Abstract: A turbo-type fluid machine includes a shaft configured to be rotationally driven, a compression mechanism having an impeller, and a coupling portion coupling an end portion of the shaft and the impeller with each other. The coupling portion is provided with a balance adjustment mechanism.

Abstract: A defect inspection apparatus includes: a feature value calculation unit calculating a feature value based on a captured image of a sample; an image information reduction unit generating a latent variable by reducing an information quantity of the feature value; a statistic value estimation unit estimating an image statistic value that can be taken by a normal image based on the latent variable; and a defect detection unit detecting a defect in an inspection image based on the image statistic value and the inspection image of the sample.

Abstract: An inspection apparatus includes an image distortion estimation unit that estimates a distortion amount between a reference image and an inspection image, an image distortion correction unit that corrects the inspection image and/or the reference image using an estimated distortion amount, and an inspection unit that performs inspection using a corrected inspection image and the reference image or the inspection image and a corrected reference image. The image distortion estimation unit estimates a distortion amount in which only distortion occurring in an entire image can be corrected by adjustment of a correction condition.

Abstract: A substrate processing method includes: a first processing step of supplying a first processing liquid to a surface of a substrate under rotation to cover the surface of the substrate with a liquid film of the first processing liquid; and a second processing step of supplying a second processing liquid having a surface tension smaller than that of the first processing liquid to the surface of the substrate to cover the surface of the substrate with a liquid film of the second processing liquid by substituting the first processing liquid with the second processing liquid, wherein the second processing step includes: a first stage of simultaneously supplying both the first processing liquid and the second processing liquid to the surface of the substrate, and a second stage of supplying the second processing liquid to a central portion of the surface of the substrate without supplying the first processing liquid.

Abstract: A substrate solution-treatment apparatus includes: a substrate holding part for holding a substrate; a nozzle for supplying a treatment solution onto the substrate; a supply line; a flow rate control mechanism including a flow rate meter and a flow rate control valve installed in the supply line; an opening/closing valve installed in the supply line; and a control part for controlling operations of the flow rate control mechanism and the opening/closing valve. The flow rate control mechanism controls the flow rate control valve such that a detection value of the flow rate meter coincides with a flow rate target value provided from the control part. The control part controls the nozzle to supply the treatment solution onto the substrate with the opening/closing valve opened, and provides a first flow rate as the flow rate target value to the flow rate control mechanism.

Abstract: A substrate solution-treatment apparatus includes: a substrate holding part for holding a substrate; a nozzle for supplying a treatment solution onto the substrate; a supply line; a flow rate control mechanism including a flow rate meter and a flow rate control valve installed in the supply line; an opening/closing valve installed in the supply line; and a control part for controlling operations of the flow rate control mechanism and the opening/closing valve. The flow rate control mechanism controls the flow rate control valve such that a detection value of the flow rate meter coincides with a flow rate target value provided from the control part. The control part controls the nozzle to supply the treatment solution onto the substrate with the opening/closing valve opened, and provides a first flow rate as the flow rate target value to the flow rate control mechanism.