Patents by Inventor Kunihiko Fujimoto

Kunihiko Fujimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240079345
    Abstract: A conductive member includes an adhesive layer and a metal foil layer. The adhesive layer consists of an adhesive composition containing conductive particles. The metal foil layer is disposed on the adhesive layer. The conductive member can be used to form, for example, a predetermined metal film.
    Type: Application
    Filed: January 18, 2022
    Publication date: March 7, 2024
    Inventors: Masashi OHKOSHI, Nozomu TAKANO, Daisuke FUJIMOTO, Hiroyuki IZAWA, Tomohiko KOTAKE, Kunihiko AKAI, Yuka ITOH, Shunsuke TAKAGI
  • Patent number: 11597827
    Abstract: To provide a resin composition, a pellet, a composite molded article, a method for manufacturing a composite molded article and a tank, all capable of enabling tight joining and integration of the polyacetal resin molded article and the polyethylene resin molded article, and of suppressing formaldehyde emission and occurrence of mold deposit. The resin composition contains a resin ingredient and melamine, the resin ingredient containing a polyacetal resin and a maleic anhydride-modified polyethylene resin, the polyacetal resin and the maleic anhydride-modified polyethylene resin following a mass proportion of (20 to 49):(80 to 51), and molar concentration of the maleic anhydride group capable of reacting with amino group of melamine contained in the resin composition being 5 to 25 ?mol/g.
    Type: Grant
    Filed: August 28, 2019
    Date of Patent: March 7, 2023
    Assignees: MITSUBISHI ENGINEERING-PLASTICS CORPORATION, JAPAN POLYETHYLENE CORPORATION
    Inventors: Kunihiko Fujimoto, Kei Takahashi, Ritsuya Matsumoto
  • Patent number: 11384237
    Abstract: To provide a polyacetal resin composition which is good sliding characteristics and is less likely to produce the blister; a molded article; and a method for manufacturing the polyacetal resin composition. The polyacetal resin composition containing: (A) 100 parts by mass of a polyacetal resin; (B1) a polyolefin resin grafted with a silicone compound; (B2) a non-grafted silicone compound; and (C) 0.5 to 1.8 parts by mass of a polyolefinic lubricant, with a total of content of the silicone compound in the (B1) polyolefin resin and content of the (B2) non-grafted silicone compound, being adjusted to 0.6 to 2.5 parts by mass, per 100 parts by mass of the (A) polyacetal resin, and with (B1)/(B2), which is a ratio by mass of the content of the (B1) polyolefin resin and the content of the (B2) non-grafted silicone compound, being adjusted to 68/32 to 45/55.
    Type: Grant
    Filed: June 5, 2018
    Date of Patent: July 12, 2022
    Assignee: MITSUBISHI ENGINEERING-PLASTICS CORPORATION
    Inventors: Kunihiko Fujimoto, Makiko Ooshima
  • Publication number: 20210198466
    Abstract: To provide a resin composition, a pellet, a composite molded article, a method for manufacturing a composite molded article and a tank, all capable of enabling tight joining and integration of the polyacetal resin molded article and the polyethylene resin molded article, and of suppressing formaldehyde emission and occurrence of mold deposit. The resin composition contains a resin ingredient and melamine, the resin ingredient containing a polyacetal resin and a maleic anhydride-modified polyethylene resin, the polyacetal resin and the maleic anhydride-modified polyethylene resin following a mass proportion of (20 to 49):(80 to 51), and molar concentration of the maleic anhydride group capable of reacting with amino group of melamine contained in the resin composition being 5 to 25 ?mol/g.
    Type: Application
    Filed: August 28, 2019
    Publication date: July 1, 2021
    Applicants: MITSUBISHI ENGINEERING-PLASTICS CORPORATION, JAPAN POLYETHYLENE CORPORATION
    Inventors: Kunihiko FUJIMOTO, Kei TAKAHASHI, Ritsuya MATSUMOTO
  • Patent number: 10668494
    Abstract: A substrate processing apparatus according to the present disclosure includes a holding unit, a nozzle, a driving unit, and a controller. The holding unit holds a substrate. The nozzle supplies a processing liquid to the substrate held on the holding unit. The driving unit moves the nozzle. The controller controls the driving unit, so as to move the nozzle while supplying the processing liquid to the substrate from the nozzle. Further, the controller controls the driving unit based on recipe information including step information including positions of first and second points above the substrate, total time for moving the nozzle between the first and second points, and a moving speed of the nozzle, so as to cause reciprocation of the nozzle.
