Abstract: A method of and an apparatus for measuring biometric information are provided. The method includes receiving an image of a biosensor including a reagent pad on which a sample is collected, and comparing brightness information of a reacting region of the reagent pad in the received image with reference brightness information in the received image to determine a value of a reagent reaction between the reagent pad and the sample.

Abstract: Provided is an electron mediator system, which may include a first transition metal complex and a second transition metal complex, wherein a working potential of the electron mediator system may be substantially the same as a molar average of a working potential of the first transition metal complex and a working potential of the second transition metal complex.

Abstract: Provided is a biosensor having i) sufficient sensitivity allowing quantitative detection of a low concentration of an analyte; and ii) excellent selectivity allowing selective distinction of the presence of an analyte.

Abstract: A method and device for measuring blood glucose are provided. The device includes a strip receiving part having a plurality of pins therein, the pins being arranged in such a manner that at least one of the pins contacts at least one electrode formed in a blood glucose measurement strip when the blood glucose measurement strip is inserted into the strip receiving part; and a controller configured to identify a type of the blood glucose measurement strip inserted into the strip receiving part and to control application of a testing voltage configured in response to the identified type of the blood glucose measurement strip to each pin of the strip receiving part.

Abstract: A chemical mechanical polishing (CMP) slurry composition for polishing an organic layer and a method of forming a semiconductor device using the same are disclosed. The CMP slurry composition may include from 0.001% to 5% by weight of oxide-polishing particles; from 0.1% to 5% by weight of an oxidant; from 0% to 5% by weight of a polishing regulator; from 0% to 3% by weight of a surfactant; from 0% to 3% by weight of a pH regulator; and from 79% to 99.889% by weight of deionized water. The use of the CMP slurry composition makes it possible to allow a silicon-free organic layer to be polished with a selectivity higher than 6:1 with respect to an oxide layer.

Abstract: An optical sensor and an electronic device having an optical sensor. The optical sensor includes: an optical waveguide containing a photochromic material; a light emitter that emits visible light to be incident on the optical waveguide; and a light receiver that detects the visible light emitted from the light emitter and progressing through the optical waveguide. A transmittance of the optical waveguide in relation to the visible light may be changed by the photochromic material as the optical waveguide is exposed to UV light. The optical sensor and the electronic device having the same may be variously implemented according to exemplary embodiments.

Abstract: A chemical mechanical polishing (CMP) slurry composition for polishing an organic layer and a method of forming a semiconductor device using the same are disclosed. The CMP slurry composition may include from 0.001% to 5% by weight of oxide-polishing particles; from 0.1% to 5% by weight of an oxidant; from 0% to 5% by weight of a polishing regulator; from 0% to 3% by weight of a surfactant; from 0% to 3% by weight of a pH regulator; and from 79% to 99.889% by weight of deionized water. The use of the CMP slurry composition makes it possible to allow a silicon-free organic layer to be polished with a selectivity higher than 6:1 with respect to an oxide layer.

Abstract: The present invention provides a lighting device, including: a second OLED layer formed on a window; a solar cell formed on the second OLED layer; and a first OLED layer formed on the solar cell.

Abstract: A flexible display device includes a display main body having flexibility; a first supporter which evenly supports a first side of the display main body; and a second supporter which evenly supports a second side of the display main body joined to the first side. During carrying, the display main body of the flexible display device is flexibly deformed and kept, and during use, the flexible display device is evenly unfolded and viewed. Accordingly, the flexible display device provides improved convenience in carrying and use.

Abstract: An OLED device having rear electrodes. The device comprises a substrate whereon a light emitting region is provided, an anode layer wherein an anode terminal is formed on one side of the top of the light emitting region, an organic layer laminated onto the light emitting region of the anode layer, a cathode layer wherein a cathode terminal is formed on one side of the top of the light emitting region, a protective film which seals the light emitting region, a rear electrode for anode of which one side is connected to the anode terminal and the other side is formed from the upper surface of the cathode layer whereon the protective film is provided, and a rear electrode for cathode of which one side is connected to the cathode terminal and the other side formed from the upper surface of the cathode layer whereon the protective film is provided.

Abstract: The present invention provides a lighting device, including: a second OLED layer formed on a window; a solar cell formed on the second OLED layer; and a first OLED layer formed on the solar cell.

Abstract: Disclosed herein is an OLED device having rear electrodes, wherein electrodes are formed on a protective film of an OLED device.

