Abstract: A vehicle power supply system is provided for an electric vehicle. The vehicle power supply system has a first relay and a second relay, which are two-contact movable relays that connect/disconnect a high voltage circuit. The first relay has a first movable contact that is arranged to move with respect to a first fixed contact in a first direction when connecting/disconnecting. The second relay has a second movable contact is arranged to move with respect to a second fixed contact in a second direction when connecting/disconnecting. The second direction is opposite to the first direction. One of the first and second relays is oriented such that its movable contact separates from its fixed contact in a direction in which the greatest acceleration input is applied at the time of a collision.

Abstract: An electricity storage device including: plural electricity storage modules, each including an electricity storage module case, plural electricity storage cells housed in the electricity storage module case, and external terminals; an electricity storage case in which the plurality of electricity storage modules are arranged and housed; plural wire harnesses connected to the external terminals of the electricity storage modules; and a vibration damping material provided in a space region between one surface of the electricity storage case and, among the plurality of wire harnesses, at least a wire harness including the longest length extending in an arrangement direction of the electricity storage modules, wherein the wire harness including the longest length extending in the arrangement direction of the electricity storage modules is biased toward a side of the electricity storage module case by the one surface of the electricity storage case, through the vibration damping material.

Abstract: An electricity storage device including: plural electricity storage modules, each including an electricity storage module case, plural electricity storage cells housed in the electricity storage module case, and external terminals; an electricity storage case in which the plurality of electricity storage modules are arranged and housed; plural wire harnesses connected to the external terminals of the electricity storage modules; and a vibration damping material provided in a space region between one surface of the electricity storage case and, among the plurality of wire harnesses, at least a wire harness including the longest length extending in an arrangement direction of the electricity storage modules, wherein the wire harness including the longest length extending in the arrangement direction of the electricity storage modules is biased toward a side of the electricity storage module case by the one surface of the electricity storage case, through the vibration damping material.

Abstract: A beam current adjuster for an ion implanter includes a variable aperture device which is disposed at an ion beam focus point or a vicinity thereof. The variable aperture device is configured to adjust an ion beam width in a direction perpendicular to an ion beam focusing direction at the focus point in order to control an implanting beam current. The variable aperture device may be disposed immediately downstream of a mass analysis slit. The beam current adjuster may be provided with a high energy ion implanter including a high energy multistage linear acceleration unit.

Abstract: A vehicle power supply system is provided for an electric vehicle. The vehicle power supply system has a first relay and a second relay, which are two-contact movable relays that connect/disconnect a high voltage circuit. The first relay has a first movable contact that is arranged to move with respect to a first fixed contact in a first direction when connecting/disconnecting. The second relay has a second movable contact is arranged to move with respect to a second fixed contact in a second direction when connecting/disconnecting. The second direction is opposite to the first direction. One of the first and second relays is oriented such that its movable contact separates from its fixed contact in a direction in which the greatest acceleration input is applied at the time of a collision.

Abstract: A beam collimator includes a plurality of lens units that are arranged along a reference trajectory so that a beam collimated to the reference trajectory comes out from an exit of the beam collimator. Each of the plurality of lens units forms a bow-shaped curved gap and is formed such that an angle of a beam traveling direction with respect to the reference trajectory is changed by an electric field generated in the bow-shaped curved gap. A vacant space is provided between one lens unit of the plurality of lens units and a lens unit that is adjacent to the lens unit. The vacant space is directed in a transverse direction of the collimated beam in a cross section that is perpendicular to the reference trajectory. An inner field containing the reference trajectory is connected to an outer field of the plurality of lens units through the vacant space.

Abstract: A beam current adjuster for an ion implanter includes a variable aperture device which is disposed at an ion beam focus point or a vicinity thereof. The variable aperture device is configured to adjust an ion beam width in a direction perpendicular to an ion beam focusing direction at the focus point in order to control an implanting beam current. The variable aperture device may be disposed immediately downstream of a mass analysis slit. The beam current adjuster may be provided with a high energy ion implanter including a high energy multistage linear acceleration unit.

