Patents by Inventor Kouichi Hiranaka

Kouichi Hiranaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9281438
    Abstract: A group III element nitride single crystal is grown on a template immersed in a raw material liquid retained in a crucible and containing a group III material and one of an alkali metal and an alkali earth metal. The raw material liquid remaining after the growth of the single crystal is cooled and solidified, and by feeding a hydroxyl group-containing solution into the crucible, the solidified raw material is removed from around the template, and thus the group III element nitride single crystal is taken out from inside the solidified raw material. The template is disposed at a position away from the bottom of the crucible.
    Type: Grant
    Filed: September 26, 2008
    Date of Patent: March 8, 2016
    Assignee: RICOH COMPANY, LTD.
    Inventors: Takeshi Hatakeyama, Hisashi Minemoto, Kouichi Hiranaka, Osamu Yamada
  • Patent number: 8828734
    Abstract: Provided are a nitric oxide detection element capable of detecting NO gas contained in a mixed gas at a high speed even when the amount thereof is a super trace amount of ten and several parts per billion; and a process for producing the element. In a nitric oxide detection element having a substrate 12 and a sensing film 11 formed on a surface of the substrate, the sensing film is composed of nitric oxide sensing particles and a polymer adhesive. The nitric oxide sensing particles are produced by adsorbing a dye having a porphyrin skeleton and having, as a central metal, divalent cobalt onto surfaces of inorganic particles.
    Type: Grant
    Filed: July 12, 2011
    Date of Patent: September 9, 2014
    Assignees: Panasonic Healthcare Co., Ltd., National University Corporation Ehime University
    Inventors: Kouichi Hiranaka, Toyofumi Nagamatsu, Yoshihiko Sadaoka, Yoshiteru Itagaki
  • Publication number: 20140030549
    Abstract: A method for producing a high-quality group-III element nitride crystal at a high crystal growth rate, and a group-III element nitride crystal are provided. The method includes the steps of placing a group-III element, an alkali metal, and a seed crystal of group-III element nitride in a crystal growth vessel, pressurizing and heating the crystal growth vessel in an atmosphere of nitrogen-containing gas, and causing the group-III element and nitrogen to react with each other in a melt of the group-III element, the alkali metal and the nitrogen so that a group-III element nitride crystal is grown using the seed crystal as a nucleus. A hydrocarbon having a boiling point higher than the melting point of the alkali metal is added before the pressurization and heating of the crystal growth vessel.
    Type: Application
    Filed: September 30, 2013
    Publication date: January 30, 2014
    Applicant: RICOH COMPANY, LTD.
    Inventors: Osamu Yamada, Hisashi Minemoto, Kouichi Hiranaka, Takeshi Hatakeyama, Takamoto Sasaki, Yusuke Mori, Fumio Kawamura, Yasuo Kitaoka
  • Patent number: 8574361
    Abstract: A method for producing a high-quality group-III element nitride crystal at a high crystal growth rate, and a group-III element nitride crystal are provided. The method includes the steps of placing a group-III element, an alkali metal, and a seed crystal of group-III element nitride in a crystal growth vessel, pressurizing and heating the crystal growth vessel in an atmosphere of nitrogen-containing gas, and causing the group-III element and nitrogen to react with each other in a melt of the group-III element, the alkali metal and the nitrogen so that a group-III element nitride crystal is grown using the seed crystal as a nucleus. A hydrocarbon having a boiling point higher than the melting point of the alkali metal is added before the pressurization and heating of the crystal growth vessel.
    Type: Grant
    Filed: March 5, 2008
    Date of Patent: November 5, 2013
    Assignee: Ricoh Company, Ltd.
