Patents by Inventor Kuang-Ling Wei

Kuang-Ling Wei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9457450
    Abstract: A pad conditioning tool includes a sapphire chip having a side surface defining a polishing surface and a plurality of sapphire grains formed on the polishing surface in an integral manner. Each of the sapphire grains had a three-dimensional geometric structure. The sapphire grains are arranged on the polishing surface in a specific form so as to possess a specific pattern.
    Type: Grant
    Filed: February 21, 2014
    Date of Patent: October 4, 2016
    Assignee: TERA XTAL TECHNOLOGY CORPORATION
    Inventors: Jun-Wen Chung, Tzu-Hsuan Dai, Wen-Yen Shen, Kuang-Ling Wei, Chuan-Lang Lu
  • Publication number: 20150027063
    Abstract: A method for fabricating a pad conditioning tool includes the steps: preparing a sapphire substrate with a specific orientation plane, wherein the specific orientation plane is selected from a group consisting of a-plane, c-plane, r-plane, m-plane, n-plane and v-plane; utilizing screen printing technique and a screen plate in order to transfer an image pattern such that upon solidifying one side surface of the sapphire substrate is imprinted with the image pattern; and performing an etching process on the side surface of the sapphire substrate such that the side surface is formed with a plurality of micro particles of specific structures.
    Type: Application
    Filed: July 25, 2014
    Publication date: January 29, 2015
    Inventors: Chun-Han Tai, TZU-HSUAN DAI, Kuang-Ling Wei
  • Publication number: 20140256236
    Abstract: A pad conditioning tool includes a sapphire chip having a side surface defining a polishing surface and a plurality of sapphire grains formed on the polishing surface in an integral manner. Each of the sapphire grains had a three-dimensional geometric structure. The sapphire grains are arranged on the polishing surface in a specific form so as to possess a specific pattern.
    Type: Application
    Filed: February 21, 2014
    Publication date: September 11, 2014
    Applicant: TERA XTAL TECHNOLOGY CORPORATION
    Inventors: Jun-Wen Chung, TZU-HSUAN DAI, Wen-Yen Shen, Kuang-Ling Wei, Chuan-Lang Lu