening placed between the transmitting window and the aperture, and an aerating portion communicated with the introducing hole and exhausting hole.
    Type: Application
    Filed: November 1, 2007
    Publication date: September 4, 2008
    Applicant: SONY CORPORATION
    Inventors: Yoshinari Sasaki, Kosei Aso, Hidehisa Murase, Naoki Yamada
  • Publication number: 20070210045
    Abstract: A laser processing apparatus is provided. The laser processing apparatus includes a laser processing head having a transmission window, an opening portion, an outlet hole, a first vent hole and a second vent hole. The transmission window transmits laser light by which a processing object is irradiated. The opening portion passes the transmitted laser light to a bottom portion of the laser processing head. The outlet hole discharges an atmosphere in the vicinity of a laser light irradiation region of the processing object to the outside. The first vent hole directs gas into the vicinity of the laser light irradiation region. The second vent hole discharges the atmosphere in the vicinity of the laser light irradiation region. Debris generated from the processing object is discharged from the outlet hole and the second vent hole that are continuous with the opening portion provided at the bottom portion of the laser processing head.
    Type: Application
    Filed: August 25, 2006
    Publication date: September 13, 2007
    Applicants: SONY CORPORATION, EXITECH LIMITED
    Inventors: Kosei Aso, Yoshinari Sasaki, Naoki Yamada
  • Publication number: 20070145026
    Abstract: A laser processing apparatus is provided. The laser processing apparatus is for performing pattern processing of a transparent conductive film that is formed on a multilayer film on a substrate by using laser light, includes debris extraction module having a vortex generation mechanism that generates a vortex flow by directing gas into the vicinity of a laser-irradiated portion of the transparent conductive film. The debris extraction module is disposed close to the substrate, and debris before deposition and after deposition on the substrate, which is generated by laser irradiation, is entrapped into the vortex flow to be extracted to the outside with the gas.
    Type: Application
    Filed: August 25, 2006
    Publication date: June 28, 2007
    Inventors: Hidehisa Murase, Yoshinari Sasaki, Kosei Aso, Naoki Yamada
  • Publication number: 20070056941
    Abstract: A laser processing apparatus is provided. The laser processing apparatus removes and extracts debris generated by irradiating a transparent resin layer formed on a substrate with laser light during a patterning process, including debris extraction module provided on the upper side of the substrate, wherein the debris extraction module sucks and extracts debris due to sublimation, thermal processing and composite action thereof generated from the transparent resin layer on the substrate irradiated with the laser light from the lower side thereof.
    Type: Application
    Filed: September 6, 2006
    Publication date: March 15, 2007
    Applicant: Sony Corporation
    Inventors: Hidehisa Murase, Yoshinari Sasaki, Kosei Aso, Naoki Yamada