    Inventors: Osamu Yamada, Hisashi Minemoto, Kouichi Hiranaka, Takeshi Hatakeyama, Takatomo Sasaki, Yusuke Mori, Fumio Kawamura, Yasuo Kitaoka
  • Patent number: 8508738
    Abstract: The nitrogen oxide sensing element of the present invention is such that a sensing film (11) is formed on the surface of a substrate (12a), the sensing film including a polymer containing as dispersed therein a porphyrin containing cobalt as a central metal, or a single derivative having a porphyrin skeleton containing cobalt as a central metal or a mixture of derivatives each having a porphyrin skeleton containing cobalt as a central metal; thus, this sensing element is capable of determining the concentration of NO with high sensitivity and satisfactory accuracy under the condition that the cobalt porphyrin is not affected by reaction inhibitors such as O2 and CO even in the atmosphere.
    Type: Grant
    Filed: November 6, 2009
    Date of Patent: August 13, 2013
    Assignee: Panasonic Corporation
    Inventors: Kouichi Hiranaka, Toyofumi Nagamatsu, Yoshihiko Sadaoka, Yoshiteru Itagaki
  • Publication number: 20130137184
    Abstract: Provided are a nitric oxide detection element capable of detecting NO gas contained in a mixed gas at a high speed even when the amount thereof is a super trace amount of ten and several parts per billion; and a process for producing the element. In a nitric oxide detection element having a substrate 12 and a sensing film 11 formed on a surface of the substrate, the sensing film is composed of nitric oxide sensing particles and a polymer adhesive. The nitric oxide sensing particles are produced by adsorbing a dye having a porphyrin skeleton and having, as a central metal, divalent cobalt onto surfaces of inorganic particles.
    Type: Application
    Filed: July 12, 2011
    Publication date: May 30, 2013
    Applicants: NATIONAL UNIVERSITY CORPORATION EHIME UNIVERSITY, PANASONIC HEALTHCARE CO., LTD.
    Inventors: Kouichi Hiranaka, Toyofumi Nagamatsu, Yoshihiko Sadaoka, Yoshiteru Itagaki
  • Publication number: 20130125618
    Abstract: Provided is a nitric oxide detection element which is capable of measuring a trace amount of NO gas contained in a gas in a scale of several ppb and of which the time degradation in performance is suppressed. The nitric oxide detection element includes at a surface thereof: a dye having a porphyrin skeleton and containing divalent cobalt as a central metal; and a radical scavenger. The nitric oxide detection element includes a substrate 12 and a sensing film 11 formed on a surface of the substrate 12. The sensing film 11 may contain the dye and the radical scavenger.
    Type: Application
    Filed: July 12, 2011
    Publication date: May 23, 2013
    Applicants: NATIONAL UNIVERSITY CORPORATION EHIME UNIVERSITY, PANASONIC HEALTHCARE CO., LTD.
    Inventors: Kouichi Hiranaka, Yoshihiko Sadaoka, Yoshiteru Itagaki
  • Publication number: 20120168695
    Abstract: A method for producing a high-quality group-III element nitride crystal at a high crystal growth rate, and a group-III element nitride crystal are provided. The method includes the steps of placing a group-III element, an alkali metal, and a seed crystal of group-III element nitride in a crystal growth vessel, pressurizing and heating the crystal growth vessel in an atmosphere of nitrogen-containing gas, and causing the group-III element and nitrogen to react with each other in a melt of the group-III element, the alkali metal and the nitrogen so that a group-III element nitride crystal is grown using the seed crystal as a nucleus. A hydrocarbon having a boiling point higher than the melting point of the alkali metal is added before the pressurization and heating of the crystal growth vessel.
    Type: Application
    Filed: March 5, 2008
    Publication date: July 5, 2012
    Applicant: PANASONIC CORPORATION
    Inventors: Osamu YAMADA, Hisashi MINEMOTO, Kouichi HIRANAKA, Takeshi HATAKEYAMA, Takatomo SASAKI, Yusuke MORI, Fumio KAWAMURA, Yasuo KITAOKA
  • Publication number: 20110228276
    Abstract: The nitrogen oxide sensing element of the present invention is such that a sensing film (11) is formed on the surface of a substrate (12a), the sensing film including a polymer containing as dispersed therein a porphyrin containing cobalt as a central metal, or a single derivative having a porphyrin skeleton containing cobalt as a central metal or a mixture of derivatives each having a porphyrin skeleton containing cobalt as a central metal; thus, this sensing element is capable of determining the concentration of NO with high sensitivity and satisfactory accuracy under the condition that the cobalt porphyrin is not affected by reaction inhibitors such as O2 and CO even in the atmosphere.