    Type: Grant
    Filed: September 20, 2017
    Date of Patent: June 2, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Go Ayabe, Minoru Tashiro, Kunihiko Fujimoto
  • Publication number: 20200115542
    Abstract: To provide a polyacetal resin composition which is good sliding characteristics and is less likely to produce the blister; a molded article; and a method for manufacturing the polyacetal resin composition. The polyacetal resin composition containing: (A) 100 parts by mass of a polyacetal resin; (B1) a polyolefin resin grafted with a silicone compound; (B2) a non-grafted silicone compound; and (C) 0.5 to 1.8 parts by mass of a polyolefinic lubricant, with a total of content of the silicone compound in the (B1) polyolefin resin and content of the (B2) non-grafted silicone compound, being adjusted to 0.6 to 2.5 parts by mass, per 100 parts by mass of the (A) polyacetal resin, and with (B1)/(B2), which is a ratio by mass of the content of the (B1) polyolefin resin and the content of the (B2) non-grafted silicone compound, being adjusted to 68/32 to 45/55.
    Type: Application
    Filed: June 5, 2018
    Publication date: April 16, 2020
    Applicant: MITSUBISHI ENGINEERING-PLASTICS CORPORATION
    Inventors: Kunihiko FUJIMOTO, Makiko OOSHIMA
  • Patent number: 10254816
    Abstract: A control unit of a substrate processing apparatus has a storage medium that stores operation commands as a single macro. The operation commands include an operation command for shutdown of the substrate processing apparatus by which the substrate processing apparatus is automatically transferred from a normally-operating condition to a condition suitable for man power maintenance, and an operation command for startup of the substrate processing apparatus by which the substrate processing apparatus is automatically transferred to a condition suitable for normal operation after completion of the man power maintenance. The control unit makes a display unit display both the operation commands for shutdown and startup together on a single ejection screen of the display unit, and allows editing of the macro on the single edit screen by using the input unit.
    Type: Grant
    Filed: January 30, 2015
    Date of Patent: April 9, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Seiichiro Yuasa, Kunihiko Fujimoto
  • Patent number: 10131781
    Abstract: The invention is a polyacetal resin composition containing a polyacetal resin (A) and a polyethylene resin (B), in which the blending proportion of the polyacetal resin (A) occupying in the total mass of the polyacetal resin (A) and the polyethylene resin (B) is 10 to 90 mass %, the melt flow rate of the polyacetal resin (A) measured at a condition of 190° C. and 2.16 kg load is 30 g/10 minutes or less, and the polyethylene resin (B) consists of a modified polyethylene resin and the modification rate is 0.01 mass % or more based on 100 mass % of the total mass of the polyethylene resin and the melt flow rate of the polyethylene resin (B) measured at a condition of 190° C. and 2.16 kg load is 2.5 g/10 minutes or less.
    Type: Grant
    Filed: August 1, 2013
    Date of Patent: November 20, 2018
    Assignees: MITSUBISHI ENGINEERING-PLASTICS CORPORATION, JAPAN POLYETHYLENE CORPORATION
    Inventors: Ryusuke Yamada, Masayuki Nagai, Satoshi Nagai, Kunihiko Fujimoto, Kei Takahashi
  • Publication number: 20180085769
    Abstract: A substrate processing apparatus according to the present disclosure includes a holding unit, a nozzle, a driving unit, and a controller. The holding unit holds a substrate. The nozzle supplies a processing liquid to the substrate held on the holding unit. The driving unit moves the nozzle. The controller controls the driving unit, so as to move the nozzle while supplying the processing liquid to the substrate from the nozzle. Further, the controller controls the driving unit based on recipe information including step information including positions of first and second points above the substrate, total time for moving the nozzle between the first and second points, and a moving speed of the nozzle, so as to cause reciprocation of the nozzle.
    Type: Application
    Filed: September 20, 2017
    Publication date: March 29, 2018
    Inventors: Go Ayabe, Minoru Tashiro, Kunihiko Fujimoto
  • Patent number: 9850367
    Abstract: Provided is a polyacetal resin composition in which at least one dihydrazone compound (B) selected from the group of two kinds of dihydrazone compounds is blended in 0.02 to 5 parts by mass with respect to 100 parts by mass of a polyacetal resin (A).
    Type: Grant
    Filed: January 27, 2015
    Date of Patent: December 26, 2017
    Assignee: MITSUBISHI ENGINEERING-PLASTICS CORPORATION
    Inventors: Makiko Oshima, Kunihiko Fujimoto, Masayuki Nagai, Hidetoshi Nawata, Koki Sato, Ryusuke Tamaki
  • Publication number: 20160333170
    Abstract: Provided is a polyacetal resin composition in which at least one dihydrazone compound (B) selected from the group of two kinds of dihydrazone compounds is blended in 0.02 to 5 parts by mass with respect to 100 parts by mass of a polyacetal resin (A).
