Abstract: Disclosed is a coating material for forming a gas barrier. The coating material includes a polyalcohol polymer, a polycarboxylic acid polymer, and a divalent or higher-valent metal compound whose surface is coated with a poorly water-soluble component, or alternatively a monovalent metal compound whose surface is coated with a poorly water-soluble component and a divalent or higher-valent metal compound whose surface is coated with a poorly water-soluble component. By applying this coating material to a plastic substrate layer, a gas-barrier multilayer body having a gas-barrier layer formed thereon is obtained.

Abstract: A gas barrier laminate comprising: a plastic substrate (I); a gas barrier layer (II) formed from a gas barrier layer-forming coating material (C) containing a polyalcohol-based polymer (A) and a polycarboxylic acid-based polymer (B); an overcoat layer (III) formed from an overcoat layer-forming coating material (F) containing at least one of a monovalent metal compound (D) and a bivalent or higher metal compound (E); and a top coat layer (IV) formed from a top coat layer-forming coating material (G); wherein the gas barrier layer (II) is laminated to the plastic substrate (I), either directly or with an anchor coat layer disposed therebetween, the overcoat layer (III) is laminated on top of the gas barrier layer (II), and the top coat layer (IV) is formed on top of the overcoat layer (III).

Abstract: Disclosed is a coating material for forming a gas barrier. The coating material includes a polyalcohol polymer, a polycarboxylic acid polymer, and a divalent or higher-valent metal compound whose surface is coated with a poorly water-soluble component, or alternatively a monovalent metal compound whose surface is coated with a poorly water-soluble component and a divalent or higher-valent metal compound whose surface is coated with a poorly water-soluble component. By applying this coating material to a plastic substrate layer, a gas-barrier multilayer body having a gas-barrier layer formed thereon is obtained.

Abstract: A gas barrier laminate comprising: a plastic substrate (I); a gas barrier layer (II) formed from a gas barrier layer-forming coating material (C) containing a polyalcohol-based polymer (A) and a polycarboxylic acid-based polymer (B); and a resin layer (III) formed from a resin coating material (F) containing either a monovalent metal compound (D), or a monovalent metal compound (D) and a bivalent or higher metal compound (E); wherein the gas barrier layer (II) is laminated to the plastic substrate (I), either directly or with an anchor coat layer disposed therebetween, and the resin layer (III) is laminated on top of the gas barrier layer (II).

Abstract: A gas barrier laminate comprising: a plastic substrate (I); a gas barrier layer (II) formed from a gas barrier layer-forming coating material (C) containing a polyalcohol-based polymer (A) and a polycarboxylic acid-based polymer (B); an overcoat layer (III) formed from an overcoat layer-forming coating material (F) containing at least one of a monovalent metal compound (D) and a bivalent or higher metal compound (E); and a top coat layer (IV) formed from a top coat layer-forming coating material (G); wherein the gas barrier layer (II) is laminated to the plastic substrate (I), either directly or with an anchor coat layer disposed therebetween, the overcoat layer (III) is laminated on top of the gas barrier layer (II), and the top coat layer (IV) is formed on top of the overcoat layer (III).

Abstract: A gas barrier laminate comprising: a plastic substrate (I); a gas barrier layer (II) formed from a gas barrier layer-forming coating material (C) containing a polyalcohol-based polymer (A) and a polycarboxylic acid-based polymer (B); and an overcoat layer (III) formed from an overcoat layer-forming coating material (F) containing at least one of a monovalent metal compound (D) and a bivalent or higher metal compound (E); wherein the gas barrier layer (II) is laminated to the plastic substrate (I), either directly or with an anchor coat layer disposed therebetween, the overcoat layer (III) is laminated on top of the gas barrier layer (II), and when a laminated product is prepared by laminating a laminate adhesive layer (IV) and a heat seal layer (V), in that order, to either the overcoat layer (III) or the plastic substrate (I) of the gas barrier laminate, either directly or with a printing ink layer disposed therebetween, the lamination strength (X) of the laminated product is not less than 1 N/cm, and the

Abstract: An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn irradiation chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn irradiation chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, a target holding mechanism; an inner irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to drive the turn-transfer mechanism; and an elevator mechanism configured to move the turn-transfer mechanism, which supports the inner irradiation target holding table, up and down.

Abstract: An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn-transfer chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn-transfer chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism; an inner irradiation target holding table, configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to turn the turn-transfer mechanism and an elevator mechanism configured to move the turn-transfer mechanism up and down; and a rotation mechanism disposed at the electron beam irradiation section and configured to rotate the target.