    Type: Application
    Filed: November 6, 2009
    Publication date: September 22, 2011
    Applicants: PANASONIC CORPORATION, NATIONAL UNIVERSITY CORPORATION EHIME UNIVERSITY
    Inventors: Kouichi Hiranaka, Toyofumi Nagamatsu, Yoshihiko Sadaoka, Yoshiteru Itagaki
  • Publication number: 20110012070
    Abstract: A method for producing a high-quality group-III element nitride crystal at a high crystal growth rate, and a group-III element nitride crystal are provided. The method includes the steps of placing a group-III element, an alkali metal, and a seed crystal of group-III element nitride in a crystal growth vessel, pressurizing and heating the crystal growth vessel in an atmosphere of nitrogen-containing gas, and causing the group-III element and nitrogen to react with each other in a melt of the group-III element, the alkali metal and the nitrogen so that a group-III element nitride crystal is grown using the seed crystal as a nucleus. A hydrocarbon having a boiling point higher than the melting point of the alkali metal is added before the pressurization and heating of the crystal growth vessel.
    Type: Application
    Filed: July 28, 2009
    Publication date: January 20, 2011
    Applicant: PANASONIC CORPORATION
    Inventors: Osamu YAMADA, Hisashi MINEMOTO, Kouichi HIRANAKA, Takeshi HATAKEYAMA, Takatomo SASAKI, Yusuke MORI, Fumio KAWAMURA, Yasuo KITAOKA
  • Publication number: 20100213576
    Abstract: Disclosed is a method for producing a group III nitride crystal substrate. A group III nitride crystal is formed by a growth method using a flux. The group III nitride crystal substrate is heat treated at a temperature equal to or higher than the lowest temperature at which the flux contained inside the group III nitride crystal substrate through intrusion into the crystal during the crystal formation can be discharged to outside the group III nitride crystal substrate, and equal to or lower than the highest temperature at which the surface of the group III nitride crystal substrate is not decomposed.
    Type: Application
    Filed: October 8, 2008
    Publication date: August 26, 2010
    Applicant: PANASONIC CORPORATION
    Inventors: Kouichi Hiranaka, Hisashi Minemoto, Takeshi Hatakeyama, Osamu Yamada
  • Publication number: 20100192839
    Abstract: A group III element nitride single crystal is grown on a template immersed in a raw material liquid retained in a crucible and containing a group III material and one of an alkali metal and an alkali earth metal. The raw material liquid remaining after the growth of the single crystal is cooled and solidified, and by feeding a hydroxyl group-containing solution into the crucible, the solidified raw material is removed from around the template, and thus the group III element nitride single crystal is taken out from inside the solidified raw material. The template is disposed at a position away from the bottom of the crucible.
    Type: Application
    Filed: September 26, 2008
    Publication date: August 5, 2010
    Applicant: PANASONIC CORPORATION
    Inventors: Takeshi Hatakeyama, Hisashi Minemoto, Kouichi Hiranaka, Osamu Yamada
  • Publication number: 20100078606
    Abstract: A method for producing a high-quality group-III element nitride crystal at a high crystal growth rate, and a group-III element nitride crystal are provided. The method includes the steps of placing a group-III element, an alkali metal, and a seed crystal of group-III element nitride in a crystal growth vessel, pressurizing and heating the crystal growth vessel in an atmosphere of nitrogen-containing gas, and causing the group-III element and nitrogen to react with each other in a melt of the group-III element, the alkali metal and the nitrogen so that a group-III element nitride crystal is grown using the seed crystal as a nucleus. A hydrocarbon having a boiling point higher than the melting point of the alkali metal is added before the pressurization and heating of the crystal growth vessel.