Abstract: A method of manufacturing a non-volatile memory device and a non-volatile memory device are provided. The method includes: providing a substrate on which a plurality of charge storage layers that are electrically separated from each other by device isolation layers are formed; recessing the device isolation layers such that an uppermost portion of the device isolation layers is lower than an uppermost portion of the charge storage layers; and dry cleaning first and second sides of each of the charge storage layers that are exposed by the device isolation layers by using a cleaning agent including NF3 gas.

Abstract: The present invention relates to an oxynitride phosphor, a method for preparing the same, and a light-emitting device. More specifically, the present invention provides the oxynitride phosphor including crystals represented by the following Chemical Formula, a method for preparing the same, and a light-emitting device including the oxynitride phosphor. The invention includes the crystals' represented by the following Chemical Formula to obtain high light-emitting efficiency. [Chemical Formula] (A(1-p-q)BpCq)aDbSicOdNe:xEu2+, yRe3+, Zq) wherein A, B, and C are +2 metals, but different metals from one another; D is metals of Group 3; Re is +3 metals; Q is a flux; p and q are 0<p<1.0 and 0?q<1.0; a, b, c, d, and e are 1.0?a?2.0, 0?b?4.0, 0<c?1.0, 0<d?1.0, and 0<e?2.0; x, y, and z are 0<x?0.25, 0?y?0.25, and 0?z?0.25.

Abstract: The field emission device includes: a front substrate and a rear substrate which are disposed at a certain distance and opposite to each other; at least one or more cathode electrodes formed on the rear substrate; at least one or more gate electrodes formed to be distant from the cathode electrodes and to be insulated with the rear substrate; emitters formed on the upper surfaces of the cathode electrodes; an anode electrode formed on the front substrate toward the rear substrate side; a fluorescent layer formed on the anode electrode; a first voltage application circuit for applying an AC voltage to the anode electrode; and a second voltage application circuit for applying an AC voltage to the gate electrode, wherein the AC voltages being applied to the anode electrode and the gate electrode are synchronized.

Abstract: A constant current driving circuit for a field emission device has a ground current of an anode electrode measured in real time and the measured ground current is fedback to vary the frequency and duty ratio of a voltage applied to gate and cathode electrodes of the field emission device, thereby causing the ground current of the anode electrode to be constantly maintained. The field emission device has an anode electrode formed on a front substrate, gate and cathode electrodes formed on a rear substrate disposed opposite to the front substrate to be spaced apart from the front substrate by a predetermined distance, and an emitter formed on a top surface of the cathode electrode.

Abstract: The present invention relates to a field emission device. More specifically, the present invention may prohibit unnecessary voltage from being applied to an anode electrode during non-operating time that no voltage is applied to a gate electrode to reduce driving power, prohibit electrons from being emitted with unnecessary high voltage which is applied to the anode electrode to increase luminous efficiency, and reduce a time that unnecessary high voltage is applied to the anode electrode to extend life time of the field emission device, by applying AC voltage to the anode electrode to correspond to a time that voltage is applied to the gate electrode and a type of voltage which is applied to the gate electrode.

Abstract: Provided is a method of fabricating an integrated circuit semiconductor device. The method may include forming a plurality of gate patterns spaced apart from each other on a semiconductor substrate, the plurality of gate patterns including gate electrodes and gate capping patterns. After an interlayer insulating layer is formed to insulate the gate patterns, the interlayer insulating layer and the gate capping patterns may be planarized by etching until top surfaces of the gate electrodes are exposed. Gate metal silicide layers may be selectively formed on the gate electrodes.

Abstract: A slurry composition useful for chemical mechanical polishing of the surface of a material layer, e.g., a silicon oxide layer, is disclosed. A first material surface which is exposed to the slurry exhibits hydrophilicity, while a second material layer, e.g., a polysilicon layer, the surface of which is also exposed to the slurry, exhibits hydrophobicity, and accordingly acts as a polishing stopping layer. The slurry composition consists essentially of water, abrasive grains, and a polymer additive having both hydrophilic and hydrophobic functional groups.

Abstract: A slurry composition useful for chemical mechanical polishing of the surface of a material layer, e.g., a silicon oxide layer, is disclosed. A first material surface which is exposed to the slurry exhibits hydrophilicity, while a second material layer, e.g., a polysilicon layer, the surface of which is also exposed to the slurry, exhibits hydrophobicity, and accordingly acts as a polishing stopping layer. The slurry composition consists essentially of water, abrasive grains, and a polymer additive having both hydrophilic and hydrophobic functional groups.