Abstract: An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn-transfer chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn-transfer chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism; an inner irradiation target holding table, configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to turn the turn-transfer mechanism and an elevator mechanism configured to move the turn-transfer mechanism up and down; and a rotation mechanism disposed at the electron beam irradiation section and configured to rotate the target.

Abstract: An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn irradiation chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn irradiation chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, a target holding mechanism; an inner irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to drive the turn-transfer mechanism; and an elevator mechanism configured to move the turn-transfer mechanism, which supports the inner irradiation target holding table, up and down.

Abstract: A target object to be irradiated is transported into an irradiating chamber through a transport inlet for irradiation with an active energy beam under an inert gas atmosphere in an active energy beam irradiating section included in the irradiating chamber and, then is transported out of the irradiating chamber. When the object is subject to above steps, the gas flow resistance at the transport outlet is controlled such that the active energy beam irradiation is carried out under the condition of X/Y≧1, where X represents the gas amount passing through the transport inlet, and Y represents the gas amount passing through the transport outlet.

Abstract: A target object to be irradiated is transported into an irradiating chamber through a transport inlet for irradiation with an active energy beam under an inert gas atmosphere in an active energy beam irradiating section included in the irradiating chamber and, then is transported out of the irradiating chamber. When the object is subject to above steps, the gas flow resistance at the transport outlet is controlled such that the active energy beam irradiation is carried out under the condition of X/Y≧1, where X represents the gas amount passing through the transport inlet, and Y represents the gas amount passing through the transport outlet.

Abstract: Disclosed are 13.alpha.-(3-substituted-2-hydroxypropionyloxy)baccatin compounds represented by the formula: ##STR1## wherein R.sup.1 represents a lower alkanoyl group or a protective group for hydroxy group; R.sup.2 represents a protective group for hydroxy group; R.sup.3 represents a lower alkanoyl group; R.sup.4 represents a substituted or unsubstituted benzoyl group; X represents a substituted or unsubstituted aryl group, a substituted or unsubstituted lower alkenyl group, or a substituted or unsubstituted lower alkynyl group; and A' represents a halogen atom, azido group or amino group,and processes for preparing the same.

Abstract: A paper container for fluid substances. It comprises: a tapered trunk portion formed by rolling a sheet comprising a layer having a barrier ability applied onto a surface of cardboard, in a state in which the layer is disposed inside, and by joining longitudinal-directional ends of the sheet with each other; and a bottom member formed from a disk-shaped sheet comprising a layer having barrier ability applied onto a surface of cardboard, a lower end portion of the trunk portion and a peripheral portion of the bottom portion member being engaged and jointed with each other in such a manner that the respective layers face each other. A first end portion for forming a joint portion of the trunk portion has an extending film which surrounds an end surface of the cardboard and reaches an external surface of the cardboard.

Abstract: An ellipticine derivative of the formula [I]: ##STR1## wherein R is a substituted lower alkyl group, a substituted or unsubstituted lower alkoxy group or a heteromonocyclic group, or a pharmaceutically acceptable salt thereof, which show excellent antitumor activity, less side effects, less toxicity and/or high solubility in water and are useful as antitumor agent, and a process for preparing the same.

Abstract: An ellipticine derivative of the formula [I]: ##STR1## wherein R is a substituted lower alkyl group, a substituted or unsubstituted lower alkoxy group or a heteromonocyclic group,or a pharmaceutically acceptable salt thereof, which show excellent antitumor activity, less side effects, less toxicity and/or high solubility in water and are useful as antitumor agent, and a process for preparing the same.

Abstract: A process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a traveling flexible plastic film. The process comprises evaporating a deposition material composed mainly of silicon and silicon oxide or silicon oxide alonem by heating to continuously form a deposition layer composed mainly of silicon oxide and having a thickness of from 100 to 3,000 .ANG. on the surface(s) of a travelling flexible plastic film, wherein a material shaped from the above deposition material is evaporated by heating while the material is supplied to a heat evaporating portion substantially continuously, and an evaporation residue is discharged from the heat evaporating portion substantially continuously.

Abstract: An apparatus for use in a process for the substantially continuous manufacture of a silicon oxide deposition film by evaporating a deposition material composed mainly of a combination of silicon and silicon oxide or silicon oxide alone by heating the material to continuously form a deposition layer composed mainly of silicon oxide and having a thickness of from 100 to 3,000 .ANG. on the surface of a travelling flexible plastic film.