    Type: Application
    Filed: January 27, 2015
    Publication date: November 17, 2016
    Applicant: MITSUBISHI ENGINEERING-PLASTICS CORPORATION
    Inventors: Makiko OSHIMA, Kunihiko FUJIMOTO, Masayuki NAGAI, Hidetoshi NAWATA, Koki SATO, Ryusuke TAMAKI
  • Publication number: 20150220136
    Abstract: A control unit of a substrate processing apparatus has a storage medium that stores operation commands as a single macro. The operation commands include an operation command for shutdown of the substrate processing apparatus by which the substrate processing apparatus is automatically transferred from a normally-operating condition to a condition suitable for man power maintenance, and an operation command for startup of the substrate processing apparatus by which the substrate processing apparatus is automatically transferred to a condition suitable for normal operation after completion of the man power maintenance. The control unit makes a display unit display both the operation commands for shutdown and startup together on a single ejection screen of the display unit, and allows editing of the macro on the single edit screen by using the input unit.
    Type: Application
    Filed: January 30, 2015
    Publication date: August 6, 2015
    Inventors: Seiichiro YUASA, Kunihiko FUJIMOTO
  • Publication number: 20150183982
    Abstract: The invention is a polyacetal resin composition containing a polyacetal resin (A) and a polyethylene resin (B), in which the blending proportion of the polyacetal resin (A) occupying in the total mass of the polyacetal resin (A) and the polyethylene resin (B) is 10 to 90 mass %, the melt flow rate of the polyacetal resin (A) measured at a condition of 190° C. and 2.16 kg load is 30 g/10 minutes or less, and the polyethylene resin (B) consists of a modified polyethylene resin and the modification rate is 0.01 mass % or more based on 100 mass % of the total mass of the polyethylene resin and the melt flow rate of the polyethylene resin (B) measured at a condition of 190° C. and 2.16 kg load is 2.5 g/10 minutes or less.
    Type: Application
    Filed: August 1, 2013
    Publication date: July 2, 2015
    Applicants: JAPAN POLYETHYLENE CORPORATION, MITSUBISHI ENGINEERING-PLASTICS CORPORATION
    Inventors: Ryusuke Yamada, Masayuki Nagai, Satoshi Nagai, Kunihiko Fujimoto, Kei Takahashi
  • Patent number: 8846788
    Abstract: A polyacetal resin composition containing 100 parts by weight of a polyacetal resin, 0.01 to 5 parts by weight of a colorant selected from inorganic and organic pigments, 0.01 to 3 parts by weight of a polyamide resin having a melting point or softening point of 180° C. or less, or a polyetheresteramide resin, 0.01 to 1 part by weight of an aromatic dihydrazide compound or an aliphatic dihydrazide compound having a solubility of less than 1 g relative to 100 g of water at 20° C., and 0.01 to 1 part by weight of a sterically hindered phenolic compound, or a combination of a hindered amine-based light stabilizer and an ultraviolet absorber, exhibits an excellent thermal stability and is capable of suppressing formaldehyde generation and mechanical strength deterioration.
    Type: Grant
    Filed: September 3, 2009
    Date of Patent: September 30, 2014
    Assignee: Mitsubishi Engineering-Plastics Corporation
    Inventors: Masayuki Nagai, Kunihiko Fujimoto
  • Publication number: 20110230602
    Abstract: A polyacetal resin composition containing 100 parts by weight of a polyacetal resin, 0.01 to 5 parts by weight of a colorant selected from inorganic and organic pigments, 0.01 to 3 parts by weight of a polyamide resin having a melting point or softening point of 180° C. or less, or a polyetheresteramide resin, 0.01 to 1 part by weight of an aromatic dihydrazide compound or an aliphatic dihydrazide compound having a solubility of less than 1 g relative to 100 g of water at 20° C., and 0.01 to 1 part by weight of a sterically hindered phenolic compound, or a combination of a hindered amine-based light stabilizer and an ultraviolet absorber, exhibits an excellent thermal stability and is capable of suppressing formaldehyde generation and mechanical strength deterioration.
    Type: Application
    Filed: September 3, 2009
    Publication date: September 22, 2011
    Applicant: MITSUBISHI ENGINEERING-PLASTICS CORPORATION
    Inventors: Masayuki Nagai, Kunihiko Fujimoto