Abstract: An exposure apparatus comprises a first detector detecting substrate-side marks via an original-side mark and a projection optical system; second detectors arranged in a larger number than the first detector and detecting the substrate-side marks not via the projection optical system; a reference plate having reference marks; and a control unit configured to obtain a first detection result of the plurality of reference marks by the second detectors, obtain first information relating to a first distance between the plurality of second detectors based on the first detection result, obtain a second detection result of the identical substrate-side mark by the first detector and the second detectors, obtain second information relating to a second distance between the first detector and the second detectors based on the second detection result, and control the alignment of the original and the substrate based on the first information and the second information.

Abstract: An exposure apparatus comprises a first detector detecting substrate-side marks via an original-side mark and a projection optical system; second detectors arranged in a larger number than the first detector and detecting the substrate-side marks not via the projection optical system; a reference plate having reference marks; and a control unit configured to obtain a first detection result of the plurality of reference marks by the second detectors, obtain first information relating to a first distance between the plurality of second detectors based on the first detection result, obtain a second detection result of the identical substrate-side mark by the first detector and the second detectors, obtain second information relating to a second distance between the first detector and the second detectors based on the second detection result, and control the alignment of the original and the substrate based on the first information and the second information.