Abstract: By adding a compound represented by the following general formulas: ##STR1## to a conventional photoresist composition comprising a cyclized product of conjugated diene homopolymer or copolymer and a photo-crosslinking agent soluble in an organic solvent, an image having a high degree of resolution can be obtained even when a base board having a surface of a high reflectance is used, with a high reproducibility and without being affected by prebaking conditions.

Abstract: A photosensitive resin composition comprising a 1,2-quanonediazide compound and a copolymer consisting essentially of (A) a conjugated diolefinic compound, (B) a monoolefinically unsaturated compound and (C) an .alpha.,.beta.-ethylenically unsaturated carboxylic acid. Said composition can provide a positive type resist which is difficult to break and excellent in adhesion to a substrate.

Abstract: The present invention is a binder for a polydiene composite propellant comprising a small amount of binder and has as its object the production of the binder, which can provide stable physical properties between production lots and has a long pot life, and consists mainly of a polymer which has a predetermined molecular weight between crosslinks and which is obtained by reacting a combination of a polydiene glycol having a hydroxyl group number of 1.8-2.1 and a number average molecular weight of 1,000-5,000, a trifunctional crosslinking agent, a diisocyanate and a bifunctional chain extender. When a diene polymer having a functional group number of not more than 1 is additionally added to the above described combination, the elongation of the binder is improved and the use of a plasticizer can be reduced or eliminated.

Abstract: In the process for preparing polyether glycol comprising (A) polymerizing tetrahydrofuran or a mixture of tetrahydrofuran and other copolymerizable cyclic ether(s) in the presence of a ring-opening polymerization catalyst comprising fuming sulfuric acid and/or fluorosulfuric acid as principal component, (B) adding water or an aqueous alkali solution to the polymerization product, and heating said reaction product under the strongly acidic condition to hydrolyze the same and (C) washing the hydrolysis product comprising polytetramethylene glycol and polyether glycol having oxytetramethylene groups as principal constituent, the polymerization of the tetrahydrofuran or the mixture of tetrahydrofuran and other copolymerizable cyclic ether(s) in the (A) step is carried out by (1) contacting the same with a ring-opening polymerization catalyst at a temperature within the range of -30.degree. C. to 10.degree. C.

Abstract: By adding a compound represented by the following general formulas: ##STR1## to a conventional photoresist composition comprising a cyclized product of conjugated diene polymer or copolymer and a photo-crosslinking agent soluble in an organic solvent, an image having a high degree of resolution and only a small number of pinholes can be obtained even when a base board having a surface of a high reflectance is used.

Abstract: When rubber is melted and decomposed in a screw extruder, a rubber melt can be produced without using a heavy oil with minimized evolution of gas by controlling the extruder cylinder temperature in the decomposing section of the screw within the range of 400.degree.-500.degree. C. and cooling the melt in the discharging section of the screw to a temperature of not more than 250.degree. C. The screw extruder suited for practising this method comprises a screw having a feeding section, a compressing section, a decomposing section and a discharging section which are arranged in that order from the inlet side, and a cylinder assembly consisting of a heating cylinder and a cooling cylinder arranged in that order from the inlet side, said feeding, compressing and decomposing sections of the screw being located corresponding to said heating cylinder, and said discharging section of the screw being located corresponding to said cooling cylinder.

Abstract: A photosensitive resin film consisting of a monolayer film of a composition comprising (a) a cyclized product of butadiene polymer, (b) at least one member selected from the group consisting of a photo-crosslinking agent, a photo-sensitizer and a photo-polymerization initiator, and (c) a storage stabilizer, and if necessary, a dye and/or a pigment, or a laminate structure photosensitive resin film prepared by laminating to the above photosensitive resin film a composition comprising (d) 100 parts by weight of a polymer or copolymer of monoolefinically unsaturated compound, (e) 5 to 100 parts by weight of a polyfunctional, photo-polymerizable, unsaturated compound having at least two photo-polymerizable double bonds in the molecule, (f) at least one member selected from the group consisting of a photo-crosslinking agent, a photo-sensitizer and a photo-polymerization initiator, and (g) a storage stabilizer, and if necessary, a dye and/or a pigment.

Abstract: A photoresist composition comprising a cyclized product obtained by contacting a conjugated diene polymer or copolymer having unsaturations in the main chain or side chains with a fluorine-containing substituted sulfonic acid compound represented by the formula:CF.sub.n H.sub.3-n SO.sub.3 R or CF.sub.n H.sub.3-n SO.sub.2 Xwherein R is hydrogen, alkyl or CF.sub.n H.sub.3-n SO.sub.2, X is halogen, and n is 1, 2 or 3, in an inert solvent, and a photosensitive crosslinking agent soluble in an organic solvent. The resist pattern obtained from said composition has excellent heat resistance. Also, when a silicon oxide film having said resist pattern is etched, the number of pinholes formed is very small.

Abstract: A photosensitive resin composition comprising (I) a copolymer containing (A) 10 to 95 mol % of a conjugated diolefinic hydrocarbon, (B) 5 to 90 mol % of an .alpha.,.beta.-ethylenically unsaturated carboxylic acid and (C) 0 to 85 mol % of a monoolefinically unsaturated compound, (II) a photosensitizer and/or a photosensitive crosslinking agent, and, if necessary, (III) a photopolymerizable unsaturated monomer. Said copolymer may have been reacted with an inorganic alkali, an alkali salt or an amine compound in a proportion of 0.05 to 1.0 equivalent per equivalent of the carboxyl group of the .alpha.,.beta.-ethylenically unsaturated carboxylic acid in said copolymer.

Abstract: A stripping liquor composition consisting essentially of (A) at least one compound selected from among sulfonic acids, acid esters of sulfuric acid, and acid esters of phosphoric acid, (B) hydrogen peroxide, and (C) at least one of organic solvents, with or without the addition of (D) at least one of polyhydric alcohols.

Abstract: A gypsum composition obtained by molding and drying an aqueous slurry comprising calcined gypsum, polyvinyl alcohol, and at least one metal compound. The composition has high surface hardness and high water resistance.