Abstract: A new method is provided to treat contact holes after hole formation has been completed. A layer of non-conformal dielectric is deposited over the surface in which the contact hole has been formed thereby including the sidewalls and bottom of the contact hole. The non-conformal dielectric will be unevenly deposited on The sidewalls and bottom of the contact hole. This results in a relatively light deposition of non-conformal dielectric along the lower portions of the sidewalls and on the bottom of the contact hole with a heavier coating of non-conformal dielectric being deposited along the upper reaches of the contact hole. The objective of the invention is to prevent the enlargement of the hole diameter during subsequent processing steps. The non-conformal dielectric can be removed from the bottom using a wet etch.

Abstract: A gate structure is patterned on a substrate. An ion implantation is performed to form the LDD. Then, a thin liner layer is deposited on the feature of the substrate. A disposable spacer is successively formed attached on the side of the linear layer. The source and drain is next created in the substrate by ion implantation. The disposable spacer is then stripped by wet dip technique. A borderless layer is formed on the surface of the linear layer. A dielectric layer is formed on the gate structure and the dielectric layer can be composed of silicon dioxide, BPSG, SOG. Then, a photoresist is patterned on the dielectric layer to define the contact hole.