Patents by Inventor Kuo-Uei Huang

Kuo-Uei Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma apparatus and method capable of adaptive impedance matching
    Patent number: 7264676
    Abstract: A plasma apparatus capable of adaptive impedance matching comprises a plasma reactor which can produce plasma to proceed with CVD (chemical vapor deposition) process, a bi-polar electrostatic chuck which locates inside the plasma reactor and is used to support and secure a wafer, an alternating current bias power supply which connects to the bi-polar electrostatic chuck supplies the voltage potential bias for ion-bombardment from plasma, and an impedance-matching circuit which connects the alternating current bias power supply to the bi-polar electrostatic chuck is used to balance the inner electrode power output and the outer electrode power output of the bi-polar electrostatic chuck.
    Type: Grant
    Filed: September 11, 2003
    Date of Patent: September 4, 2007
    Assignee: United Microelectronics Corp.
    Inventors: Chien-Hsin Lai, San-An Lin, Kuo-En Yen, Kuo-Uei Huang
  • Plasma apparatus and method capable of adaptive impedance matching
    Publication number: 20050056369
    Abstract: A plasma apparatus capable of adaptive impedance matching comprises a plasma reactor which can produce plasma to proceed with CVD (chemical vapor deposition) process, a bi-polar electrostatic chuck which locates inside the plasma reactor and is used to support and secure a wafer, an alternating current bias power supply which connects to the bi-polar electrostatic chuck supplies the voltage potential bias for ion-bombardment from plasma, and an impedance-matching circuit which connects the alternating current bias power supply to the bi-polar electrostatic chuck is used to balance the inner electrode power output and the outer electrode power output of the bi-polar electrostatic chuck.
    Type: Application
    Filed: September 11, 2003
    Publication date: March 17, 2005
    Inventors: Chien-Hsin Lai, San-An Lin, Kuo-En Yen, Kuo-Uei Huang