    Type: Application
    Filed: March 5, 2008
    Publication date: April 1, 2010
    Inventors: Osamu Yamada, Hisashi Minemoto, Kouichi Hiranaka, Takeshi Hatakeyama, Takatomo Sasaki, Yusuke Mori, Fumio Kawamura, Yasuo Kitaoka
  • Publication number: 20090278744
    Abstract: There is provided a phased array antenna having variable phase shifters constituted by using a variable dielectric-constant dielectric substance whose dielectric constant varies according to an applied electric field, which antenna can dispense with a DC blocking element that causes mismatch, and reduce deformation of the beam shape even when beam tilt occurs, in the case where the variable phase shifters are divided into those for right-side tilt and those for left-side tilt and the phase shift amounts thereof are independently controlled.
    Type: Application
    Filed: October 11, 2006
    Publication date: November 12, 2009
    Applicant: PANASONIC CORPORATION
    Inventors: Hideki Kirino, Kouichi Hiranaka, Takeshi Hatakeyama
  • Patent number: 7282255
    Abstract: The present invention relates to a flexible printed circuit board which has extremely high adhesion performance and on which very fine circuit patterns can be formed by etching, and to a method for producing the same. In the present invention, in the flexible printed circuit board wherein a copper thin film made of copper or an alloy containing primarily copper is directly formed on at least one side of a plastic film substrate, and copper is formed further on the copper thin film by the electrolytic plating method, the above-mentioned copper thin film has a two-layer structure in which a layer including at least a crystalline structure is formed on the surface side thereof, and the X-ray relative intensity ratio between crystal lattice plane indices (200)/(111) in the above-mentioned crystalline structure is 0.1 or less.
    Type: Grant
    Filed: April 17, 2003
    Date of Patent: October 16, 2007
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kouichi Hiranaka, Ryuichi Nakagami, Mitsuhiro Fukuoka, Motohiro Yamashita
  • Publication number: 20050174722
    Abstract: The present invention relates to a flexible printed circuit board which has extremely high adhesion performance and on which very fine circuit patterns can be formed by etching, and to a method for producing the same. In the present invention, in the flexible printed circuit board wherein a copper thin film made of copper or an alloy containing primarily copper is directly formed on at least one side of a plastic film substrate, and copper is formed further on the copper thin film by the electrolytic plating method, the above-mentioned copper thin film has a two-layer structure in which a layer including at least a crystalline structure is formed on the surface side thereof, and the X-ray relative intensity ratio between crystal lattice plane indices (200)/(111) in the above-mentioned crystalline structure is 0.1 or less.
    Type: Application
    Filed: April 17, 2003
    Publication date: August 11, 2005
    Applicant: Matsushita Electric Industrial Co. Ltd.
    Inventors: Kouichi Hiranaka, Ryuichi Nakagami, Mitsuhiro Fukuoka, Motohiro Yamashita
  • Patent number: 6847448
    Abstract: A polarization analyzing apparatus includes: a light source for generating optical pulses; a light dividing part; an electromagnetic wave radiation part; a collimation part; a polarizer part; a light analyzer part; a condenser part; an optical time-delay part; an electromagnetic wave detector part; and a calculation part which Fourier-transforms time-resolved waveforms obtained by time-resolving electrical signals of s- and p-polarized electromagnetic waves reflected from a sample, and calculates amplitude and phase information of the s- and p-polarized electromagnetic waves.
    Type: Grant
    Filed: June 26, 2002
    Date of Patent: January 25, 2005
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Takeshi Nagashima, Masanori Hangyo, Kouichi Hiranaka
  • Publication number: 20030016358
    Abstract: A time domain polarization analyzing apparatus that is able to derive the complex optical constant spectrum in the terahertz region of a sample without necessitating any reference measurement will be proposed.
    Type: Application
    Filed: June 26, 2002
    Publication date: January 23, 2003
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventors: Takeshi Nagashima, Masanori Hangyo, Kouichi Hiranaka