Patents by Inventor Kurtis R. Macura

Kurtis R. Macura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Steam cleaning system and method for semiconductor process equipment
    Patent number: 7108002
    Abstract: Disclosed are systems and methods for removing stubborn contaminants, aluminum fluoride and aluminum chloride in particular, from components of semiconductor-processing equipment. One embodiment forces steam through small holes in a gas distribution plate to remove build up on the interior walls of the holes. A cleaning fixture disposed between the steam source and the gas distribution plate delivers the steam at increased pressures. The gas distribution plate can be immersed in water during cleaning to capture the exiting steam.
    Type: Grant
    Filed: June 2, 2005
    Date of Patent: September 19, 2006
    Assignee: Quantum Global Technologies, LLC.
    Inventors: David S. Zuck, Kurtis R. Macura
  • Steam cleaning system and method for semiconductor process equipment
    Patent number: 6936114
    Abstract: Disclosed are systems and methods for removing stubborn contaminants, aluminum fluoride and aluminum chloride in particular, from components of semiconductor-processing equipment. One embodiment forces steam through small holes in a gas distribution plate to remove build up on the interior walls of the holes. A cleaning fixture disposed between the steam source and the gas distribution plate delivers the steam at increased pressures. The gas distribution plate can be immersed in water during cleaning to capture the exiting steam.
    Type: Grant
    Filed: September 16, 2003
    Date of Patent: August 30, 2005
    Assignee: Quantum Global Technologies, LLC
    Inventors: David S. Zuck, Kurtis R. Macura
  • Steam cleaning system and method for semiconductor process equipment
    Patent number: 6648982
    Abstract: Disclosed are systems and methods for removing stubborn contaminants, aluminum fluoride and aluminum chloride in particular, from components of semiconductor-processing equipment. One embodiment forces steam through small holes in a gas distribution plate to remove build up on the interior walls of the holes. A cleaning fixture disposed between the steam source and the gas distribution plate delivers the steam at increased pressures. The gas distribution plate can be immersed in water during cleaning to capture the exiting steam.
    Type: Grant
    Filed: June 11, 2001
    Date of Patent: November 18, 2003
    Assignee: Quantum Global Technologies, LLC
    Inventors: David S. Zuck, Kurtis R. Macura