Abstract: Disclosed is a copolymer latex obtained by emulsion polymerization of a monomer mixture containing (a) 30-70% by mass of a conjugated diene monomer, (b) 0.1-15% by mass of an ethylenically unsaturated carboxylic acid monomer and (c) 15-69.9% by mass of one or more other copolymerizable monomers. The copolymer latex is characterized in that the toluene in-soluble content in the dried product obtained by drying the copolymer latex is 95-100% by mass; the mass ratio of the toluene-swollen toluene insoluble content to the dried toluene insoluble content (the toluene swelling degree) is 3.0-6.5; the number average particle diameter of the copolymer latex is 180-400 nm; and the glass transition starting temperature of the dried copolymer latex is within the range from ?70° C. to ?20° C. and the glass transition ending temperature thereof is within the range from 10° C. to 100° C. in differential scanning calorimetry.

Abstract: Disclosed is a copolymer latex obtained by emulsion polymerization of a monomer mixture containing (a) 30-70% by mass of a conjugated diene monomer, (b) 0.1-15% by mass of an ethylenically unsaturated carboxylic acid monomer and (c) 15-69.9% by mass of one or more other copolymerizable monomers. The copolymer latex is characterized in that the toluene in-soluble content in the dried product obtained by drying the copolymer latex is 95-100% by mass; the mass ratio of the toluene-swollen toluene insoluble content to the dried toluene insoluble content (the toluene swelling degree) is 3.0-6.5; the number average particle diameter of the copolymer latex is 180-400 nm; and the glass transition starting temperature of the dried copolymer latex is within the range from ?70° C. to ?20° C. and the glass transition ending temperature thereof is within the range from 10° C. to 100° C. in differential scanning calorimetry.

Abstract: A polyisocyanate composition comprising an allophanate group, which is obtained from an aliphatic diisocyanate(s), wherein in a state substantially free of a solvent and the aliphatic diisocyanate(s), (i) the content of components having a molecular weight of 700 or less is 20-60 weight %, (ii) the ratio of weight average molecular weight to number average molecular weight is 1.20-5.00, (iii) the ratio of viscosity (unit: mPa·s) of the polyisocyanate composition at 25° C. to the number average number of functional groups of isocyanate groups is represented by the following expression: viscosity(mPa·s)/number average number of functional groups?240.

Abstract: Using at least one compound selected from the group consisting of a zirconyl compound and a zirconium alcoholate as an allophanation catalyst, an allophanate group-containing polyisocyanate composition is produced from a starting material of at least one isocyanate compound selected from the group consisting of an aliphatic diisocyanate, an alicyclic diisocyanate and an isocyanate pre-polymer obtained therefrom, and another starting material of a hydroxyl group-containing compound.

Abstract: A polyisocyanate composition comprising an allophanate group, which is obtained from an aliphatic diisocyanate(s), wherein in a state substantially free of a solvent and the aliphatic diisocyanate(s),

Abstract: Using at least one compound selected from the group consisting of a zirconyl compound and a zirconium alcoholate as an allophanation catalyst, an allophanate group-containing polyisocyanate composition is produced from a starting material of at least one isocyanate compound selected from the group consisting of an aliphatic diisocyanate, an alicyclic diisocyanate and an isocyanate pre-polymer obtained therefrom, and another starting material of a hydroxyl group-containing compound.

Abstract: Alignment in X-ray lithography is generally effected in such a manner that the surface of a target mark for alignment formed on a wafer is illuminated with light for alignment through an X-ray mask, and the position of the wafer is detected from the reflected light. On the basis of the finding that the reflected light from the mask, particularly from an absorber formed thereon, greatly degrades the precision and reliability in measurement, the present invention provides a pattern transfer mask provided with a thin film which lowers the reflection factor of the mask the thin film having a thickness set a .lambda./4n (.lambda.:the wavelength of the light for alignment; n: an integer) or an odd-number multiple thereof. Thus, it is advantageously possible to overcome the above-described lowering of precision and reliablity.