Patents by Inventor Kotaro Yamazaki

Kotaro Yamazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electrolyte, electrochemical device, lithium-ion secondary battery, and module
    Patent number: 11996522
    Abstract: An electrolyte solution containing a compound represented by formula (1) and a compound represented, for example, by formula (11-1), the formula (1) being: wherein M101 is P or P?O; R101 is a group such as a C1-C11 alkylsilyloxy group; n101 is an oxidation number of M101 minus 1 or an oxidation number of M101 minus 3; and R102 to R104 are each individually a group such as a C1-C11 alkyl group; the formula (11-1) being: wherein R111 and R112 are the same as or different from each other and are each an atom or group such as a hydrogen atom; and R113 is a group such as an alkyl group free from a fluorine atom.
    Type: Grant
    Filed: March 18, 2019
    Date of Patent: May 28, 2024
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Yoshiko Kuwajima, Tomoya Hidaka, Masakazu Kinoshita, Yuuki Suzuki, Toshiharu Shimooka, Hisako Nakamura, Takaya Yamada, Shigeaki Yamazaki, Akiyoshi Yamauchi, Kotaro Hayashi, Yoshihiro Yamamoto, Kenzou Takahashi
  • Electrolyte, electrochemical device, lithium ion secondary battery, and module
    Patent number: 11945776
    Abstract: An electrolyte solution containing a compound represented by the following formula (1).
    Type: Grant
    Filed: January 9, 2019
    Date of Patent: April 2, 2024
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Yoshiko Kuwajima, Akiyoshi Yamauchi, Kotaro Hayashi, Hisako Nakamura, Toshiharu Shimooka, Takaya Yamada, Yoshihiro Yamamoto, Shigeaki Yamazaki, Kenzou Takahashi
  • Electrolyte solution, electrochemical device, lithium ion secondary battery, and module
    Patent number: 11916195
    Abstract: An electrolyte solution containing a compound (1) represented by the formula (1), (wherein R101 and R102 are each individually a substituent such as a C1-C7 alkyl group, and the substituent optionally contains at least one divalent to hexavalent hetero atom in a structure or optionally has a structure obtained by replacing at least one hydrogen atom by a fluorine atom or a C0-C7 functional group) and at least one compound (11) selected from compounds such as a compound represented by formula (11-1) (wherein R111 and R112 are the same as or different from each other and are each a hydrogen atom or the like, and R113 is an alkyl group free from a fluorine atom or the like):
    Type: Grant
    Filed: March 11, 2019
    Date of Patent: February 27, 2024
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Masakazu Kinoshita, Tomoya Hidaka, Toshiharu Shimooka, Shigeaki Yamazaki, Hisako Nakamura, Takaya Yamada, Yuuki Suzuki, Yoshiko Kuwajima, Kenzou Takahashi, Akiyoshi Yamauchi, Kotaro Hayashi
  • Method of forming a conductive pattern
    Patent number: 7459097
    Abstract: A method of forming a conductive pattern can form a conductive pattern where the aspect ratio of the height to the width is high with favorable electrical connectivity.
    Type: Grant
    Filed: July 7, 2006
    Date of Patent: December 2, 2008
    Assignee: Fujitsu Limited
    Inventors: Kotaro Yamazaki, Takashi Ito, Junji Sato
  • Method for manufacturing thin-film magnetic head
    Publication number: 20080022509
    Abstract: A method is provided to manufacture a thin-film magnetic head that includes an insulating layer having a swelling extending from the front end to the back end of the insulating layer and also includes a upper magnetic pole having an apex part, a narrow part located on the side close to the front end of the apex part, and a taper part broadened toward the back end of the upper magnetic pole. The method includes a step of forming the insulating layer; a step of forming a photosensitive resist layer on the insulating layer; a step of forming a first mask layer, having a first blanked region formed in the shape of the narrow part, on the photosensitive resist layer; and a step of forming a second mask layer, having a second blanked region formed in the shape of the taper part, on the photosensitive resist layer.
    Type: Application
    Filed: November 1, 2006
    Publication date: January 31, 2008
    Inventors: Makoto Sakai, Kotaro Yamazaki
  • Method of forming a conductive pattern
    Publication number: 20070221612
    Abstract: A method of forming a conductive pattern can form a conductive pattern where the aspect ratio of the height to the width is high with favorable electrical connectivity.
    Type: Application
    Filed: July 7, 2006
    Publication date: September 27, 2007
    Inventors: Kotaro Yamazaki, Takashi Ito, Junji Sato