Abstract: A secret sharing system and a storage medium where each of the n shareholders P1 to Pn holds a (n, n) share di (0≦i≦n), turns the share di into t(r+1) partial random numbers Sj of the (t, n) type, shares r+1 partial random numbers Sj to the respective shareholders P1 to Pn on the basis of a t-ary representation (value k at the tj-th digit, 0≦k≦t−1, 0≦j≦r) of the identification number z of each of the shareholders Pi, and puts together the shared partial random numbers for each digit tj in the t-ary representation to obtain r+1 shares dj,k. Then, the user unit U selects t shareholders TZ and transmits encrypted data C to the selected t shareholders TZ. The t shareholders Tz perform an operation on the encrypted data C on the basis of the share dj,k to obtain partial outputs XZ and return the partial outputs XZ to the user unit U. Then, the user unit U combines the t partial outputs XZ to obtain the result of decryption.

Abstract: A radiation sensitive composition comprising (A), a mixture of an isoindolinone pigment and a yellow organic pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.

Abstract: A radiation sensitive composition comprising (A) a colorant containing a quinacridone pigment, a mixture of an isoindolinone pigment and a yellow organic pigment or a mixture of copper phthalocyanine blue and a green pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.

Abstract: An alkaline developing solution for a radiation sensitive composition, which has no undissolved products even when the concentration of a pigment contained in a radiation sensitive composition is high, which does not cause such problems as scum, the residue after development and re-adhesion, and which can form pixels having a sharp pattern edge. The alkaline developing solution for a radiation sensitive composition is an aqueous solution which contains (A-1) at least one inorganic alkaline compound and (A-2) at least one organic alkaline compound selected from the group consisting of alkanolamines and alkylamines or which contains the above component (A-1), the above component (A-2) and (B) at least one nonionic surfactant selected from the group consisting of etherified polyoxyethylenes and etherified polyoxyethylene-polyoxypropylene block copolymers.

Abstract: A radiation sensitive composition comprising (A) a colorant containing a quinacridone pigment, a mixture of an isoindolinone pigment and a yellow organic pigment or a mixture of copper phthalocyanine blue and a green pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.

Abstract: A radiation sensitive composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The alkali-soluble resin (B) is a copolymer of (1) a monomer represented by the following formula (1): wherein R.sup.1 is a hydrogen atom or a methyl group, and(2) an ethylenically unsaturated monomer having at least one carboxyl group in the molecule, and optionally (3) a copolymerizable ethylenically unsaturated monomer other than the above monomers (1) and (2). The radiation sensitive composition is useful for producing a color filter for transmission-type or reflection-type color liquid crystal display devices, etc.

Abstract: It is an object of the present invention to provide an image display apparatus which is light and thin and is manufactured with reduced cost and which assures a clear image with no luminance unevenness over the entire screen. The image display apparatus includes: a string like hot cathode for emitting electrons; a perforated cover electrode for leading out and accelerating the electrons emitted from the cathode; a control electrode disposed substantially parallel with the cathode and having an electron-pass aperture permitting an electron beam to pass therethrough, the control electrode being adapted to control the electron beam; a luminous element which emits light when irradiated with the electron beam and is disposed on a curved surface; and a focusing electrode disposed between the control electrode and the luminous element, the focusing electrode being divided into focusing electrodes.

Abstract: A polyorganosiloxane-type thermoplastic resin having excellent slidability, abrasion resistance, weatherability, impact strength, fatigue resistance and chemical resistance is disclosed. The thermoplastic resin comprises a graft copolymer (IV) obtained by graft-polymerizing at least one vinyl monomer (v) onto a modified polyorganosiloxane obtained by polymerizing 80 to 99.8% by weight of an organosiloxane (I) having the structural unit described thereinabove, 0.1 to 10% by weight of at least one graft crosslinking agent (II) containing an alkoxysilyl group, selected from the group consisting of a vinyl-type graft crosslinking agent, a mercapto-type graft crosslinking agent, an acryloyl-type crosslinking agent and a vinylphenyl-type crosslinking agent, and 0.1 to 10% by weight of a compound (III) having two alkoxysilyl groups, provided that (I)+(II)+(III)=100% by weight.

Abstract: A photoelectric device comprises a substrate, a counter electrode, and a photoelectric element interposed therebetween in deposited state and comprising, in successively deposited state, a transparent electroconductive film, a CdS film, a CdTe film, and an As.sub.2 Se.sub.3 film. This device is produced by successively depositing the films while the substrate is maintained at respective specific temperatures, the CdS film and the CdTe film being respectively heat treated at respective specific temperatures and in specific atmospheres after deposition.