Abstract: The invention provides a photosensitive resin composition containing a soluble synthetic linear high-molecular compound in an amount of 25 to 95 weight percent based on the whole composition, a monomer having at least one photopolymerizable unsaturated bond and a photopolymerization initiator and characterized in that part or all of the soluble synthetic linear high-molecular compound is an addition polymer of an organic diisocyanate compound with an amide compound, both terminals of the amide compound being either primary or secondary amide groups and the equivalent ratio of amino groups to isocyanate groups in the addition polymer is not less than 1.0. The high-molecular weight compound makes up at least 50% by weight base on the total amount of the polymer material present in the composition.

Abstract: An image reproducing material comprising a supporting sheet bearing a metal or metallic compound layer having a thickness of 100 to 1000 .ANG. and a photosensitive resin layer, which is characterized in that said photosensitive resin layer contains (1) an ethylenically unsaturated compound which is polymerizable by the action of free radical and chain propagative, (2) a compound showing photochromism by radical mechanism, (3) a free radical producing agent and (4) an acitinic light absorber. There is also provided an image formed (reproduced) material obtained by patterned exposing the above image reproducing material and then processing the same, a method for obtaining such image formed material and also a method for dot-etching such image formed material. By the use of these materials and methods, dot-etching can be effected easily and there are obtained sharp images without the formation of pin holes.

Abstract: A photosensitive resin composition which comprises(1) at least one of the group comprising basic polymeric compounds which have a molecular weight of not less than 1,000, contain basic nitrogen atoms and are themselves poor in hydrophilic properties but, in the presence of an acidic substance, show good hydrophilic properties due to the acid-base interaction, and(2) at least one of the group comprising organic carboxylic acids which are themselves acidic but, when irradiated with light, lose their acidic property due to a chemical conversion.

Abstract: A photosensitive resin composition which comprises a polymer having a basic nitrogen atom in the main or side chain, which is represented by the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are each a hydrogen atom or a substituted or unsubstituted hydrocarbon group, at least one of R.sub.1 to R.sub.3 representing a polymeric chain, a photopolymerizable unsaturated monomer and a photosensitizer.

Abstract: Photosensitive polyamide resin composition which can be developed with water to give a relief printing plate having an excellent moisture resistance, comprising 30 to 90% by weight of a water-soluble polyamide having ammonium type nitrogen atoms and 5 to 70% by weight of a photopolymerizable unsaturated compound prepared by reacting (meth)acrylic acid (I) and a polyglycidyl ether of an aliphatic polyvalent alcohol (II) in an equivalent ratio of 0.5.ltoreq.(I)/(II).ltoreq.2.0, and 0.01 to 10% by weight of a photopolymerization initiator.

Abstract: A photosensitive resin composition which comprises a polyester having a nitrogen atom in the ammonium salt form in the main or side chain representable by the formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are each a hydrogen atom or a substituted or unsubstituted hydrocarbon group, at least one of R.sub.1 to R.sub.4 representing a polymeric chain, and X is an anion to be paired with the ammonium ion, a photopolymerizable unsaturated monomer and a photosensitizer.

Abstract: A photosensitive resin composition which comprises a polymer having a basic nitrogen atom in the main or side chain, which is represented by the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are each a hydrogen atom or a substituted or unsubstituted hydrocarbon group, at least one of R.sub.1 to R.sub.3 representing a polymeric chain, a photopolymerizable unsaturated monomer and a photosensitizer.

Abstract: An electrostatic printing plate is obtained by forming a permanent electroconductive pattern on its exposed portion, which is effected by irradiation of light to expose a light image on a photosensitive material comprising a photosensitive composition containing an aliphatic nitrogen compound and an organic halogen compound capable of generating a free radical upon irradiation by light.

Abstract: Disclosed is a polyester adhesive suitable for various substrates, especially metals, having as the effective component thereof a copolyester containing a tertiary amino group comprising: (1) a terephthalic acid residue,(2) at least one dicarboxylic acid residue selected from the class consisting of aliphatic dicarboxylic acid residues and aromatic dicarboxylic acid residues other than a terephthalic acid residue,(3) at least one alkylene glycol residue, and(4) at least one glycol residue or dicarboxylic acid residue selected from the class consisting of glycol residues and dicarboxylic acid residues each possessed of the group represented by the generic formulas (I) through (V) given hereinbelow. ##STR1##(wherein, R.sub.1, R.sub.2, R.sub.5, R.sub.7, R.sub.8, R.sub.9, R.sub.10, R.sub.13, R.sub.14, R.sub.16, R.sub.19, and R.sub.20 are each an alkylene group of 1 to 15 carbon atoms, R.sub.6, R.sub.11, and R.sub.12 are each a hydrogen atom or an alkyl group of 1 to 10 carbon atoms, R.sub.17 and R.sub.