Abstract: A method for manufacturing a semiconductor structure includes preparing a semiconductor substrate which includes a memory cell region and a peripheral circuit region; forming a buried word line in the semiconductor substrate in the memory cell region; forming a bit line structure over the semiconductor substrate in the memory cell region; forming a dielectric layer in the peripheral circuit region and the memory cell region; forming a first opening in the dielectric layer in the memory cell region; filling a silicon filler in the first opening; forming a second opening in the dielectric layer in the peripheral circuit region; forming a sidewall spacer over a sidewall of the second opening; recessing the silicon filler to form a silicon plug, wherein the silicon plug fills a lower portion of the first opening; and forming a first metal silicide over a top surface of the silicon plug, and concurrently forming a second metal silicide in a lower portion of the second opening.

Abstract: A method for manufacturing a semiconductor structure includes preparing a semiconductor substrate which includes a memory cell region and a peripheral circuit region; forming a buried word line in the semiconductor substrate in the memory cell region; forming a bit line structure over the semiconductor substrate in the memory cell region; forming a dielectric layer in the peripheral circuit region and the memory cell region; forming a first opening in the dielectric layer in the memory cell region; filling a silicon filler in the first opening; forming a second opening in the dielectric layer in the peripheral circuit region; forming a sidewall spacer over a sidewall of the second opening; recessing the silicon filler to form a silicon plug, wherein the silicon plug fills a lower portion of the first opening; and forming a first metal silicide over a top surface of the silicon plug, and concurrently forming a second metal silicide in a lower portion of the second opening.

Abstract: The present invention provides an automated analyzing apparatus which comprises: a syringe unit for inhaling or transfering liquid such as sample, reagents and washing solution by moving the piston (12) by a certain distance; a built-in stirring bar (31) located within the syringe barrel (11); a driving unit for rotating the stirring bar (31); a driving means (13) for moving the piston (12) up and down; several connection paths (15a-15f) located in the lower part of the syringe barrel (11) or in the piston (12) where the sample, the reagents, the washing solution, and air can be provided or discharged; 2-way on/off valves (16a-16f) connected to each connection path (15a-15f); detecting means (3) positioned in the outer wall of the syringe barrel (11) perpendicular to the piston shaft (14); additional heating and cooling unit (4) for temperature control or sample digestion; control unit (6) for controlling the driving means (13), the detector (2) and valves (16a-16f) described above.