Abstract: The present application provides a displaying base plate and a displaying device, which relates to the technical field of displaying. The displaying device can ameliorate the problem of screen greening caused by electrostatic charges, thereby improving the effect of displaying. The displaying base plate includes an active area and a non-active area connected to the active area, the non-active area includes an edge region and a first-dam region, and the first-dam region is located between the active area and the edge region; the displaying base plate further includes: a substrate; an anti-static layer disposed on the substrate, wherein the anti-static layer is located at least within the edge region; and a driving unit and a touch unit that are disposed on the substrate, wherein the driving unit is located within the active area.

Abstract: The present disclosure provides a plasma reactor having a function of tuning low frequency RF power distribution, comprising: a reaction chamber in which an electrically conductive base is provided, the electrically conductive base being connected to a low frequency RF source via a first match, an electrostatic chuck being provided on the electrically conductive base, an upper surface of the electrostatic chuck being configured for fixing a to-be-processed substrate, an outer sidewall of the electrically conductive base being coated with at least one layer of plasma corrosion-resistance dielectric layer, a coupling ring made of a dielectric material surrounding an outer perimeter of the base, a focus ring being disposed above the coupling ring, the focus ring being arranged surround the electrostatic chuck and be exposed to a plasma during a plasma processing procedure; the plasma reactor further comprising an annular electrode that is disposed above the coupling ring but below the focus ring; a wire, a first

Abstract: A nursing bed comprises a bed frame, a bed platform which is disposed atop the bed frame for supporting a patient who is normally disposed in a supine position, and a pair of side rails mounted upon opposite sides of the bed platform so as to be movable between deployed or raised positions and stowed or lowered positions. The side rails are movable by a pair of linear actuators, which may be simultaneously actuated or independently actuated, and a pair of linkage systems operatively connecting the pair of side rails to opposite sides of the bed frame.

Abstract: A zero gap foldable powered bed comprises a bed frame and a sliding mechanism disposed upon said bed frame. The bed further comprises back, lumbar, seat, thigh, and leg decks operatively connected to the sliding mechanism, and the bed frame includes a head end frame member which is disposed within a vertically oriented plane. Linear actuators are operatively connected to the back and leg decks, and when the back deck is elevated or lowered, the sliding mechanism slides upon the bed frame so as to maintain the head end frame member, to which a headboard may be attached, within the vertically oriented plane such that a free end portion of the back deck will always be disposed immediately adjacent to the vertically oriented plane such that the back and shoulders of a person, lying or sitting upon the bed, will remain close to a nightstand, which may be disposed close to the bed, such that articles disposed upon the nightstand are always readily accessible.

Abstract: A recliner furniture piece wherein the pair of oppositely disposed side arm sections or frameworks of the furniture piece have their forward end portions extended forwardly beyond the location at which the footrest is disposed when the footrest is located at its fully retracted position, and wherein the pair of oppositely disposed side arm sections or frameworks of the furniture piece have their rearward end portions extended rearwardly beyond the location at which the backrest is attached to the underlying actuator and linkage system. In this manner, the moment arms of the furniture piece are effectively increased while the moment arms of the fully extended footrest and fully reclined backrest are reduced such that the recliner furniture piece can withstand, accommodate, or tolerate increased weights or loads impressed upon the fully extended footrest and/or the fully reclined backrest.

Abstract: A zero gap foldable powered bed comprises a bed frame and a sliding mechanism disposed upon said bed frame. The bed further comprises back, lumbar, seat, thigh, and leg decks operatively connected to the sliding mechanism, and the bed frame includes a head end frame member which is disposed within a vertically oriented plane. Linear actuators are operatively connected to the back and leg decks, and when the back deck is elevated or lowered, the sliding mechanism slides upon the bed frame so as to maintain the head end frame member, to which a headboard may be attached, within the vertically oriented plane such that a free end portion of the back deck will always be disposed immediately adjacent to the vertically oriented plane such that the back and shoulders of a person, lying or sitting upon the bed, will remain close to a nightstand, which may be disposed close to the bed, such that articles disposed upon the nightstand are always readily accessible.

