Patents by Inventor Kyogo Koizumi

Kyogo Koizumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for disproportionating silanes
    Patent number: 4667048
    Abstract: A process for disproportionating silanes, which comprises contacting a silane having at least one Si--H bond represented by the general formulaR.sub.l H.sub.m SiX.sub.4-(l+m)wherein R represents an alkyl or aryl group, X represents a halogen atom or an alkoxy group, l is 0, 1 or 2, and m is 1, 2 or 3 and l+m is 1, 2 or 3, and when l is 2, R's may be identical or different, and when l+m is 1 or 2, X's may be identical or different, with a reaction product of a strong acid-type cation exchange resin with an amine and disproportionating the silane.
    Type: Grant
    Filed: June 9, 1986
    Date of Patent: May 19, 1987
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Kaoru Inoue, Hiroharu Miyagawa, Masayoshi Itoh, Tomohiro Abe, Kyogo Koizumi, Noriyuki Yanagawa
  • Process for producing silicon hydrides
    Patent number: 4610859
    Abstract: A process for producing silicon hydrides represented by the general formula Si.sub.n H.sub.2n+2 wherein n is a positive integer of 1 to 6, which comprises reacting a silicon-containing alloy with an aqueous solution of an acid in the presence of at least one inert organic solvent having a boiling range of from -60.degree. C. to 250.degree. C.
    Type: Grant
    Filed: December 27, 1984
    Date of Patent: September 9, 1986
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Hiroharu Miyagawa, Masayoshi Itoh, Tomohiro Abe, Kenji Iwata, Kyogo Koizumi