Abstract: An illumination correction apparatus for correcting a radiation beam incident on a reticle from an exposure apparatus includes a plurality of fingers each having a surface facing an incident direction of the radiation beam, the plurality of fingers being arranged in a first direction to be adjacent to a path of the radiation beam, and configured to adjust an amount of the incident radiation beam by moving in a second direction, intersecting the first direction, a controller connected to the plurality of fingers and configured to control movement of the plurality of fingers such that an intensity of the radiation beam has uniformity in the first direction, at least one optical sensor on the surface of at least one finger of the plurality of fingers, and a measurement unit configured to measure, based on an output of the at least one optical sensor, the intensity of the radiation beam.

Abstract: A light source capable of operating third and fourth reflection mirrors included in a beam splitting device in conjunction with movements of first and second reflection mirrors included in a beam transfer device and an optical assembly, respectively. The third and fourth reflection mirrors are disposed on optical paths of a pre-pulse and a main pulse emitted from first and second pulse generators, respectively. The light source operates the third and fourth reflection mirrors to offset an excessive compensation of the main pulse caused in a process of compensating for an optical path error of the pre-pulse. The light source may be included in an extreme ultraviolet light source system.

Abstract: A light source capable of operating third and fourth reflection mirrors included in a beam splitting device in conjunction with movements of first and second reflection mirrors included in a beam transfer device and an optical assembly, respectively. The third and fourth reflection mirrors are disposed on optical paths of a pre-pulse and a main pulse emitted from first and second pulse generators, respectively. The light source operates the third and fourth reflection mirrors to offset an excessive compensation of the main pulse caused in a process of compensating for an optical path error of the pre-pulse. The light source may be included in an extreme ultraviolet light source system.

Abstract: A semiconductor imprint device includes a stage that supports a substrate, a film clamp that applies a film stamp including a pattern onto the substrate, a roller that applies pressure to the film stamp disposed on the substrate so that the pattern is transferred to the substrate, a camera that captures an image of the roller and the film stamp, and a controller that adjusts a position of the film clamp by using the image. The pattern is for forming a semiconductor device.

Abstract: The present disclosure relates to a transfer robot and a method for controlling the same. The transfer robot includes a robot main body and a driving unit configured to move the robot main body toward a stage. The robot main body includes a distance sensor unit configured to obtain distance information between the robot main body and the stage, a first image acquisition unit configured to receive an image of a first mark of the stage and obtain a first image information, a manipulation unit configured to pick up a target object disposed on the stage, and a control unit configured to control the driving unit using the distance information and the first image information and thereby to causing the robot main body to be placed at a desired position spaced apart from the stage.