Patents by Inventor Kou Imaoka

Kou Imaoka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gas chemistry for improved in-situ cleaning of residue for a CVD apparatus
    Patent number: 6060397
    Abstract: A method (100) of cleaning residues from a chemical vapor deposition apparatus (10) is provided. The present method (100) includes introducing into a chamber (12) cleaning gases such as N.sub.2, C.sub.2 F.sub.6, and O.sub.2, and forming a plasma from the cleaning gases. The present method also includes removing residues from interior surfaces of the chamber 12 by forming a volatile product from the residues and at least one of the cleaning gases.
    Type: Grant
    Filed: July 14, 1995
    Date of Patent: May 9, 2000
    Assignee: Applied Materials, Inc.
    Inventors: Martin Seamons, Cary Ching, Kou Imaoka, Tatsuya Sato, Tirunelveli S. Ravi, Michael C. Triplett