Abstract: A memory access control circuit includes a first internal register, an address transmitting unit that sets a state of the first internal register to a first state to transmit a first address and sets a state of the first internal register to a second state to transmit a second address, a second internal register, a data receiving unit that sets a state of the second internal register to a third state to receive first data corresponding to the first address, performs data processing on the first data without delay, sets a state of the second internal register to a fourth state to receive second data corresponding to the second address, and performs data processing on the second data after delaying the second data by a given delay time, a first backup unit and a second backup unit.

Abstract: To provide a toner which has superior low-temperature fixing performance, high-temperature anti-offsetting properties and developing performance and may cause neither melt sticking of toner to photosensitive member nor turn-up of cleaning blade. The toner contains at least a binder resin, a colorant and a wax, and the wax is characterized by i) being an oxidized hydrocarbon wax, ii) having a hydroxyl value of from 5 mgKOH/g or more to 150 mgKOH/g or less, and iii) having, in molecular weight distribution measured by gel permeation chromatography of tetrahydrofuran-soluble matter, a main peak within the range of molecular weight of from 200 or more to 600 or less, and a component with a molecular weight of 700 or more in a content of 3% by mass or less.

Abstract: An object of the present invention is to provide a toner excellent in ability to prevent electrostatic offset and fixation tailing. Provided is a toner including toner particles each containing at least a binder resin, a wax, and a magnetic iron oxide, and inorganic fine particles, in which the magnetic iron oxide contains at least a Ti component, an Al component, an Si component, and an Fe component; and the each component has some particular characteristics.

Abstract: Hydrophobic inorganic fine particles are provided which: does not cause melt adhesion of toner to a photosensitive member and contamination of a contact charging member; imparts excellent flowability, charging performance and durability to toner even after the toner is stored in a high-temperature, high-humidity environment over a long time period; and does not cause dripping of toner and contamination with the toner. The hydrophobic inorganic fine particles are obtained by subjecting inorganic fine particles to surface treatment with silicone oil and then with a silane compound and/or a silazane compound, or by subjecting inorganic fine particles to surface treatment with a silane compound and/or a silazane compound in the presence of silicone oil, and further subjecting the inorganic fine particles thus surface-treated to surface treatment with silicone oil.

Abstract: A line plotting method for plotting lines whose coordinates are given on a display screen on which pixels are arranged according to a prescribed rule, the method includes correcting coordinates at the end point of a line on the basis of which the end point is a starting point or an ending point or whether the end point is inside a prescribed frame determining whether a direction from a starting point of a line after correction toward its ending point horizontally or vertically is the same as a direction from a starting point before correction of a line toward its ending point determining whether integer values of the coordinates of starting and ending points after correction are the same when directions from starting points after and before correction of a line toward their ending points are not matched.

Abstract: The positive-type radiation-sensitive resin composition for producing a metal-plating formed material relating to the present invention comprises (A) a polymer containing a structural unit having an acid-dissociative functional group, which is dissociated in the presence of an acid to generate an acidic functional group, and a crosslinking structure; (B) a radiation-sensitive acid generator; and (C) an organic solvent. The positive-type radiation-sensitive resin composition is excellent in sensitivity and resolution, exhibits excellent adhesion to a substrate, leaves no residue at an opening after development, and is capable of preventing occurrence of crack in the resin film after metal plating and push-in of plated metal into the resin film.

Abstract: To provide a toner which has superior low-temperature fixing performance, high-temperature anti-offsetting properties and developing performance and may cause neither melt sticking of toner to photosensitive member nor turn-up of cleaning blade. The toner contains at least a binder resin, a colorant and a wax, and the wax is characterized by i) being an oxidized hydrocarbon wax, ii) having a hydroxyl value of from 5 mgKOH/g or more to 150 mgKOH/g or less, and iii) having, in molecular weight distribution measured by gel permeation chromatography of tetrahydrofuran-soluble matter, a main peak within the range of molecular weight of from 200 or more to 600 or less, and a component with a molecular weight of 700 or more in a content of 3% by mass or less.

Abstract: The object of the present invention is to provide a magnetic toner enabling an image with high image density and excellent image reproducibility to be obtained, which is excellent in fluidity, charging stability, and charging uniformity, even for long-term use, and also enabling an image whose fogging, ghost, and scattering are suppressed to be obtained. The magnetic toner has at least a binder resin and a magnetic material, where, the magnetic material is an magnetic iron oxide whose dielectric breakdown voltage of the magnetic material is 160 to 1600 V/cm, and the dielectric loss tangent (tan ?) of the magnetic toner at 100 kHz and 40° C. is 2.0×10?3 to 1.0×10?2.

Abstract: It is an object of the present invention to provide a process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a negative radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and a transfer film using the composition. The above object is achieved by a negative radiation-sensitive resin composition comprising (A) a polymer containing structural units represented by the following formula (1) and/or the following formula (2), (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator, and by forming a negative radiation-sensitive resin film using the composition.

Abstract: Provided is a magnetic toner comprising magnetic toner particles each comprising at least a binder resin and a magnetic iron oxide, the magnetic toner being excellent in developability and environmental stability, and being capable of reducing a toner consumption. A saturation magnetization ?s and a remanent magnetization ?r of the magnetic toner in a measured magnetic field of 795.8 kA/m are arranged in the range of 5 to 60 Am2/kg and in the range of 0.1 to 10.0 Am2/kg, respectively, and the binder resin having a polyester component polymerized by using a Ti chelate compound as a catalyst is used.