Abstract: Disclosed are a plasma reactor and a heating apparatus therefor, wherein the heating apparatus comprises: a programmable power supply, a heater assembly, and a bandpass filter assembly, the heater assembly being configured for connecting with the programmable power supply via the bandpass filter assembly, the bandpass filter assembly including a plurality of bandpass filters, wherein the programmable power supply may input, based on match relationships between outputted AC heating powers and conduction frequencies of the bandpass filters BPF, an AC heating power to a matched heater unit to perform heating, thereby achieving zoned temperature control; the disclosures offer a simple circuit structure due to eliminating the need of switch elements, thereby offering a simple control manner.

Abstract: Disclosed are a plasma reactor and a heating apparatus therefor, wherein the heating apparatus comprises: a programmable power supply, a heater assembly, and a bandpass filter assembly, the heater assembly being configured for connecting with the programmable power supply via the bandpass filter assembly, the bandpass filter assembly including a plurality of bandpass filters, wherein the programmable power supply may input, based on match relationships between outputted AC heating powers and conduction frequencies of the bandpass filters BPF, an AC heating power to a matched heater unit to perform heating, thereby achieving zoned temperature control; the disclosures offer a simple circuit structure due to eliminating the need of switch elements, thereby offering a simple control manner.

Abstract: Disclosed are a temperature control apparatus for semiconductor processing equipment and a corresponding temperature control method, wherein each heating element in each row or each column in a heating element matrix forms a power return circuit with a same power source, respectively, and a same switch module is provided for the power return circuits of all heating elements in each column or each row of the heating element matrix; the input powers to the heating elements in an entire row or column controlled by each power output port of the power source are adjusted by adjusting the output power magnitude of the corresponding power source, and conduction/disconnection of the power return circuits of an entire column or row controlled by each switch module is controlled by controlling ON/OFF of each switch module.

Abstract: A switchable matching network and an inductively coupled plasma processing apparatus having such network are disclosed. The switchable matching network enables selection between two bias power frequencies. The network is particularly suitable for an inductively-coupled plasma processing apparatus. The switchable matching network comprises: a first match circuit having a first input port connected to a first signal source and a first output port coupled to a load; a second match circuit having a second input port connected to a second signal source and a second output port coupled to the load; a switching device having a first connection port, a second connection port and a third connection port, the first connection port connected to the first input port and the second connection port connected to the second output port; a variable capacitor connected between ground and the third connection port of the switching device.

Abstract: A switchable matching network and an inductively coupled plasma processing apparatus having such network are disclosed. The switchable matching network enables selection between two bias power frequencies. The network is particularly suitable for an inductively-coupled plasma processing apparatus. The switchable matching network comprises: a first match circuit having a first input port connected to a first signal source and a first output port coupled to a load; a second match circuit having a second input port connected to a second signal source and a second output port coupled to the load; a switching device having a first connection port, a second connection port and a third connection port, the first connection port connected to the first input port and the second connection port connected to the second output port; a variable capacitor connected between ground and the third connection port of the switching device.

Abstract: The present disclosure provides a plasma reactor having a function of tuning low frequency RF power distribution, comprising: a reaction chamber in which an electrically conductive base is provided, the electrically conductive base being connected to a low frequency RF source via a first match, an electrostatic chuck being provided on the electrically conductive base, an upper surface of the electrostatic chuck being configured for fixing a to-be-processed substrate, an outer sidewall of the electrically conductive base being coated with at least one layer of plasma corrosion-resistance dielectric layer, a coupling ring made of a dielectric material surrounding an outer perimeter of the base, a focus ring being disposed above the coupling ring, the focus ring being arranged surround the electrostatic chuck and be exposed to a plasma during a plasma processing procedure; the plasma reactor further comprising an annular electrode that is disposed above the coupling ring but below the focus ring; a wire, a first

Abstract: The present disclosure provides a plasma reactor having a function of tuning low frequency RF power distribution, comprising: a reaction chamber in which an electrically conductive base is provided, the electrically conductive base being connected to a low frequency RF source via a first match, an electrostatic chuck being provided on the electrically conductive base, an upper surface of the electrostatic chuck being configured for fixing a to-be-processed substrate, an outer sidewall of the electrically conductive base being coated with at least one layer of plasma corrosion-resistance dielectric layer, a coupling ring made of a dielectric material surrounding an outer perimeter of the base, a focus ring being disposed above the coupling ring, the focus ring being arranged surround the electrostatic chuck and be exposed to a plasma during a plasma processing procedure; the plasma reactor further comprising an annular electrode that is disposed above the coupling ring but below the focus ring; a wire, a first