Abstract: A beam current adjuster for an ion implanter includes a variable aperture device which is disposed at an ion beam focus point or a vicinity thereof. The variable aperture device is configured to adjust an ion beam width in a direction perpendicular to an ion beam focusing direction at the focus point in order to control an implanting beam current. The variable aperture device may be disposed immediately downstream of a mass analysis slit. The beam current adjuster may be provided with a high energy ion implanter including a high energy multistage linear acceleration unit.

Abstract: A beam collimator includes a plurality of lens units that are arranged along a reference trajectory so that a beam collimated to the reference trajectory comes out from an exit of the beam collimator. Each of the plurality of lens units forms a bow-shaped curved gap and is formed such that an angle of a beam traveling direction with respect to the reference trajectory is changed by an electric field generated in the bow-shaped curved gap. A vacant space is provided between one lens unit of the plurality of lens units and a lens unit that is adjacent to the lens unit. The vacant space is directed in a transverse direction of the collimated beam in a cross section that is perpendicular to the reference trajectory. An inner field containing the reference trajectory is connected to an outer field of the plurality of lens units through the vacant space.

Abstract: A beam current adjuster for an ion implanter includes a variable aperture device which is disposed at an ion beam focus point or a vicinity thereof. The variable aperture device is configured to adjust an ion beam width in a direction perpendicular to an ion beam focusing direction at the focus point in order to control an implanting beam current. The variable aperture device may be disposed immediately downstream of a mass analysis slit. The beam current adjuster may be provided with a high energy ion implanter including a high energy multistage linear acceleration unit.

Abstract: A high-energy ion implanter includes a beam generation unit that includes an ion source and a mass analyzer, a high-energy multi-stage linear acceleration unit, a high-energy beam deflection unit that changes the direction of a high-energy ion beam toward a wafer, and a beam transportation unit that transports the deflected high-energy ion beam to the wafer. The beam transportation unit includes a beam shaper, a high-energy beam scanner, a high-energy beam collimator, and a high-energy final energy filter. Further, the high-energy beam collimator is an electric field type beam collimator that collimates a scan beam while performing the acceleration and the deceleration of a high-energy beam by an electric field.

Abstract: A high-energy ion implanter includes a beam generation unit that includes an ion source and a mass analyzer, a high-energy multi-stage linear acceleration unit, a high-energy beam deflection unit that changes the direction of a high-energy ion beam toward a wafer, and a beam transportation unit that transports the deflected high-energy ion beam to the wafer. The beam transportation unit includes a beam shaper, a high-energy beam scanner, a high-energy beam collimator, and a high-energy final energy filter. Further, the high-energy beam collimator is an electric field type beam collimator that collimates a scan beam while performing the acceleration and the deceleration of a high-energy beam by an electric field.

Abstract: A wafer attracting apparatus includes a substrate made of a ceramic material and adapted to attract and hold a wafer onto an attracting surface thereof, wherein the attracting surface is constituted by a ductile worked surface, the ductile worked surface has concave portions, a diameter of each of the concave portions is 0.1 &mgr;m or less, and when the wafer is attracted onto the attracting surface of the substrate and released therefrom, the number of particles attaching to that wafer is 9.3 or less per 1 cm2.

Abstract: A wafer attracting apparatus includes a substrate made of a ceramic material and adapted to attract and hold a wafer onto an attracting surface thereof, wherein the attracting surface is constituted by a ductile worked surface, the ductile worked surface has concave portions, a diameter of each of the concave portions is 0.1 .mu.m or less, and when the wafer is attracted onto the attracting surface of the substrate and released therefrom, the number of particles attaching to that wafer is 9.3 or less per 1 cm.sup.2.

Abstract: A microscopic grinding device grinds a workpiece at ultrahigh precision with the use of magnetic grinding fluid actuated microscopically in three dimensional directions by Z- and XY-axis actuators. The magnetic grinding fluid is magnetically supported between a grinding member and the workpiece by the magnetic field. Because magnetic field is generated to form a magnetic circuit within the device itself where no workpiece is necessary to form the magnetic circuit, the device can be used with equal results even with workpieces made from non-magnetic material. The pressure applied to the workpiece by the grinding member via the magnetic grinding fluid is detected by a load cell for feeding back a signal indicative of the detected pressure to the controller. The controller controls the actuators to actuate the grinding member such that the pressure applied from the grinding member, via the magnetic fluid, to the workpiece is maintained within a predetermined range.