Patents by Inventor Kwee C. Wong

Kwee C. Wong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5976228
    Abstract: A composition that enhances the acid resistance of copper oxide. The composition includes a solution of an alkali metal borohydride and a quaternary ammonium ion in amounts selected such that when the composition is applied to copper oxide, the composition enhances the acid resistance of the copper oxide. The preferred alkali metal borohydride is sodium borohydride or potassium borohydride, and the preferred quaternary ammonium ion has the formula ##STR1## wherein each R1, R2, R3, R4 independently comprises a lower alkyl, hydroxylalkyl or carboxyalkyl group.
    Type: Grant
    Filed: September 15, 1997
    Date of Patent: November 2, 1999
    Assignee: The Dexter Corporation
    Inventor: Kwee C. Wong
  • Patent number: 5741432
    Abstract: A composition that includes an aqueous solution of nitric acid and an additive having the formula ##STR1## or a salt thereof, in an amount sufficient to improve the oxidative stability of the aqueous nitric acid solution relative to the oxidative stability of that aqueous solution in the absence of the additive.
    Type: Grant
    Filed: January 17, 1995
    Date of Patent: April 21, 1998
    Assignee: The Dexter Corporation
    Inventor: Kwee C. Wong
  • Patent number: 4760014
    Abstract: A process for treating an aqueous alkaline spent mixture produced during preparation of circuit boards and comprising a photopolymer resin. According to the method, first, an acid, a polyvalent cation and a coagulation aid are mixed with the spent mixture to produce a heterogeneous treated mixture comprising coagulated, precipitated photopolymer resin and an aqueous phase. Then, the coagulated, precipitated photopolymer resin is separated from the aqueous phase to produce a non-tacky, non-gumlike photopolymer resin sludge.
    Type: Grant
    Filed: August 1, 1986
    Date of Patent: July 26, 1988
    Assignee: Great Lakes Chemical Corporation
    Inventor: Kwee C. Wong
  • Patent number: 4636282
    Abstract: A composition of matter comprising sulfuric acid and guanidine, aminoguanidine, or formylated aminoguanidine. The composition is useful in the preparation of sulfuric acid/hydrogen peroxide etching solutions and in methods for etching copper, most particularly in the manufacture of printed circuits.
    Type: Grant
    Filed: June 20, 1985
    Date of Patent: January 13, 1987
    Assignee: Great Lakes Chemical Corporation
    Inventor: Kwee C. Wong
  • Patent number: 4437928
    Abstract: Improved metal dissolution rates are obtained when using a solution containing sulfuric acid, hydrogen peroxide and a catalytic amount of a glycol ether such as diethylene glycol butyl ether or ethylene glycol butyl ether.
    Type: Grant
    Filed: August 22, 1983
    Date of Patent: March 20, 1984
    Assignee: Dart Industries Inc.
    Inventor: Kwee C. Wong
  • Patent number: 4437930
    Abstract: Improved metal dissolution rates are obtained when using a solution containing sulfuric acid, hydrogen peroxide and a catalytic amount of .epsilon.-caprolactam.
    Type: Grant
    Filed: August 22, 1983
    Date of Patent: March 20, 1984
    Assignee: Dart Industries Inc.
    Inventor: Kwee C. Wong
  • Patent number: 4437929
    Abstract: Improved metal dissolution rates are obtained when using a solution containing sulfuric acid, hydrogen peroxide and a catalytic amount of pyrrolidone such as 2-pyrrolidone or N-methyl-2-pyrrolidone.
    Type: Grant
    Filed: August 22, 1983
    Date of Patent: March 20, 1984
    Assignee: Dart Industries Inc.
    Inventor: Kwee C. Wong
  • Patent number: 4437927
    Abstract: Improved metal dissolution rates are obtained when using a solution containing sulfuric acid, hydrogen peroxide and a catalytic amount of a lactone such as .gamma.-butyrolactone, .epsilon.-caprolactone or .gamma.valerolactone.
    Type: Grant
    Filed: August 22, 1983
    Date of Patent: March 20, 1984
    Assignee: Dart Industries Inc.
    Inventor: Kwee C. Wong
  • Patent number: 4437932
    Abstract: Improved metal dissolution rates are obtained when using a solution containing sulfuric acid, hydrogen peroxide and a catalytic amount of a furan derivative such as tetrahydrofurfuryl alcohol or tetrahydrofuran.
    Type: Grant
    Filed: August 22, 1983
    Date of Patent: March 20, 1984
    Assignee: Dart Industries Inc.
    Inventor: Kwee C. Wong