Abstract: Provided is a magnetic toner comprising magnetic toner particles each comprising at least a binder resin and a magnetic iron oxide, the magnetic toner being excellent in developability and environmental stability, and being capable of reducing a toner consumption. A saturation magnetization ?s and a remanent magnetization ?r of the magnetic toner in a measured magnetic field of 795.8 kA/m are arranged in the range of 5 to 60 Am2/kg and in the range of 0.1 to 10.0 Am2/kg, respectively, and the binder resin having a polyester component polymerized by using a Ti chelate compound as a catalyst is used.

Abstract: A radiation-sensitive positive resin composition is excellent in sensitivity, resolution and adhesion to a substrate and is developed to form clear apertures without residues. The composition does not contaminate a plating solution and is capable of forming a resin film (resist) that is resistant to cracks after plating, resistant to indentation by platings, and resistant to lifting. A transfer film has the composition. A process of the invention produces thick platings as bumps or wirings with high precision. The radiation-sensitive positive resin composition for producing platings includes a polymer (A) that has at least one end terminated with —SR (wherein R is a linear or branched alkyl group of 1 to 20 carbon atoms, a cyclic alkyl group of 3 to 20 carbon atoms, or a derivative thereof) and includes a structural unit having an acid-dissociative functional group which is dissociated by an acid to yield an acidic functional group; a radiation-sensitive acid generator (B); and an organic solvent (C).

Abstract: It is an object of the present invention to provide a production process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a positive radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and a transfer film using the composition. The above object is achieved by a positive radiation-sensitive resin composition comprising (A) a polymer containing structural units represented by the following formula (1) and/or the following formula (2) and an acid-dissociable functional group (b), (B) a component which generates an acid by irradiation with radiation and (C) and organic solvent, and is achieved by producing a positive radiation-sensitive resin film using the composition.

Abstract: It is an object of the present invention to provide a process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a negative radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and a transfer film using the composition. The above object is achieved by a negative radiation-sensitive resin composition comprising (A) a polymer containing structural units represented by the following formula (1) and/or the following formula (2), (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator, and by forming a negative radiation-sensitive resin film using the composition.

Abstract: A method for producing an optically active compound comprising: a first step of culturing a microorganism capable of assimilating either the R-isomer or the S-isomer of a compound represented by Formula (1): wherein R is a methyl, ethyl, propyl, chloromethyl, or hydroxyethyl group, in a culture medium whose Ca2+ concentration at the beginning of culturing is controlled and which contains a racemic mixture of the compound as a carbon source; and a second step of recovering the optically active compound remaining in the culture broth.

Abstract: The present invention provides a method for obtaining optically active 3-chloro-2-methyl-1,2-propanediol, the method comprising: a first step of letting at least one kind of microorganism or processed product thereof having an ability to leave untouched (R)-3-chloro-2-methyl-1,2-propanediol or (S)-3-chloro-2-methyl-1,2-propanediol in the presence of an enantiomeric 3-chloro-2-methyl-1,2-propanediol mixture act on an enantiomeric 3-chloro-2-methyl-1,2-propanediol mixture; and a second step of recovering the untouched optically active 3-chloro-2-methyl-1,2-propanediol.

Abstract: The photosensitive resin film in an uncured state of the invention comprises (A) a specific alkali-soluble copolymer, (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator by the use of which a coating film having a dry film thickness of 70 ?m in an uncured state has a 365 nm radiation transmittance of not less than 10% and a 405 nm radiation transmittance of not less than 60%, contains the radiation-sensitive radical polymerization initiator (C) in an amount of 20 to 40 parts by weight based on 100 parts by weight of the component (A), and has a dry film thickness of not less than 50 ?m. According to the photosensitive resin film, a high bump having a height of not less than 50 ?m can be readily formed on a chip substrate with high precision though formation of such a high bump is difficult by the conventional technique. Moreover, connection failure of an element can be inhibited, and reliability of an element can be enhanced.

Abstract: The positive-type radiation-sensitive resin composition for producing a metal-plating formed material relating to the present invention comprises (A) a polymer containing a structural unit having an acid-dissociative functional group, which is dissociated in the presence of an acid to generate an acidic functional group, and a crosslinking structure; (B) a radiation-sensitive acid generator; and (C) an organic solvent. The positive-type radiation-sensitive resin composition is excellent in sensitivity and resolution, exhibits excellent adhesion to a substrate, leaves no residue at an opening after development, and is capable of preventing occurrence of crack in the resin film after metal plating and push-in of plated metal into the resin film.

Abstract: The photosensitive resin film in an uncured state of the invention comprises (A) a specific alkali-soluble copolymer, (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator by the use of which a coating film having a dry film thickness of 70 ?m in an uncured state has a 365 nm radiation transmittance of not less than 10% and a 405 nm radiation transmittance of not less than 60%, contains the radiation-sensitive radical polymerization initiator (C) in an amount of 20 to 40 parts by weight based on 100 parts by weight of the component (A), and has a dry film thickness of not less than 50 ?m. According to the photosensitive resin film, a high bump having a height of not less than 50 ?m can be readily formed on a chip substrate with high precision though formation of such a high bump is difficult by the conventional technique. Moreover, connection failure of an element can be inhibited, and reliability of an element can be enhanced.

Abstract: A method for producing an optically active compound comprising: a first step of culturing a microorganism capable of assimilating either the R-isomer or the S-isomer of a compound represented by Formula (1): wherein R is a methyl, ethyl, propyl, chloromethyl, or hydroxyethyl group, in a culture medium whose Ca2+ concentration at the beginning of culturing is controlled and which contains a racemic mixture of the compound as a carbon source; and a second step of recovering the optically active compound remaining in the culture broth.